loadpatents
name:-0.012815952301025
name:-0.0053999423980713
name:-0.0029799938201904
Liu; Kuo-Shih Patent Filings

Liu; Kuo-Shih

Patent Applications and Registrations

Patent applications and USPTO patent grants for Liu; Kuo-Shih.The latest application filed is for "low dose charged particle metrology system".

Company Profile
3.6.12
  • Liu; Kuo-Shih - Fremont CA
  • Liu; Kuo-Shih - Taipei City TW
  • Liu; Kuo-Shih - Milpitas CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Methods of inspecting samples with multiple beams of charged particles
Grant 11,430,631 - Liu , et al. August 30, 2
2022-08-30
Low Dose Charged Particle Metrology System
App 20220113637 - Wang; Fei ;   et al.
2022-04-14
Low dose charged particle metrology system
Grant 11,175,590 - Wang , et al. November 16, 2
2021-11-16
Low Dose Charged Particle Metrology System
App 20200333714 - WANG; Fei ;   et al.
2020-10-22
Methods Of Inspecting Samples With Multiple Beams Of Charged Particles
App 20200227233 - LIU; Kuo-Shih ;   et al.
2020-07-16
Using phase difference of interference lithography for resolution enhancement
Grant 8,582,079 - Liu , et al. November 12, 2
2013-11-12
Solar Panel And Electrode Structure Thereof And Manufacturing Method Thereof
App 20130037076 - WANG; Keh-Yao ;   et al.
2013-02-14
Solar Cell Panel
App 20120247532 - LIU; Kuo-Shih ;   et al.
2012-10-04
Integrated Interference-assisted Lithography
App 20100002210 - HENDEL; RUDOLF ;   et al.
2010-01-07
Patterning Resolution Enhancement Combining Interference Lithography And Self-aligned Double Patterning Techniques
App 20090246706 - HENDEL; RUDOLF ;   et al.
2009-10-01
Resolution Enhancement Techniques Combining Interference-assisted Lithography With Other Photolithography Techniques
App 20090117491 - Hendel; Rudolf ;   et al.
2009-05-07
Resolution Enhancement Techniques Combining Four Beam Interference-assisted Lithography With Other Photolithography Techniques
App 20090111056 - Hendel; Rudolf ;   et al.
2009-04-30
Using Phase Difference Of Interference Lithography For Resolution Enhancement
App 20090046263 - Liu; Kuo-Shih ;   et al.
2009-02-19
Reduction of plasma edge effect on plasma enhanced CVD processes
Grant 6,553,932 - Liu , et al. April 29, 2
2003-04-29
Reduction of plasma edge effect on plasma enhanced CVD processes
App 20010042511 - Liu, Kuo-Shih ;   et al.
2001-11-22
Gas feedthrough with electrostatic discharge characteristic
Grant 6,170,430 - Liu , et al. January 9, 2
2001-01-09

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed