loadpatents
name:-0.010977029800415
name:-0.0088570117950439
name:-0.00044918060302734
Lin; Qun Ying Patent Filings

Lin; Qun Ying

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lin; Qun Ying.The latest application filed is for "determination of lithography tool process condition".

Company Profile
0.8.11
  • Lin; Qun Ying - Singapore SG
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Litho scanner alignment signal improvement
Grant 9,034,720 - Liu , et al. May 19, 2
2015-05-19
Determination Of Lithography Tool Process Condition
App 20140170539 - ZHOU; Wenzhan ;   et al.
2014-06-19
Determination of lithography tool process condition
Grant 8,741,511 - Zhou , et al. June 3, 2
2014-06-03
Litho Scanner Alignment Signal Improvement
App 20140050439 - LIU; Hui ;   et al.
2014-02-20
Waferless Measurement Recipe
App 20140019927 - YUDHISTIRA; Yasri ;   et al.
2014-01-16
Mask and method to pattern chromeless phase lithography contact hole
Grant 8,057,968 - Tan , et al. November 15, 2
2011-11-15
Monitoring structure
Grant 7,866,224 - Tan , et al. January 11, 2
2011-01-11
Mask And Method To Pattern Chromeless Phase Lithography Contact Hole
App 20100196805 - TAN; Sia Kim ;   et al.
2010-08-05
Mask and method to pattern chromeless phase lithography contact hole
Grant 7,655,388 - Tan , et al. February 2, 2
2010-02-02
Monitoring Structure
App 20080127998 - Tan; Sia Kim ;   et al.
2008-06-05
Method for dual damascene patterning with single exposure using tri-tone phase shift mask
Grant 7,288,366 - Tan , et al. October 30, 2
2007-10-30
Mask and method to pattern chromeless phase lithography contact hole
App 20060147813 - Tan; Sya Kim ;   et al.
2006-07-06
Structure and method to fabricate a protective sidewall liner for an optical mask
App 20060105520 - Tan; Sia Kim ;   et al.
2006-05-18
Half tone alternating phase shift masks
Grant 7,014,962 - Lin , et al. March 21, 2
2006-03-21
Method for dual damascene patterning with single exposure using tri-tone phase shift mask
App 20050089763 - Tan, Sia Kim ;   et al.
2005-04-28
Half tone alternating phase shift masks
App 20050058912 - Lin, Qun Ying ;   et al.
2005-03-17

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