Lin; Shun-Wu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lin; Shun-Wu.The latest application filed is for "semiconductor devices including backside power rails and methods of manufacture".

Company Profile

6.18.20

Lin; Shun-Wu - Hsinchu TW
LIN; SHUN WU - TAICHUNG CITY TW
Lin; Shun Wu - Taichung TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Semiconductor Devices Including Backside Power Rails and Methods of Manufacture App 20220310785 - Wu; Chun-Hung ; et al.	2022-09-29
Etchant For Etching A Cobalt-containing Member In A Semiconductor Structure And Method Of Etching A Cobalt-containing Member In A Semiconductor Structure App 20220216066 - CHEN; REN-KAI ; et al.	2022-07-07
Semiconductor Device and Method of Manufacture App 20210384034 - Lian; Jian-Jou ; et al.	2021-12-09
Semiconductor device and method of manufacture Grant 11,101,135 - Lian , et al. August 24, 2	2021-08-24
Wet etch chemistry for selective silicon etch Grant 10,676,668 - Yang , et al.	2020-06-09
Semiconductor Device and Method of Manufacture App 20200161137 - Lian; Jian-Jou ; et al.	2020-05-21
Semiconductor device and method of manufacture Grant 10,529,572 - Lian , et al. J	2020-01-07
Semiconductor Device and Method of Manufacture App 20190333770 - Lian; Jian-Jou ; et al.	2019-10-31
Wet Etch Chemistry For Selective Silicon Etch App 20190119570 - YANG; Neng-Jye ; et al.	2019-04-25
Wet etch chemistry for selective silicon etch Grant 10,179,878 - Yang , et al. Ja	2019-01-15
Wet Etch Chemistry For Selective Silicon Etch App 20180171226 - YANG; Neng-Jye ; et al.	2018-06-21
Method of patterning a metal gate of semiconductor device Grant 9,362,124 - Chen , et al. June 7, 2	2016-06-07
Method Of Patterning A Metal Gate Of Semiconductor Device App 20150206755 - Chen; Chien-Hao ; et al.	2015-07-23
Method of patterning a metal gate of semiconductor device Grant 8,993,452 - Yeh , et al. March 31, 2	2015-03-31
Method of Patterning a Metal Gate of Semiconductor Device App 20130130488 - Yeh; Matt ; et al.	2013-05-23
Method for removing dummy poly in a gate last process Grant 8,415,254 - Yeh , et al. April 9, 2	2013-04-09
Method of patterning a metal gate of semiconductor device Grant 8,357,617 - Yeh , et al. January 22, 2	2013-01-22
Methods for forming metal gate transistors Grant 8,268,085 - Yeh , et al. September 18, 2	2012-09-18
Method of fabricating gate electrode using a treated hard mask Grant 8,173,504 - Yeh , et al. May 8, 2	2012-05-08
Method of controlling gate thickness in forming FinFET devices Grant 8,114,721 - Lin , et al. February 14, 2	2012-02-14
Method for metal gate N/P patterning Grant 8,048,810 - Tsai , et al. November 1, 2	2011-11-01
Method Of Fabricating Gate Electrode Using A Treated Hard Mask App 20110250725 - YEH; Matt ; et al.	2011-10-13
Method For Metal Gate N/p Patterning App 20110189847 - Tsai; Fang Wen ; et al.	2011-08-04
Method Of Controlling Gate Thickness In Forming Finfet Devices App 20110143510 - LIN; Shun Wu ; et al.	2011-06-16
Method Of Controlling Gate Thicknesses In Forming Fusi Gates App 20110097867 - LIN; Shun Wu ; et al.	2011-04-28
Method for patterning a metal gate Grant 7,915,105 - Yeh , et al. March 29, 2	2011-03-29
Methods For Forming Metal Gate Transistors App 20100240204 - YEH; Matt ; et al.	2010-09-23
High selectivity etching process for metal gate N/P patterning Grant 7,732,344 - Tsai , et al. June 8, 2	2010-06-08
Surface preparation for gate oxide formation that avoids chemical oxide formation Grant 7,727,900 - Yeh , et al. June 1, 2	2010-06-01
Novel Method For Removing Dummy Poly In A Gate Last Process App 20100124823 - Yeh; Matt ; et al.	2010-05-20
Method For Patterning A Metal Gate App 20100112811 - Yeh; Matt ; et al.	2010-05-06
Method Of Patterning A Metal Gate Of Semiconductor Device App 20100048011 - Yeh; Matt ; et al.	2010-02-25
High Temperature Spm Treatment For Photoresist Stripping App 20080060682 - Yeh; Matt ; et al.	2008-03-13
Surface preparation for gate oxide formation that avoids chemical oxide formation App 20070197037 - Yeh; Matt ; et al.	2007-08-23
Method of depositing an epitaxial layer of SiGe subsequent to a plasma etch Grant 7,129,184 - Chang , et al. October 31, 2	2006-10-31
Method of depositing an epitaxial layer of SiGe subsequent to a plasma etch App 20060113282 - Chang; Chih-Chien ; et al.	2006-06-01

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