Lin; Jr-Jung

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lin; Jr-Jung.The latest application filed is for "dummy fins and methods of forming thereof".

Company Profile

31.78.79

Lin; Jr-Jung - Hsinchu TW
Lin; Jr-Jung - Hsinchu City TW
Lin; Jr-Jung - Wurih Township TW
Lin; Jr-Jung - Hsin-Chu TW
Lin; Jr Jung - Wurih Township, Taichung County N/A TW
Lin; Jr Jung - Zhubei TW
Lin; Jr Jung - Zhubei City TW
Lin; Jr Jung - Taichung TW
Lin; Jr Jung - Taichung City TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Mechanisms for forming FinFET device Grant 11,380,590 - Chang , et al. July 5, 2	2022-07-05
Dummy Fins and Methods of Forming Thereof App 20220122972 - Lin; Shih-Yao ; et al.	2022-04-21
Gate structure of field effect transistor with footing Grant 11,257,931 - Chang , et al. February 22, 2	2022-02-22
Semiconductor device having dummy fin physically separating the first and second gate stacks Grant 11,217,586 - Lin , et al. January 4, 2	2022-01-04
Dummy Fin Profile Control to Enlarge Gate Process Window App 20210367059 - Lin; Shih-Yao ; et al.	2021-11-25
Semiconductor device Grant 11,120,974 - Chen , et al. September 14, 2	2021-09-14
FinFET structures and methods of forming the same Grant 11,121,039 - Lin , et al. September 14, 2	2021-09-14
Dummy Fins And Methods Of Forming Thereof App 20210242206 - Lin; Shih-Yao ; et al.	2021-08-05
Method and Structure for FinFET Isolation App 20210134680 - Chang; Che-Cheng ; et al.	2021-05-06
Metal Gate Electrode of a Semiconductor Device App 20210083087 - Lin; Jr-Jung ; et al.	2021-03-18
Fin field effect transistor (FinFET) device with controlled end-to-end critical dimension and method for forming the same Grant 10,923,353 - Chen , et al. February 16, 2	2021-02-16
Method and structure for FinFET isolation Grant 10,867,865 - Chang , et al. December 15, 2	2020-12-15
Method and Structure for FinFET Comprising Patterned Oxide and Dielectric Layer Under Spacer Features App 20200381532 - Chang; Che-Cheng ; et al.	2020-12-03
Metal gate electrode of a semiconductor device Grant 10,854,742 - Lin , et al. December 1, 2	2020-12-01
Semiconductor structure and manufacturing method thereof Grant 10,854,504 - Chang , et al. December 1, 2	2020-12-01
Gate Structure with Desired Profile for Semiconductor Devices App 20200373401 - Wang; Chih Ping ; et al.	2020-11-26
Semiconductor Device App 20200321196 - CHEN; Chang-Yin ; et al.	2020-10-08
Mechanisms For Forming Finfet Device App 20200295051 - Chang; Che-Cheng ; et al.	2020-09-17
Method and structure for FinFET comprising patterned oxide and dielectric layer under spacer features Grant 10,749,014 - Chang , et al. A	2020-08-18
Gate structure with desired profile for semiconductor devices Grant 10,749,007 - Wang , et al. A	2020-08-18
Dry etching apparatus Grant 10,692,701 - Chen , et al.	2020-06-23
Mechanisms for forming FINFET device Grant 10,672,796 - Chang , et al.	2020-06-02
Gate Structure Of Field Effect Transistor With Footing App 20200152774 - CHANG; CHE-CHENG ; et al.	2020-05-14
Method and Structure for FinFET Isolation App 20200135581 - Chang; Che-Cheng ; et al.	2020-04-30
Fin Field Effect Transistor (FINFET) Device with Controlled End-to-End Critical Dimension and Method for Forming the Same App 20200118820 - Chen; Chang-Yin ; et al.	2020-04-16
