Lin; Wei-Ray

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lin; Wei-Ray.The latest application filed is for "overlay error and process window metrology".

Company Profile

4.9.2

Lin; Wei-Ray - Hsinchu TW
LIN; Wei-Ray - Hsinchu City TW
Lin; Wei-Ray - Taipei TW
Lin; Wei-Ray - Yi Lan TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Overlay error and process window metrology Grant 10,879,135 - Fang , et al. December 29, 2	2020-12-29
Overlay Error And Process Window Metrology App 20200118893 - FANG; Shang-Wei ; et al.	2020-04-16
Overlay error and process window metrology Grant 10,510,623 - Fang , et al. Dec	2019-12-17
Overlay Error And Process Window Metrology App 20190198403 - FANG; Shang-Wei ; et al.	2019-06-27
Methods for producing capacitor-node contact plugs of dynamic random-access memory Grant 6,329,241 - Lin December 11, 2	2001-12-11
Method of fabricating a self-aligned contact Grant 6,248,643 - Hsieh , et al. June 19, 2	2001-06-19
Method of fabricating a capacitor under bit line DRAM structure using contact hole liners Grant 6,184,081 - Jeng , et al. February 6, 2	2001-02-06
Methods for shallow trench isolation Grant 6,159,821 - Cheng , et al. December 12, 2	2000-12-12
Method of planarizing a structure having an interpoly layer Grant 6,143,664 - Yao , et al. November 7, 2	2000-11-07
Method of making a shallow trench isolation for ULSI formation via in-direct CMP process Grant 6,057,210 - Yang , et al. May 2, 2	2000-05-02
Method of fabricating a shallow trench isolation by using oxide/oxynitride layers Grant 6,001,704 - Cheng , et al. December 14, 1	1999-12-14

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