LIN; Yixing

Patent Applications and Registrations

Patent applications and USPTO patent grants for LIN; Yixing.The latest application filed is for "high throughput and metal contamination control oven for chamber component cleaning process".

Company Profile

5.14.17

LIN; Yixing - Saratoga CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
High Throughput And Metal Contamination Control Oven For Chamber Component Cleaning Process App 20220275505 - LIAO; Chien-Min ; et al.	2022-09-01
Protective yttria coating for semiconductor equipment parts Grant 11,047,035 - Gopalan , et al. June 29, 2	2021-06-29
Substrate Support Cover For High-temperature Corrosive Environment App 20200370174 - SHENG; Shuran ; et al.	2020-11-26
30 nm in-line LPC testing and cleaning of semiconductor processing equipment Grant 10,583,465 - Wang , et al.	2020-03-10
Protective Yttria Coating For Semiconductor Equipment Parts App 20190264314 - Gopalan; Ramesh ; et al.	2019-08-29
Method for forming yttrium oxide on semiconductor processing equipment Grant 10,253,406 - Kalita , et al.	2019-04-09
Aluminum electroplating and oxide formation as barrier layer for aluminum semiconductor process equipment Grant 10,233,554 - Pareek , et al.	2019-03-19
30 Nm In-line Lpc Testing And Cleaning Of Semiconductor Processing Equipment App 20170299487 - WANG; Jianqi ; et al.	2017-10-19
Aluminum Electroplating And Oxide Formation As Barrier Layer For Aluminum Semiconductor Process Equipment App 20170260639 - PAREEK; Yogita ; et al.	2017-09-14
Method For Electrochemically Grown Yttria Or Yttrium Oxide On Semiconductor Processing Equipment App 20170260618 - KALITA; Laksheswar ; et al.	2017-09-14
Process chamber component with layered coating and method Grant 8,021,743 - Lin , et al. September 20, 2	2011-09-20
Cleaning and refurbishing chamber components having metal coatings Grant 7,910,218 - Lin , et al. March 22, 2	2011-03-22
Process Chamber Component With Layered Coating And Method App 20100086805 - Lin; Yixing ; et al.	2010-04-08
Process chamber component with layered coating and method Grant 7,579,067 - Lin , et al. August 25, 2	2009-08-25
Method of coating semiconductor processing apparatus with protective yttrium-containing coatings App 20080213496 - Sun; Jennifer Y. ; et al.	2008-09-04
Semiconductor processing apparatus including plasma-resistant, welded aluminum structures Grant 7,055,732 - Thach , et al. June 6, 2	2006-06-06
Process chamber component with layered coating and method App 20060110620 - Lin; Yixing ; et al.	2006-05-25
Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus Grant 7,048,814 - Lin , et al. May 23, 2	2006-05-23
Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus Grant 7,033,447 - Lin , et al. April 25, 2	2006-04-25
Refurbishment of a coated chamber component App 20050238807 - Lin, Yixing ; et al.	2005-10-27
Cleaning and refurbishing chamber components having metal coatings App 20050089699 - Lin, Yixing ; et al.	2005-04-28
Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers Grant 6,776,873 - Sun , et al. August 17, 2	2004-08-17
Clean aluminum alloy for semiconductor processing equipment Grant 6,713,188 - Wu , et al. March 30, 2	2004-03-30
Semiconductor processing apparatus including plasma-resistant, welded aluminum structures App 20040041004 - Thach, Senh ; et al.	2004-03-04
Plasma-resistant, welded aluminum structures for use in semiconductor apparatus Grant 6,659,331 - Thach , et al. December 9, 2	2003-12-09
Clean Aluminum Alloy For Semiconductor Processing Equipment App 20030224188 - Wu, Shun ; et al.	2003-12-04
Halogen-resistant, anodized aluminium for use in semiconductor processing apparatus App 20030205479 - Lin, Yixing ; et al.	2003-11-06
Laser drilled surfaces for substrate processing chambers App 20030188685 - Wang, Hong ; et al.	2003-10-09
Plasma-resistant, welded aluminum structures for use in semiconductor apparatus App 20030160085 - Thach, Senh ; et al.	2003-08-28
Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus App 20030150530 - Lin, Yixing ; et al.	2003-08-14
Clean aluminum alloy for semiconductor processing equipment Grant 6,565,984 - Wu , et al. May 20, 2	2003-05-20

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