Lin; Shun-Li

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lin; Shun-Li.The latest application filed is for "method for analyzing overlay errors".

Company Profile

0.9.13

Lin; Shun-Li - Hsinchu TW
Lin, Shun-Li - Hsin-Chu TW
Lin, Shun-Li - Yun-Lin Hsien TW
Lin, Shun-Li - Yun-Lin Hsiang TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Structure applied to a photolithographic process Grant 7,683,487 - Lin , et al. March 23, 2	2010-03-23
Method for analyzing overlay errors Grant 7,586,609 - Lin , et al. September 8, 2	2009-09-08
Photoresist with adjustable polarized light reaction and photolithography process using the photoresist Grant 7,157,215 - Lin , et al. January 2, 2	2007-01-02
Methods of code programming a mask ROM device Grant 7,132,334 - Lin November 7, 2	2006-11-07
Method for analyzing overlay errors App 20060238761 - Lin; Shun-Li ; et al.	2006-10-26
Structure Applied To A Photolithographic Process App 20060199375 - Lin; Shun-Li ; et al.	2006-09-07
Structure applied to a photolithographic process and method for fabricating a semiconductor device Grant 7,008,870 - Lin , et al. March 7, 2	2006-03-07
Overlay error model, sampling strategy and associated equipment for implementation Grant 6,975,974 - Chien , et al. December 13, 2	2005-12-13
Mask with extended mask clear-out window and method of dummy exposure using the same Grant 6,960,411 - Yen , et al. November 1, 2	2005-11-01
[structure Applied To A Photolithographic Process And Method For Fabricating A Semiconductor Device] App 20050148166 - LIN, SHUN-LI ; et al.	2005-07-07
Methods of code programming a mask ROM device App 20050064668 - Lin, Shun Li	2005-03-24
Template padding method for padding edges of holes on semiconductor masks App 20050003617 - Lin, Shun-Li ; et al.	2005-01-06
Photoresist with adjustable polarized light reaction and photolithography process using the photoresist App 20040265739 - Lin, Shun-Li ; et al.	2004-12-30
Mask with extended mask clear-out window and method of dummy exposure using the same App 20040110070 - Yen, Yu-Lin ; et al.	2004-06-10
Method of optical proximity correction Grant 6,660,458 - Lin December 9, 2	2003-12-09
Method for manufacturing a semiconductor device App 20030198898 - Lin, Shun-Li ; et al.	2003-10-23
Method for reducing roughness of photoresist through cross-linking reaction of deposit and photoresist Grant 6,627,388 - Lin , et al. September 30, 2	2003-09-30
Method for eliminating corner round profile of the RELACS process App 20030129538 - Sheu, Wei-Hwa ; et al.	2003-07-10
Photoresist with adjustable polarized light reaction and photolithography process using the photoresist App 20030022099 - Lin, Shun-Li ; et al.	2003-01-30
Overlay error model, sampling strategy and associated equipment for implementation App 20020183989 - Chien, Chen-Fu ; et al.	2002-12-05
Optical proximity correction with rectangular contact App 20020158214 - Lin, Shun-Li ; et al.	2002-10-31
Method of improving astigmatism of a photoresist layer App 20020160314 - Lin, Shun-Li ; et al.	2002-10-31

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.