| Patent | Date |
|---|
Dynamic updates for the inspection of integrated circuits
Grant 10,565,702 - Zhang , et al. Feb | 2020-02-18 |
Correction for flare effects in lithography system
Grant 10,423,745 - Liu , et al. Sept | 2019-09-24 |
Guided defect detection of integrated circuits
Grant 10,133,838 - Liu , et al. November 20, 2 | 2018-11-20 |
Dynamic Updates for the Inspection of Integrated Circuits
App 20180218493 - Zhang; Zhaoli ; et al. | 2018-08-02 |
Guided Defect Detection of Integrated Circuits
App 20180218090 - Liu; Hua-Yu ; et al. | 2018-08-02 |
Lens heating aware source mask optimization for advanced lithography
Grant 9,940,427 - Crouse , et al. April 10, 2 | 2018-04-10 |
Pattern selection for full-chip source and mask optimization
Grant 9,934,350 - Liu April 3, 2 | 2018-04-03 |
Pattern Selection For Full-chip Source And Mask Optimization
App 20160026750 - LIU; Hua-Yu | 2016-01-28 |
Pattern selection for full-chip source and mask optimization
Grant 9,183,324 - Liu November 10, 2 | 2015-11-10 |
Correction For Flare Effects In Lithography System
App 20150058815 - LIU; Hua-Yu ; et al. | 2015-02-26 |
Correction for flare effects in lithography system
Grant 8,887,104 - Liu , et al. November 11, 2 | 2014-11-11 |
Method of pattern selection for source and mask optimization
Grant 8,739,082 - Liu , et al. May 27, 2 | 2014-05-27 |
Pattern Selection For Full-chip Source And Mask Optimization
App 20130311958 - LIU; Hua-Yu | 2013-11-21 |
Selection of optimum patterns in a design layout based on diffraction signature analysis
Grant 8,543,947 - Liu , et al. September 24, 2 | 2013-09-24 |
Stereo set
Grant D689,039 - Liu September 3, 2 | 2013-09-03 |
Lens Heating Aware Source Mask Optimization For Advanced Lithography
App 20130212543 - CROUSE; Michael Matthew M. ; et al. | 2013-08-15 |
Correction For Flare Effects In Lithography System
App 20130185681 - Liu; Hua-Yu ; et al. | 2013-07-18 |
Pattern selection for full-chip source and mask optimization
Grant 8,438,508 - Liu May 7, 2 | 2013-05-07 |
Method of Pattern Selection for Source and Mask Optimization
App 20120216156 - Liu; Hua-Yu ; et al. | 2012-08-23 |
System and method for creating a focus-exposure model of a lithography process
Grant 8,245,160 - Ye , et al. August 14, 2 | 2012-08-14 |
System and Method for Creating a Focus-Exposure Model of a Lithography Process
App 20120017183 - Ye; Jun ; et al. | 2012-01-19 |
System and method for creating a focus-exposure model of a lithography process
Grant 8,065,636 - Ye , et al. November 22, 2 | 2011-11-22 |
Selection of Optimum Patterns in a Design Layout Based on Diffraction Signature Analysis
App 20110107280 - Liu; Hua-Yu ; et al. | 2011-05-05 |
Pattern Selection for Full-Chip Source and Mask Optimization
App 20110099526 - Liu; Hua-Yu | 2011-04-28 |
System And Method For Creating A Focus-exposure Model Of A Lithography Process
App 20100229147 - YE; Jun ; et al. | 2010-09-09 |
System and method for creating a focus-exposure model of a lithography process
Grant 7,747,978 - Ye , et al. June 29, 2 | 2010-06-29 |
Cell library that can automatically avoid forbidden pitches
Grant 7,251,377 - Liu July 31, 2 | 2007-07-31 |
Alternating phase shift mask design conflict resolution
Grant 7,178,128 - Liu , et al. February 13, 2 | 2007-02-13 |
System And Method For Creating A Focus-exposure Model Of A Lithography Process
App 20070031745 - Ye; Jun ; et al. | 2007-02-08 |
Simulation-based selection of evaluation points for model-based optical proximity correction
Grant 7,082,596 - Liu July 25, 2 | 2006-07-25 |
System and method to determine impact of line end shortening
