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Patent applications and USPTO patent grants for Lin; Hung-Bin.The latest application filed is for "plasma etcher edge ring with a chamfer geometry and impedance design".
Patent | Date |
---|---|
Plasma etcher edge ring with a chamfer geometry and impedance design Grant 11,404,250 - Wang , et al. August 2, 2 | 2022-08-02 |
Plasma Etcher Edge Ring With A Chamfer Geometry And Impedance Design App 20220013337 - WANG; Chien-Yu ;   et al. | 2022-01-13 |
Apparatus And Method For Etching App 20210249232 - LIN; HUNG-BIN ;   et al. | 2021-08-12 |
Method of manufacturing semiconductor devices App 20210217670 - Yin; Li-Chao ;   et al. | 2021-07-15 |
Apparatus For Processing Substrates Or Wafers App 20190148177 - YIN; Li-Chao ;   et al. | 2019-05-16 |
Cloud video system Grant 9,736,429 - Huang , et al. August 15, 2 | 2017-08-15 |
Fluorescent display tube with touch switch and method of forming electrode and wiring of same Grant 9,184,017 - Tokura , et al. November 10, 2 | 2015-11-10 |
Fluorescent Display Tube With Touch Switch And Method Of Forming Electrode And Wiring Of Same App 20140091708 - Tokura; Katsushi ;   et al. | 2014-04-03 |
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