loadpatents
Patent applications and USPTO patent grants for Lin; Li-Te.The latest application filed is for "apparatus and method for directional etch with micron zone beam and angle control".
Patent | Date |
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Apparatus and Method for Directional Etch with Micron Zone Beam and Angle Control App 20220297234 - Yang; Chansyun David ;   et al. | 2022-09-22 |
Semiconductor device Grant 11,424,341 - Lo , et al. August 23, 2 | 2022-08-23 |
Semiconductor device structure and method for forming the same Grant 11,417,751 - Lin , et al. August 16, 2 | 2022-08-16 |
Technique for semiconductor manufacturing Grant 11,373,878 - Lin , et al. June 28, 2 | 2022-06-28 |
Semiconductor Device With Reduced Loading Effect App 20220181212 - Chen; Wei-Lun ;   et al. | 2022-06-09 |
Apparatus and method for directional etch with micron zone beam and angle control Grant 11,351,635 - Yang , et al. June 7, 2 | 2022-06-07 |
Semiconductor Device And Manufacturing Method Thereof App 20220173224 - LIN; Han-Yu ;   et al. | 2022-06-02 |
Fine Line Patterning Methods App 20220157605 - HUANG; Shih-Chun ;   et al. | 2022-05-19 |
Method And Equipment For Forming Gaps In A Material Layer App 20220157648 - YANG; Chan-Syun David ;   et al. | 2022-05-19 |
Semiconductor Fabrication System Embedded with Effective Baking Module App 20220130693 - Lin; Han-Yu ;   et al. | 2022-04-28 |
Semiconductor Arrangement And Method For Making App 20220093469 - Chen; Wei-Lun ;   et al. | 2022-03-24 |
Semiconductor Device Structure With Metal Gate Stack App 20220085189 - CHANG; Jung-Hao ;   et al. | 2022-03-17 |
Semiconductor device with reduced loading effect Grant 11,264,281 - Chen , et al. March 1, 2 | 2022-03-01 |
Semiconductor Device Structure With Inner Spacer Layer App 20220045194 - LIN; Han-Yu ;   et al. | 2022-02-10 |
Method and equipment for forming gaps in a material layer Grant 11,244,856 - Yang , et al. February 8, 2 | 2022-02-08 |
Fine line patterning methods Grant 11,239,078 - Huang , et al. February 1, 2 | 2022-02-01 |
Method Of Fabricating A Semiconductor Device App 20220029002 - LO; Yi-Chen ;   et al. | 2022-01-27 |
Spacer Structure For Semiconductor Device And Method For Forming The Same App 20220020644 - LIN; Han-Yu ;   et al. | 2022-01-20 |
Technique For Semiconductor Manufacturing App 20220020595 - LIN; HAN-YU ;   et al. | 2022-01-20 |
Semiconductor fabrication system embedded with effective baking module Grant 11,222,794 - Lin , et al. January 11, 2 | 2022-01-11 |
Semiconductor arrangement and method of manufacture Grant 11,217,487 - Lo , et al. January 4, 2 | 2022-01-04 |
Air gap spacer and related methods Grant 11,205,700 - Yang , et al. December 21, 2 | 2021-12-21 |
Inner Spacer Formation in Multi-Gate Transistors App 20210391447 - Lin; Han-Yu ;   et al. | 2021-12-16 |
Nanowire stack GAA device and methods for producing the same Grant 11,201,243 - Yang , et al. December 14, 2 | 2021-12-14 |
Structure and formation method of semiconductor device with metal gate stack Grant 11,201,229 - Yang , et al. December 14, 2 | 2021-12-14 |
Semiconductor Device And Method For Manufacturing The Same App 20210384325 - CHANG; Jung-Hao ;   et al. | 2021-12-09 |
Semiconductor arrangement and method for making Grant 11,195,759 - Chen , et al. December 7, 2 | 2021-12-07 |
Method Of Manufacturing Semiconductor Devices Using Directional Process App 20210375639 - YEH; Ya-Wen ;   et al. | 2021-12-02 |
Structure and formation method of semiconductor device with metal gate stack Grant 11,183,580 - Chang , et al. November 23, 2 | 2021-11-23 |
