Lin; Louis

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lin; Louis.The latest application filed is for "forming a protective layer to prevent formation of leakage paths".

Company Profile

2.4.6

Lin; Louis - Hsinchu TW
Lin; Louis - Taichung TW
LIN; Louis - Taichung City TW
Lin; Louis - Hsinchu City TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Forming a Protective Layer to Prevent Formation of Leakage Paths App 20210358813 - Hsu; Leo ; et al.	2021-11-18
Forming a protective layer to prevent formation of leakage paths Grant 11,081,397 - Hsu , et al. August 3, 2	2021-08-03
Down-pressed clamp base Grant 10,569,141 - Lin Feb	2020-02-25
Forming a Protective Layer to Prevent Formation of Leakage Paths App 20200043800 - Hsu; Leo ; et al.	2020-02-06
Down-pressed Clamp Base App 20190366161 - LIN; Louis	2019-12-05
Forming a protective layer to prevent formation of leakage paths Grant 10,446,449 - Hsu , et al. Oc	2019-10-15
Forming a Protective Layer to Prevent Formation of Leakage Paths App 20180308760 - Hsu; Leo ; et al.	2018-10-25
Forming a protective layer to prevent formation of leakage paths Grant 10,008,416 - Hsu , et al. June 26, 2	2018-06-26
Forming A Protective Layer To Prevent Formation Of Leakage Paths App 20180151445 - Hsu; Leo ; et al.	2018-05-31
Sub-resolution Assist Feature Of A Photomask App 20090258302 - Ho; Jeng-Shiun ; et al.	2009-10-15

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