FinFET Structures and Methods of Forming the Same App 20200020593 - Lin; Chih-Han ; et al.	2020-01-16
Gate structure of field effect transistor with footing Grant 10,535,758 - Chang , et al. Ja	2020-01-14
Method and structure for FinFET isolation Grant 10,522,414 - Chang , et al. Dec	2019-12-31
Semiconductor methods and devices Grant 10,515,818 - Liu , et al. Dec	2019-12-24
Fin field effect transistor (FinFET) device with controlled end-to-end critical dimension and method for forming the same Grant 10,510,539 - Chen , et al. Dec	2019-12-17
Method and Structure for FinFET Comprising Patterned Oxide and Dielectric Layer Under Spacer Features App 20190348521 - Chang; Che-Cheng ; et al.	2019-11-14
FinFET structures and methods of forming the same Grant 10,468,308 - Lin , et al. No	2019-11-05
Gate Structure Of Field Effect Transistor With Footing App 20190319120 - CHANG; CHE-CHENG ; et al.	2019-10-17
Metal Gate Electrode of a Semiconductor Device App 20190312138 - Lin; Jr-Jung ; et al.	2019-10-10
Gate Structure With Desired Profile For Semiconductor Devices App 20190288084 - WANG; Ricky ; et al.	2019-09-19
Method and structure for FinFET comprising patterned oxide and dielectric layer under spacer features Grant 10,367,079 - Chang , et al. July 30, 2	2019-07-30
Metal gate electrode of a semiconductor device Grant 10,332,991 - Lin , et al.	2019-06-25
Gate structure of field effect transistor with footing Grant 10,312,352 - Chang , et al.	2019-06-04
Method for forming semiconductor device structure with gate structure Grant 10,312,158 - Li , et al.	2019-06-04
Method and Structure for FinFET Isolation App 20190122934 - Chang; Che-Cheng ; et al.	2019-04-25
Method For Forming Semiconductor Device Structure With Gate Structure App 20190043763 - LI; Yi-Cheng ; et al.	2019-02-07
Method and structure for FinFet isolation Grant 10,163,722 - Chang , et al. Dec	2018-12-25
Metal Gate Electrode of a Semiconductor Device App 20180350966 - Lin; Jr-Jung ; et al.	2018-12-06
Gate Structure Of Field Effect Transistor With Footing App 20180350958 - CHANG; CHE-CHENG ; et al.	2018-12-06
Mechanisms For Forming Finfet Device App 20180277571 - Chang; Che-Cheng ; et al.	2018-09-27
Gate structure of field effect transistor with footing Grant 10,050,128 - Chang , et al. August 14, 2	2018-08-14
Method of making a FinFET device Grant 10,037,993 - Lin , et al. July 31, 2	2018-07-31
FinFET Structures and Methods of Forming the Same App 20180174917 - Lin; Chih-Han ; et al.	2018-06-21
Metal gate electrode of a semiconductor device Grant 9,991,375 - Lin , et al. June 5, 2	2018-06-05
Mechanisms for forming FinFET device Grant 9,991,285 - Chang , et al. June 5, 2	2018-06-05
Semiconductor Methods and Devices App 20180151382 - Liu; Chi-Kang ; et al.	2018-05-31
Method of forming FinFET Grant 9,941,407 - Lin , et al. April 10, 2	2018-04-10
Method and Structure for FinFET Isolation App 20180068900 - Chang; Che-Cheng ; et al.	2018-03-08
FinFET structures and methods of forming the same Grant 9,899,266 - Lin , et al. February 20, 2	2018-02-20
Semiconductor Structure And Manufacturing Method Thereof App 20180019161 - CHANG; CHE-CHENG ; et al.	2018-01-18
Method and Structure for FinFET Comprising Patterned Oxide and Dielectric Layer under Spacer Features App 20170365686 - Chang; Che-Cheng ; et al.	2017-12-21