Grant 6,944,844 - Liu September 13, 2 | 2005-09-13 |
Alleviating line end shortening by extending phase shifters
Grant 6,859,918 - Ma , et al. February 22, 2 | 2005-02-22 |
System and method for correcting 3D effects in an alternating phase-shifting mask
Grant 6,830,854 - Liu , et al. December 14, 2 | 2004-12-14 |
Cell library that can automatically avoid forbidden pitches
App 20040218831 - Liu, Hua-Yu | 2004-11-04 |
Hybrid optical proximity correction for alternating aperture phase shifting designs
Grant 6,813,759 - Liu , et al. November 2, 2 | 2004-11-02 |
Simulation-based selection of evaluation points for model-based optical proximity correction
App 20040102945 - Liu, Hua-Yu | 2004-05-27 |
System and method for correcting 3D effects in an alternating phase-shifting mask
App 20040076895 - Liu, Yong ; et al. | 2004-04-22 |
Hybrid optical proximity correction for alternating aperture phase shifting designs
App 20040049761 - Liu, Hua-yu ; et al. | 2004-03-11 |
Automated flow in PSM phase assignment
Grant 6,704,921 - Liu March 9, 2 | 2004-03-09 |
Microloading effect correction
Grant 6,684,382 - Liu January 27, 2 | 2004-01-27 |
System and method for correcting 3D effects in an alternating phase-shifting mask
Grant 6,670,082 - Liu , et al. December 30, 2 | 2003-12-30 |
Method and apparatus for allowing phase conflicts in phase shifting mask and chromeless phase edges
Grant 6,664,009 - Liu December 16, 2 | 2003-12-16 |
Automated flow in PSM phase assignment
App 20030192025 - Liu, Hua-Yu | 2003-10-09 |
System and method to determine impact of line end shortening
App 20030192012 - Liu, Hua-Yu | 2003-10-09 |
Method and apparatus to facilitate test pattern design for model calibration and proximity correction
App 20030192015 - Liu, Hua-yu | 2003-10-09 |
System and method for determining manufacturing error enhancement factor
App 20030121021 - Liu, Hua-Yu ; et al. | 2003-06-26 |
Alleviating line end shortening in transistor endcaps by extending phase shifters
Grant 6,553,560 - Ma , et al. April 22, 2 | 2003-04-22 |
System and method for correcting 3D effects in an alternating phase-shifting mask
App 20030068564 - Liu, Yong ; et al. | 2003-04-10 |
Alleviating line end shortening by extending phase shifters
App 20030066038 - Ma, Melody W. ; et al. | 2003-04-03 |
Alternating phase shift mask design conflict resolution
App 20030056190 - Liu, Hua-Yu ; et al. | 2003-03-20 |
Microloading effect correction
App 20030046653 - Liu, Hua-Yu | 2003-03-06 |
Alternating phase shift mask design conflict resolution
Grant 6,523,165 - Liu , et al. February 18, 2 | 2003-02-18 |
Method and apparatus for allowing phase conflicts in phase shifting mask and chromeless phase edges
App 20030023401 - Liu, Hua-Yu | 2003-01-30 |
Alternating Phase Shift Mask Design Conflict Resolution
App 20030014732 - Liu, Hua-Yu ; et al. | 2003-01-16 |
Method and apparatus for reducing incidental exposure by using a phase shifter with a variable regulator
App 20020142231 - Kling, Michael E. ; et al. | 2002-10-03 |
Using double exposure effects during phase shifting to control line end shortening
App 20020142232 - Kling, Michael E. ; et al. | 2002-10-03 |
Alleviating line end shortening in transistor endcaps by extending phase shifters
App 20020144232 - Ma, Melody W. ; et al. | 2002-10-03 |
Single pass compensation for electron beam proximity effect
Grant 5,254,438 - Owen , et al. October 19, 1 | 1993-10-19 |
Method for compensating for the E-beam proximity effect
Grant 4,988,284 - Liu , et al. January 29, 1 | 1991-01-29 |
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