LINDLEY; Roger Alan

Patent Applications and Registrations

Patent applications and USPTO patent grants for LINDLEY; Roger Alan.The latest application filed is for "bonding structure of e chuck to aluminum base configuration".

Company Profile

4.14.17

LINDLEY; Roger Alan - Santa Clara CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Bonding Structure Of E Chuck To Aluminum Base Configuration App 20220063236 - PARKHE; Vijay D. ; et al.	2022-03-03
Bonding structure of e chuck to aluminum base configuration Grant 11,192,323 - Parkhe , et al. December 7, 2	2021-12-07
Bonding Structure Of E Chuck To Aluminum Base Configuration App 20200276785 - PARKHE; Vijay D. ; et al.	2020-09-03
System for coupling a voltage to spatially segmented portions of the wafer with variable voltage Grant 10,763,150 - Lindley , et al. Sep	2020-09-01
Bonding structure of E chuck to aluminum base configuration Grant 10,688,750 - Parkhe , et al.	2020-06-23
Bonding Structure Of E Chuck To Aluminum Base Configuration App 20190099977 - PARKHE; Vijay D. ; et al.	2019-04-04
System For Coupling A Voltage To Spatially Segmented Portions Of The Wafer With Variable Voltage App 20190088522 - LINDLEY; Roger Alan ; et al.	2019-03-21
Multiple Electrode Substrate Support Assembly And Phase Control System App 20180366306 - YANG; Yang ; et al.	2018-12-20
Multiple electrode substrate support assembly and phase control system Grant 10,153,139 - Yang , et al. Dec	2018-12-11
Multiple Electrode Substrate Support Assembly And Phase Control System App 20160372307 - YANG; YANG ; et al.	2016-12-22
Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor Grant 8,936,696 - Lindley , et al. January 20, 2	2015-01-20
Method and apparatus for automated validation of semiconductor process recipes Grant 8,527,081 - Hardy , et al. September 3, 2	2013-09-03
Plasma processing chamber with enhanced gas delivery Grant 8,382,939 - Kutney , et al. February 26, 2	2013-02-26
Method And Apparatus For Automated Validation Of Semiconductor Process Recipes App 20120053719 - HARDY; CHARLES ; et al.	2012-03-01
Method And Apparatus For Shaping A Magnetic Field In A Magnetic Field-enhanced Plasma Reactor App 20110115589 - LINDLEY; ROGER ALAN ; et al.	2011-05-19
Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor Grant 7,879,186 - Lindley , et al. February 1, 2	2011-02-01
Plasma Processing Chamber With Enhanced Gas Delivery App 20110006038 - Kutney; Michael Charles ; et al.	2011-01-13
Method And Apparatus For Shaping A Magnetic Field In A Magnetic Field-enhanced Plasma Reactor App 20090008033 - Lindley; Roger Alan ; et al.	2009-01-08
Plasma Processing Method App 20080260966 - Hanawa; Hiroji ; et al.	2008-10-23
Plasma Processing Apparatus App 20080257261 - Hanawa; Hiroji ; et al.	2008-10-23
Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor Grant 7,422,654 - Lindley , et al. September 9, 2	2008-09-09
Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor Grant 7,374,636 - Horioka , et al. May 20, 2	2008-05-20
Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber Grant 7,316,199 - Horioka , et al. January 8, 2	2008-01-08
Method For Shaping A Magnetic Field In A Magnetic Field-enhanced Plasma Reactor App 20070113980 - Lindley; Roger Alan ; et al.	2007-05-24
Method For Shaping A Magnetic Field In A Magnetic Field-enhanced Plasma Reactor App 20070108042 - Hogenson; Scott A. ; et al.	2007-05-17
Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor App 20040182516 - Lindley, Roger Alan ; et al.	2004-09-23
Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber App 20030085000 - Horioka, Keiji ; et al.	2003-05-08
Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor App 20030006008 - Horioka, Keiji ; et al.	2003-01-09

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