Method for FinFET Fabrication and Structure Thereof App 20210327764 - Lin; Han-Yu ;   et al. | 2021-10-21 |
Method for forming semiconductor device structure with inner spacer layer Grant 11,152,491 - Lin , et al. October 19, 2 | 2021-10-19 |
Method of fabricating a semiconductor device Grant 11,145,749 - Lo , et al. October 12, 2 | 2021-10-12 |
Semiconductor Device Structure And Method For Forming The Same App 20210313449 - LIN; Tze-Chung ;   et al. | 2021-10-07 |
Semiconductor Device And Manufacturing Method Thereof App 20210305409 - WU; Zhi-Qiang ;   et al. | 2021-09-30 |
Method OF FORMING METAL FEATURES App 20210272807 - Chang; Po-Chin ;   et al. | 2021-09-02 |
Inner spacer formation in multi-gate transistors Grant 11,107,904 - Lin , et al. August 31, 2 | 2021-08-31 |
Semiconductor device and method for manufacturing the same Grant 11,107,907 - Chang , et al. August 31, 2 | 2021-08-31 |
Reducing Pattern Loading in the Etch-Back of Metal Gate App 20210257478 - Chang; Po-Chin ;   et al. | 2021-08-19 |
Method of manufacturing semiconductor devices using directional process Grant 11,094,556 - Yeh , et al. August 17, 2 | 2021-08-17 |
Fin patterning methods for increased process margins Grant 11,081,354 - Tseng , et al. August 3, 2 | 2021-08-03 |
Gate Etch Back With Reduced Loading Effect App 20210210614 - LO; Yi-Chen ;   et al. | 2021-07-08 |
Method for FinFET fabrication and structure thereof Grant 11,056,393 - Lin , et al. July 6, 2 | 2021-07-06 |
Methods of Reducing Gate Spacer Loss During Semiconductor Manufacturing App 20210202247 - Jhan; Yi-Ruei ;   et al. | 2021-07-01 |
Air Spacers in Transistors and Methods Forming Same App 20210202712 - Chen; Yi-Lun ;   et al. | 2021-07-01 |
Directional patterning method Grant 11,043,381 - Chang , et al. June 22, 2 | 2021-06-22 |
Semiconductor device and manufacturing method thereof Grant 11,024,721 - Wu , et al. June 1, 2 | 2021-06-01 |
Reducing pattern loading in the etch-back of metal gate Grant 10,998,421 - Chang , et al. May 4, 2 | 2021-05-04 |
Structure And Formation Method Of Semiconductor Device With Metal Gate Stack App 20210119012 - YANG; Chansyun David ;   et al. | 2021-04-22 |
Pattern Fidelity Enhancement App 20210118674 - Shen; Yu-Tien ;   et al. | 2021-04-22 |
Semiconductor Device and Method of Manufacture App 20210111071 - Yang; Chan Syun David ;   et al. | 2021-04-15 |
Air spacers in transistors and methods forming same Grant 10,964,795 - Chen , et al. March 30, 2 | 2021-03-30 |
Gate etch back with reduced loading effect Grant 10,957,779 - Lo , et al. March 23, 2 | 2021-03-23 |
Methods of reducing gate spacer loss during semiconductor manufacturing Grant 10,950,434 - Jhan , et al. March 16, 2 | 2021-03-16 |
Nanowire Stack Gaa Device And Methods For Producing The Same App 20210066490 - Yang; Chansyun David ;   et al. | 2021-03-04 |
Semiconductor Device With Elongated Pattern App 20210013103 - CHANG; Po-Chin ;   et al. | 2021-01-14 |
Via In Semiconductor Device Structure App 20200411378 - HUANG; Chun-Jui ;   et al. | 2020-12-31 |
Method Of Forming Semiconductor Structure Having Layer With Re-entrant Profile App 20200388529 - CHEN; Yi-Shan ;   et al. | 2020-12-10 |
Air spacers in transistors and methods forming same Grant 10,861,953 - Chen , et al. December 8, 2 | 2020-12-08 |
Etch selectivity improved by laser beam Grant 10,861,706 - Ouyang , et al. December 8, 2 | 2020-12-08 |
Semiconductor device and method of manufacture Grant 10,861,745 - Yang , et al. December 8, 2 | 2020-12-08 |
