loadpatents
Patent applications and USPTO patent grants for Lin; Yei-Hsiung.The latest application filed is for "method of forming self-aligned silicides".
Patent | Date |
---|---|
Method of forming self-aligned silicides Grant 7,432,181 - Lin , et al. October 7, 2 | 2008-10-07 |
Method of forming self-aligned silicides App 20060121708 - Lin; Yei-Hsiung ;   et al. | 2006-06-08 |
Method Of Forming A Metallic Interconnect Structure With A Metallic Spacer App 20030038371 - Hsue, Chen-Chiu ;   et al. | 2003-02-27 |
Interconnects with dual dielectric spacers and method for forming the same App 20020177080 - Chung, Cheng-Hui ;   et al. | 2002-11-28 |
Interconnects with dielectric spacers and method for forming the same App 20020177299 - Lin, Yei-Hsiung ;   et al. | 2002-11-28 |
Electrostatic discharge effect free mask App 20020115001 - Hsue, Chen-Chiu ;   et al. | 2002-08-22 |
Method for forming shallow junctions by increasing width of photoresist and using implanting through poly film App 20020102785 - Ho, James ;   et al. | 2002-08-01 |
Method of manufacturing mixed mode semiconductor device Grant 6,242,315 - Lin , et al. June 5, 2 | 2001-06-05 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.