Patent | Date |
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Methods for enhancing photolithography patterning Grant 8,450,046 - Ling , et al. May 28, 2 | 2013-05-28 |
Method and apparatus for removing radiation side lobes Grant 8,048,588 - Tan , et al. November 1, 2 | 2011-11-01 |
Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask Grant 8,034,543 - Chua , et al. October 11, 2 | 2011-10-11 |
Integrated circuit system employing multiple exposure dummy patterning technology Grant 8,003,311 - Tan , et al. August 23, 2 | 2011-08-23 |
Integrated circuit system employing dipole multiple exposure Grant 7,926,000 - Tan , et al. April 12, 2 | 2011-04-12 |
Integrated circuit system with assist feature Grant 7,836,420 - Tan , et al. November 16, 2 | 2010-11-16 |
Angled-wedge Chrome-face Wall For Intensity Balance Of Alternating Phase Shift Mask App 20100197140 - CHUA; Gek Soon ;   et al. | 2010-08-05 |
Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask Grant 7,674,562 - Chua , et al. March 9, 2 | 2010-03-09 |
Phase shifting photolithography system Grant 7,649,612 - Lin , et al. January 19, 2 | 2010-01-19 |
Methods For Enhancing Photolithography Patterning App 20090214984 - LING; Moh Lung ;   et al. | 2009-08-27 |
Integrated Circuit System Employing Multiple Exposure Dummy Patterning Technology App 20090181551 - Tan; Sia Kim ;   et al. | 2009-07-16 |
Polarizing photolithography system Grant 7,560,199 - Tan , et al. July 14, 2 | 2009-07-14 |
Method and apparatus for contact hole unit cell formation Grant 7,556,891 - Tan , et al. July 7, 2 | 2009-07-07 |
Integrated Circuit System With Assist Feature App 20090102069 - Tan; Sia Kim ;   et al. | 2009-04-23 |
Method to resolve line end distortion for alternating phase shift mask Grant 7,445,874 - Tan , et al. November 4, 2 | 2008-11-04 |
Integrated Circuit System Employing Dipole Multiple Exposure App 20080217726 - Tan; Sia Kim ;   et al. | 2008-09-11 |
System and method for phase shift assignment Grant 7,421,676 - Tan , et al. September 2, 2 | 2008-09-02 |
Anti-reflective sidewall coated alternating phase shift mask and fabrication method Grant 7,384,714 - Tan , et al. June 10, 2 | 2008-06-10 |
Phase Shifting Photolithography System App 20070177121 - Lin; Qunying ;   et al. | 2007-08-02 |
Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask App 20070128527 - Chua; Gek Soon ;   et al. | 2007-06-07 |
Polarizing Photolithography System App 20070092839 - Tan; Sia Kim ;   et al. | 2007-04-26 |
Method to resolve line end distortion for alternating phase shift mask App 20060099518 - Tan; Sia Kim ;   et al. | 2006-05-11 |
Anti-reflective sidewall coated alternating phase shift mask and fabrication method App 20060088771 - Tan; Sia Kim ;   et al. | 2006-04-27 |
Method and apparatus for contact hole unit cell formation App 20060088770 - Tan; Soon Yoeng ;   et al. | 2006-04-27 |
Method and apparatus for removing radiation side lobes App 20060083994 - Tan; Sia Kim ;   et al. | 2006-04-20 |
System and method for phase shift assignment App 20060075376 - Tan; Sia Kim ;   et al. | 2006-04-06 |