Pattern fidelity enhancement Grant 10,861,698 - Shen , et al. December 8, 2 | 2020-12-08 |
Structure And Formation Method Of Semiconductor Device With Metal Gate Stack App 20200381535 - Chang; Jung-Hao ;   et al. | 2020-12-03 |
Method for forming semiconductor device Grant 10,847,633 - Jhan , et al. November 24, 2 | 2020-11-24 |
Semiconductor Device App 20200357899 - LO; Yi-Chen ;   et al. | 2020-11-12 |
Fine Line Patterning Methods App 20200335340 - HUANG; Shih-Chun ;   et al. | 2020-10-22 |
Elongated pattern and formation thereof Grant 10,790,195 - Chang , et al. September 29, 2 | 2020-09-29 |
Multi-etching process for forming via opening in semiconductor device structure Grant 10,777,455 - Huang , et al. Sept | 2020-09-15 |
Semiconductor Device Having Fins App 20200287047 - KUO; Shu-Hao ;   et al. | 2020-09-10 |
Method for manufacturing semiconductor device Grant 10,755,943 - Chang , et al. A | 2020-08-25 |
Method of forming semiconductor structure having layer with re-entrant profile Grant 10,755,968 - Chen , et al. A | 2020-08-25 |
Method for manufacturing semiconductor device Grant 10,741,671 - Lo , et al. A | 2020-08-11 |
Multi-etching Process For Forming Via Opening In Semiconductor Device Structure App 20200243385 - HUANG; Chun-Jui ;   et al. | 2020-07-30 |
Directional Patterning Method App 20200243336 - Chang; Po-Chin ;   et al. | 2020-07-30 |
Fine line patterning methods Grant 10,707,081 - Huang , et al. | 2020-07-07 |
CMOS semiconductor device having fins and method of fabricating the same Grant 10,680,109 - Kuo , et al. | 2020-06-09 |
Semiconductor Arrangement And Method Of Manufacture App 20200176323 - LO; Yi-Chen ;   et al. | 2020-06-04 |
Semiconductor Arrangement And Method For Making App 20200176320 - CHEN; Wei-Lun ;   et al. | 2020-06-04 |
Fin Patterning Methods for Increased Process Margins App 20200152464 - Tseng; Chin-Yuan ;   et al. | 2020-05-14 |
Computer power saving method and computer waking method Grant 10,645,650 - Lin , et al. | 2020-05-05 |
Etch Selectivity Improved By Laser Beam App 20200135483 - OUYANG; Christine Y. ;   et al. | 2020-04-30 |
Semiconductor Device And Method For Manufacturing The Same App 20200135901 - CHANG; Jung-Hao ;   et al. | 2020-04-30 |
Apparatus and Method for Directional Etch with Micron Zone Beam and Angle Control App 20200130102 - Yang; Chansyun David ;   et al. | 2020-04-30 |
Inner Spacer Formation in Multi-Gate Transistors App 20200127119 - Lin; Han-Yu ;   et al. | 2020-04-23 |
Method for FinFET Fabrication and Structure Thereof App 20200105604 - Lin; Han-Yu ;   et al. | 2020-04-02 |
Semiconductor Device And Manufacturing Method Thereof App 20200098890 - WU; Zhi-Qiang ;   et al. | 2020-03-26 |
Method For Forming Semiconductor Device Structure With Inner Spacer Layer App 20200066872 - LIN; Han-Yu ;   et al. | 2020-02-27 |
Elongated Pattern And Formation Thereof App 20200043795 - CHANG; Po-Chin ;   et al. | 2020-02-06 |
Computer Power Saving Method And Computer Waking Method App 20200029277 - LIN; Ko-Hui ;   et al. | 2020-01-23 |
Air Gap Spacer and Related Methods App 20200020776 - Yang; Chan Syun David ;   et al. | 2020-01-16 |
Reducing Pattern Loading in the Etch-Back of Metal Gate App 20200020785 - Chang; Po-Chin ;   et al. | 2020-01-16 |
Fin patterning methods for increased process margins Grant 10,535,520 - Tseng , et al. Ja | 2020-01-14 |
Method Of Manufacturing Semiconductor Devices Using Directional Process App 20200006085 - YEH; Ya-Wen ;   et al. | 2020-01-02 |
