Lin; Tsang-Jung

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lin; Tsang-Jung.The latest application filed is for "method of fabricating a semiconductor device".

Company Profile

0.3.7

Lin; Tsang-Jung - Tao-Yuan Hsien TW
Lin, Tsang-Jung - Hsinchu TW
Lin, Tsang Jung - Taoyuan Hsien TW
Lin, Tsang Jung - Chungli City TW
LIN, TSANG-JUNG - CHUNG-LI CITY TW
Lin; Tsang-Jung - Chungli TW
Lin; Tsang-Jung - Hsin-Chu TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method Of Fabricating A Semiconductor Device App 20080254619 - Lin; Tsang-Jung ; et al.	2008-10-16
Cmp Apparatus For Polishing Dielectric Layer And Method Of Controlling Dielectric Layer Thickness App 20070145538 - Lin; Tsang-Jung	2007-06-28
Semiconductor process apparatus and SMIF pod used therein App 20040101385 - Chang, Ta-Kuang ; et al.	2004-05-27
Device for chemical mechanical polishing App 20030134581 - Wang, Hsing Maw ; et al.	2003-07-17
Apparatus for chemical mechanical polishing App 20030114076 - Chang, Hui-Chun ; et al.	2003-06-19
Method of depositing thin films and apparatus for depositing the same App 20030056727 - Lin, Tsang Jung ; et al.	2003-03-27
Chemical-mechanical Polishing Apparatus With Megasonic Energy Slurry Supply System App 20010050142 - LIN, TSANG-JUNG	2001-12-13
Slurry providing system Grant 6,132,078 - Lin October 17, 2	2000-10-17
Intermetal dielectric layer formation with low dielectric constant using high density plasma chemical vapor deposition process Grant 6,100,205 - Liu , et al. August 8, 2	2000-08-08
Chemical-mechanical polishing station with end-point monitoring device Grant 6,077,147 - Yang , et al. June 20, 2	2000-06-20

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