Lin; Yongjing

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lin; Yongjing.The latest application filed is for "p-type dipole for p-fet".

Company Profile

7.7.17

Lin; Yongjing - San Jose CA
Lin; Yongjing - Fremont CA
Lin; Yongjing - Chestnut Hill MA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
P-Type Dipole For P-FET App 20220165854 - Lin; Yongjing ; et al.	2022-05-26
Integrated Dipole Flow For Transistor App 20220115516 - Lin; Yongjing ; et al.	2022-04-14
P-type dipole for p-FET Grant 11,289,579 - Lin , et al. March 29, 2	2022-03-29
On stack overlay improvement for 3D NAND Grant 11,276,569 - Lin , et al. March 15, 2	2022-03-15
Apparatus And Methods For Gas Phase Particle Reduction App 20220064785 - MUSTAFA; Muhannad ; et al.	2022-03-03
Integrated dipole flow for transistor Grant 11,245,022 - Lin , et al. February 8, 2	2022-02-08
Fluorine-doped nitride films for improved high-k reliability Grant 11,171,047 - Yang , et al. November 9, 2	2021-11-09
Methods For Gapfill In Substrates App 20210287900 - YANG; Yixiong ; et al.	2021-09-16
Methods for gapfill in substrates Grant 11,101,128 - Yang , et al. August 24, 2	2021-08-24
Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursors Grant 11,075,276 - Lin , et al. July 27, 2	2021-07-27
PMOS High-K Metal Gates App 20210134972 - Yang; Yixiong ; et al.	2021-05-06
P-Type Dipole For P-FET App 20210098581 - Lin; Yongjing ; et al.	2021-04-01
Fluorine-Doped Nitride Films for Improved High-K Reliability App 20200411373 - Yang; Yixiong ; et al.	2020-12-31
Liner For V-nand Word Line Stack App 20200373318 - Wrench; Jacqueline S. ; et al.	2020-11-26
Integrated Dipole Flow For Transistor App 20200373404 - Lin; Yongjing ; et al.	2020-11-26
Methods And Apparatus For N-type Metal Oxide Semiconductor (nmos) Metal Gate Materials Using Atomic Layer Deposition (ald) Proce App 20200111885 - LIN; YONGJING ; et al.	2020-04-09
Methods Of Depositing Metal Carbide Films App 20200071825 - Kalutarage; Lakmal C. ; et al.	2020-03-05
On Stack Overlay Improvement For 3d Nand App 20200043723 - LIN; Yongjing ; et al.	2020-02-06
Method And Apparatus For Clamping And Declamping Substrates Using Electrostatic Chucks App 20170162417 - YE; Zheng John ; et al.	2017-06-08
Hematite Photovoltaic Junctions App 20140061036 - Wang; Dunwei ; et al.	2014-03-06
Nanonet-Based Hematite Hetero-Nanostructures for Solar Energy Conversions and Methods of Fabricating Same App 20140000697 - Wang; Dunwei ; et al.	2014-01-02
Hetero-nanostructures for solar energy conversions and methods of fabricating same Grant 8,216,436 - Wang , et al. July 10, 2	2012-07-10
Hetero-Nanostructures for Solar Energy Conversions and Methods of Fabricating Same App 20100043877 - Wang; Dunwei ; et al.	2010-02-25

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.