Semiconductor device including fin structures and manufacturing method therof Grant 9,837,536 - Chang , et al. December 5, 2	2017-12-05
Method and structure for FinFET isolation Grant 9,818,649 - Chang , et al. November 14, 2	2017-11-14
Finfet Structures And Methods Of Forming The Same App 20170316984 - Lin; Chih-Han ; et al.	2017-11-02
Semiconductor structure and manufacturing method thereof Grant 9,773,696 - Chang , et al. September 26, 2	2017-09-26
Method and structure for FinFET comprising patterned oxide and dielectric layer under spacer features Grant 9,735,256 - Chang , et al. August 15, 2	2017-08-15
Dry Etching Apparatus App 20170186588 - CHEN; Chang-Yin ; et al.	2017-06-29
Gate Structure Of Field Effect Transistor With Footing App 20170186857 - CHANG; CHE-CHENG ; et al.	2017-06-29
Indented gate end of non-planar transistor Grant 9,627,375 - Chang , et al. April 18, 2	2017-04-18
Gate structure of field effect transistor with footing Grant 9,620,621 - Chang , et al. April 11, 2	2017-04-11
Apparatus and method of manufacturing fin-FET devices Grant 9,620,417 - Chen , et al. April 11, 2	2017-04-11
Integrated high-K/metal gate in CMOS process flow Grant 9,601,388 - Chen , et al. March 21, 2	2017-03-21
Method of Forming FinFET App 20170077287 - Lin; Jr-Jung ; et al.	2017-03-16
Fin Field Effect Transistor (FinFET) Device with Controlled End-to-End Critical Dimension and Method for Forming the Same App 20170076946 - Chen; Chang-Yin ; et al.	2017-03-16
Method and Structure for FinFET Isolation App 20170076989 - Chang; Che-Cheng ; et al.	2017-03-16
Fin-FET device and manufacturing method thereof Grant 9,590,032 - Lin , et al. March 7, 2	2017-03-07
Method of Making a FinFET Device App 20170062422 - Lin; Chih-Han ; et al.	2017-03-02
Semiconductor structure and manufacturing method of the same Grant 9,543,381 - Chen , et al. January 10, 2	2017-01-10
Method of forming FinFET Grant 9,508,830 - Lin , et al. November 29, 2	2016-11-29
Fin field effect transistor (FinFET) device with controlled end-to-end critical dimension and method for forming the same Grant 9,508,719 - Chen , et al. November 29, 2	2016-11-29
Method of making a FinFET device Grant 9,496,372 - Lin , et al. November 15, 2	2016-11-15
Method and structure for FinFET isolation Grant 9,490,176 - Chang , et al. November 8, 2	2016-11-08
Semiconductor Device Including Fin Structures And Manufacturing Method Therof App 20160322498 - CHANG; Che-Cheng ; et al.	2016-11-03
Integrated High-K/Metal Gate in CMOS Process Flow App 20160293490 - Chen; Ryan Chia-Jen ; et al.	2016-10-06
Fin shape for fin field-effect transistors and method of forming Grant 9,460,968 - Lin , et al. October 4, 2	2016-10-04
Semiconductor Device Including Fin Structures And Manufacturing Method Thereof App 20160240537 - CHANG; Che-Cheng ; et al.	2016-08-18
Semiconductor device including fin structures and manufacturing method thereof Grant 9,406,680 - Chang , et al. August 2, 2	2016-08-02
Fin field effect transistor (FinFET) device and method for forming the same Grant 9,401,415 - Chang , et al. July 26, 2	2016-07-26
Gate last semiconductor structure and method for forming the same Grant 9,391,205 - Chang , et al. July 12, 2	2016-07-12
