Ling; Moh Lung
Patent Applications and Registrations
Patent applications and USPTO patent grants for Ling; Moh Lung.The latest application filed is for "mask system employing substantially circular optical proximity correction target and method of manufacture thereof".
- Ling; Moh Lung - Singapore N/A SG
| Patent | Date |
|---|---|
| Methods for enhancing photolithography patterning Grant 8,450,046 - Ling , et al. May 28, 2 | 2013-05-28 |
| Mask system employing substantially circular optical proximity correction target and method of manufacture thereof Grant 8,413,083 - Tan , et al. April 2, 2 | 2013-04-02 |
| Mask System Employing Substantially Circular Optical Proximity Correction Target And Method Of Manufacture Thereof App 20100293516 - Tan; Sia Kim ; et al. | 2010-11-18 |
| Methods For Enhancing Photolithography Patterning App 20090214984 - LING; Moh Lung ; et al. | 2009-08-27 |
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