Methods of Reducing Gate Spacer Loss During Semiconductor Manufacturing App 20200006062 - Jhan; Yi-Ruei ;   et al. | 2020-01-02 |
Air Spacers in Transistors and Methods Forming Same App 20200006515 - Chen; Yi-Lun ;   et al. | 2020-01-02 |
Air Spacers In Transistors And Methods Forming Same App 20190334008 - Chen; Yi-Lun ;   et al. | 2019-10-31 |
Semiconductor Fabrication System Embedded with Effective Baking Module App 20190304812 - Lin; Han-Yu ;   et al. | 2019-10-03 |
Gate Etch Back With Reduced Loading Effect App 20190165123 - LO; Yi-Chen ;   et al. | 2019-05-30 |
Method For Manufacturing Semiconductor Device App 20190165132 - LO; Yi-Chen ;   et al. | 2019-05-30 |
Semiconductor Device and Method of Manufacture App 20190164829 - Yang; Chan Syun David ;   et al. | 2019-05-30 |
Method Of Patterning App 20190164772 - TSENG; Chin-Yuan ;   et al. | 2019-05-30 |
Method For Forming Semiconductor Device App 20190165133 - JHAN; Yi-Ruei ;   et al. | 2019-05-30 |
Method Of Forming Semiconductor Structure Having Layer With Re-entrant Profile App 20190164812 - CHEN; Yi-Shan ;   et al. | 2019-05-30 |
Method Of Fabricating A Semiconductor Device App 20190148524 - LO; Yi-Chen ;   et al. | 2019-05-16 |
Fine Line Patterning Methods App 20190148147 - Huang; Shih-Chun ;   et al. | 2019-05-16 |
Method For Manufacturing Semiconductor Device App 20190139777 - CHANG; Jung-Hao ;   et al. | 2019-05-09 |
Method And Equipment For Forming Gaps In A Material Layer App 20190096739 - Yang; Chan-Syun David ;   et al. | 2019-03-28 |
Semiconductor Device Having Fins And Method Of Fabricating The Same App 20190097056 - KUO; Shu-Hao ;   et al. | 2019-03-28 |
Pattern Fidelity Enhancement App 20190067000 - Shen; Yu-Tien ;   et al. | 2019-02-28 |
Method of fabricating a semiconductor device Grant 10,164,067 - Lo , et al. Dec | 2018-12-25 |
Method for manufacturing semiconductor device Grant 10,157,751 - Chang , et al. Dec | 2018-12-18 |
Semiconductor structure having layer with re-entrant profile and method of forming the same Grant 10,157,773 - Chen , et al. Dec | 2018-12-18 |
Fin Patterning Methods for Increased Process Margins App 20180315602 - Tseng; Chin-Yuan ;   et al. | 2018-11-01 |
Method of forming a contact Grant 10,032,887 - Huang , et al. July 24, 2 | 2018-07-24 |
Method Of Fabricating A Semiconductor Device App 20180175171 - LO; Yi-Chen ;   et al. | 2018-06-21 |
Method of Forming a Contact App 20170365691 - Huang; Yu-Lien ;   et al. | 2017-12-21 |
Method of forming a contact Grant 9,627,258 - Huang , et al. April 18, 2 | 2017-04-18 |
In-situ plasma treatment of advanced resists in fine pattern definition Grant 7,390,753 - Lin , et al. June 24, 2 | 2008-06-24 |
Dual damascene process Grant 7,253,112 - Ho , et al. August 7, 2 | 2007-08-07 |
In-situ plasma treatment of advanced resists in fine pattern definition App 20070111110 - Lin; Li-Te ;   et al. | 2007-05-17 |
Etching process to avoid polysilicon notching Grant 7,109,085 - Wang , et al. September 19, 2 | 2006-09-19 |
Etching Process To Avoid Polysilicon Notching App 20060154487 - Wang; Shiang-Bau ;   et al. | 2006-07-13 |
Etching and plasma treatment process to improve a gate profile App 20050032386 - Chang, Ming-Ching ;   et al. | 2005-02-10 |
Dual damascene process App 20050014362 - Ho, Bang-Chien ;   et al. | 2005-01-20 |
Organic low K dielectric etch with NH3 chemistry Grant 6,743,732 - Lin , et al. June 1, 2 | 2004-06-01 |
Partial resist free approach in contact etch to improve W-filling Grant 6,407,002 - Lin , et al. June 18, 2 | 2002-06-18 |
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