Gate protection caps and method of forming the same Grant 9,384,988 - Lin , et al. July 5, 2	2016-07-05
Fin-fet Device And Manufacturing Method Thereof App 20160172439 - LIN; Chih-Han ; et al.	2016-06-16
Method of Making a FinFET Device App 20160155824 - Lin; Chih-Han ; et al.	2016-06-02
Fin Field Effect Transistor (finfet) Device With Controlled End-to-end Critical Dimension And Method For Forming The Same App 20160148935 - CHEN; Chang-Yin ; et al.	2016-05-26
Method and Structure for FinFET Isolation App 20160111336 - Chang; Che-Cheng ; et al.	2016-04-21
Gate Last Semiconductor Structure And Method For Forming The Same App 20160111541 - CHANG; Che-Cheng ; et al.	2016-04-21
Method and Structure for FinFET App 20160111518 - Chang; Che-Cheng ; et al.	2016-04-21
Dummy gate electrode of semiconductor device Grant 9,306,037 - Lin , et al. April 5, 2	2016-04-05
Apparatus And Method Of Manufacturing Fin-fet Devices App 20160093537 - CHEN; Chang-Yin ; et al.	2016-03-31
Semiconductor Structure And Manufacuting Method Of The Same App 20160079353 - CHEN; CHANG-YIN ; et al.	2016-03-17
Integrated high-k/metal gate in CMOS process flow Grant 9,257,426 - Chen , et al. February 9, 2	2016-02-09
Method of making a FinFET device Grant 9,245,883 - Lin , et al. January 26, 2	2016-01-26
Method of forming a semiconductor device Grant 9,153,440 - Lin , et al. October 6, 2	2015-10-06
Fin Field Effect Transistor (finfet) Device And Method For Forming The Same App 20150236132 - CHANG; Che-Cheng ; et al.	2015-08-20
Gate Structure Of Field Effect Transistor With Footing App 20150236123 - CHANG; CHE-CHENG ; et al.	2015-08-20
Fin Shape For Fin Field-Effect Transistors And Method Of Forming App 20150228544 - Lin; Jr-Jung ; et al.	2015-08-13
Indented Gate End Of Non-planar Transistor App 20150228647 - CHANG; CHE-CHENG ; et al.	2015-08-13
Semiconductor Structure And Manufacturing Method Thereof App 20150214367 - CHANG; CHE-CHENG ; et al.	2015-07-30
Method Of Forming Finfet App 20150206952 - LIN; JR-JUNG ; et al.	2015-07-23
Fin shape for fin field-effect transistors and method of forming Grant 9,041,125 - Lin , et al. May 26, 2	2015-05-26
Gate Protection Caps and Method of Forming the Same App 20150137195 - Lin; Chih-Han ; et al.	2015-05-21
Semiconductor structure profile Grant 9,035,382 - Chang , et al. May 19, 2	2015-05-19
Mechanisms For Forming Finfet Device App 20150115363 - CHANG; Che-Cheng ; et al.	2015-04-30
Integrated High-K/Metal Gate In CMOS Process Flow App 20150061031 - Chen; Ray Chia-Jen ; et al.	2015-03-05
Method to pre-heat and stabilize etching chamber condition and improve mean time between cleaning Grant 8,911,559 - Lin , et al. December 16, 2	2014-12-16
Structure and method for MOSFETS with high-K and metal gate structure Grant 8,912,610 - Lin , et al. December 16, 2	2014-12-16
Dummy Gate Electrode of Semiconductor Device App 20140349473 - Lin; Jr-Jung ; et al.	2014-11-27
Integrated high-k/metal gate in CMOS process flow Grant 8,841,731 - Chen , et al. September 23, 2	2014-09-23
Semiconductor Structure Profile App 20140264589 - Chang; Che-Cheng ; et al.	2014-09-18
Fin Shape For Fin Field-Effect Transistors And Method Of Forming App 20140252486 - Lin; Jr-Jung ; et al.	2014-09-11
Dummy gate electrode of semiconductor device Grant 8,803,241 - Lin , et al. August 12, 2	2014-08-12
N2 based plasma treatment and ash for HK metal gate protection Grant 8,791,001 - Lin , et al. July 29, 2	2014-07-29
Dummy Gate Electrode of Semiconductor Device App 20140001559 - Lin; Jr-Jung ; et al.	2014-01-02
Metal Gate Electrode Of A Semiconductor Device App 20130320410 - Lin; Jr-Jung ; et al.	2013-12-05
Semiconductor structure having a polysilicon structure and method of forming same Grant 8,574,989 - Chang , et al. November 5, 2	2013-11-05
Methods of fabricating high-K metal gate devices Grant 8,551,837 - Lin , et al. October 8, 2	2013-10-08
Method Of Forming A Semiconductor Device App 20130252425 - LIN; Chih-Han ; et al.	2013-09-26
Semiconductor Structure Having A Polysilicon Structure And Method Of Forming Same App 20130146993 - CHANG; Che-Cheng ; et al.	2013-06-13
Integrated High-k/metal Gate In Cmos Process Flow App 20130140643 - Chen; Ryan Chia-Jen ; et al.	2013-06-06
Structure and Method for MOSFETS with High-K and Metal Gate Structure App 20130119487 - Lin; Jr Jung ; et al.	2013-05-16
Integrated high-K/metal gate in CMOS process flow Grant 8,383,502 - Chen , et al. February 26, 2	2013-02-26
Method to integrate gate etching as all-in-one process for high K metal gate Grant 8,304,349 - Lin , et al. November 6, 2	2012-11-06
Sealing layer of a field effect transistor Grant 8,258,588 - Lin , et al. September 4, 2	2012-09-04
Methods Of Fabricating High-k Metal Gate Devices App 20120164822 - Lin; Yih-Ann ; et al.	2012-06-28
Method for fabricating an isolation structure Grant 8,163,625 - Lin , et al. April 24, 2	2012-04-24
Methods of fabricating high-k metal gate devices Grant 8,148,249 - Lin , et al. April 3, 2	2012-04-03
Integrated High-K/Metal Gate in CMOS Process Flow App 20110275212 - Chen; Ryan Chia-Jen ; et al.	2011-11-10
Method of integrating high-K/metal gate in CMOS process flow Grant 8,003,507 - Chen , et al. August 23, 2	2011-08-23
Sealing Layer Of A Field Effect Transistor App 20110031562 - LIN; Yu Chao ; et al.	2011-02-10
Method of defining gate structure height for semiconductor devices Grant 7,833,853 - Chen , et al. November 16, 2	2010-11-16
Method For Fabricating An Isolation Structure App 20100255654 - Lin; Yih-Ann ; et al.	2010-10-07
Solution for polymer and capping layer removing with wet dipping in HK metal gate etching process Grant 7,776,755 - Lin , et al. August 17, 2	2010-08-17
Method To Pre-heat And Stabilize Etching Chamber Condition And Improve Mean Time Between Cleaning App 20100071719 - Lin; Yu Chao ; et al.	2010-03-25
Methods Of Fabricating High-k Metal Gate Devices App 20100068876 - Lin; Yih-Ann ; et al.	2010-03-18
Method Of Defining Gate Structure Height For Semiconductor Devices App 20100068861 - Chen; Ryan Chia-Jen ; et al.	2010-03-18
Novel Solution For Polymer And Capping Layer Removing With Wet Dipping In Hk Metal Gate Etching Process App 20100062590 - Lin; Jr Jung ; et al.	2010-03-11
N2 Based Plasma Treatment And Ash For Hk Metal Gate Protection App 20100062591 - Lin; Yu Chao ; et al.	2010-03-11
Method Of Integrating High-k/metal Gate In Cmos Process Flow App 20100041223 - Chen; Ryan Chia-Jen ; et al.	2010-02-18
Novel Method To Integrate Gate Etching As All-in-one Process For High K Metal Gate App 20100041236 - Lin; Jr Jung ; et al.	2010-02-18