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name:-0.066799163818359
name:-0.061338901519775
name:-0.0088770389556885
Lin; Da-Wen Patent Filings

Lin; Da-Wen

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lin; Da-Wen.The latest application filed is for "multi-gate device and related methods".

Company Profile
10.60.60
  • Lin; Da-Wen - Hsinchu County TW
  • LIN; Da-Wen - Hsinchu City TW
  • LIN; Da-Wen - Taipei City TW
  • Lin; Da-Wen - Hsinchu TW
  • Lin; Da-Wen - Taiwan TW
  • Lin; Da-Wen - Hsin-Chu TW
  • - Hsinchu TW
  • Lin; Da-Wen - Taiping TW
  • Lin; Da-Wen - Taiping City TW
  • Lin; Da-Wen - Taipin TW
  • Lin; Da-Wen - Taichung TW
  • Lin; Da-Wen - Taipin City TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Source/drain Contact With Low-k Contact Etch Stop Layer And Method Of Fabricating Thereof
App 20220285513 - Chen; Ting-Yeh ;   et al.
2022-09-08
Multi-gate Device And Related Methods
App 20220285533 - LEE; Tsung-Lin ;   et al.
2022-09-08
Device And Method Of Fabricating Multigate Devices Having Different Channel Configurations
App 20220238678 - LEE; Tsung-Lin ;   et al.
2022-07-28
Finfet Fabrication Methods
App 20220208986 - TSAI; Chun Hsiung ;   et al.
2022-06-30
FinFET fabrication methods
Grant 11,276,766 - Tsai , et al. March 15, 2
2022-03-15
Formation of dislocations in source and drain regions of FinFET devices
Grant 11,211,455 - Tsai , et al. December 28, 2
2021-12-28
FinFET Device with Different Liners for PFET and NFET and Method of Fabricating Thereof
App 20210366784 - Cheng; Ming-Lung ;   et al.
2021-11-25
Two-transistor bandgap reference circuit and FinFET device suited for same
Grant 11,150,680 - Lin , et al. October 19, 2
2021-10-19
FinFET device with different liners for PFET and NFET and method of fabricating thereof
Grant 11,031,299 - Cheng , et al. June 8, 2
2021-06-08
Formation of Dislocations in Source and Drain Regions of FinFET Devices
App 20200350404 - Tsai; Chun Hsiung ;   et al.
2020-11-05
Formation of dislocations in source and drain regions of finFET devices
Grant 10,741,642 - Tsai , et al. A
2020-08-11
Finfet Fabrication Methods
App 20200066869 - TSAI; Chun Hsiung ;   et al.
2020-02-27
Fin Field Effect Transistor (finfet) Device Structure With Deep Contact Structure
App 20200058747 - FANG; Ting ;   et al.
2020-02-20
Two-transistor Bandgap Reference Circuit And Finfet Device Suited For Same
App 20200019201 - Lin; Yvonne ;   et al.
2020-01-16
Two-transistor bandgap reference circuit and FinFET device suited for same
Grant 10,534,393 - Lin , et al. January 14, 2
2020-01-14
FinFET device with different liners for PFET and NFET and method of fabricating thereof
Grant 10,522,417 - Cheng , et al. Dec
2019-12-31
Two-transistor bandgap reference circuit and FinFET device suited for same
Grant 10,466,731 - Lin , et al. No
2019-11-05
FinFET fabrication methods
Grant 10,468,500 - Tsai , et al. No
2019-11-05
Formation of Dislocations in Source and Drain Regions of FinFET Devices
App 20190115428 - Tsai; Chun Hsiung ;   et al.
2019-04-18
Two-transistor Bandgap Reference Circuit And Finfet Device Suited For Same
App 20180356852 - Lin; Yvonne ;   et al.
2018-12-13
Formation of dislocations in source and drain regions of FinFET devices
Grant 10,153,344 - Tsai , et al. Dec
2018-12-11
Finfet Device With Different Liners For Pfet And Nfet And Method Of Fabricating Thereof
App 20180350697 - Cheng; Ming-Lung ;   et al.
2018-12-06
Finfet Device With Different Liners For Pfet And Nfet And Method Of Fabricating Thereof
App 20180315664 - Cheng; Ming-Lung ;   et al.
2018-11-01
Formation of Dislocations in Source and Drain Regions of FinFET Devices
App 20180006117 - Tsai; Chun Hsiung ;   et al.
2018-01-04
Method and apparatus of forming an integrated circuit with a strained channel region
Grant 9,768,277 - Cheng , et al. September 19, 2
2017-09-19
Formation of dislocations in source and drain regions of FinFET devices
Grant 9,768,256 - Tsai , et al. September 19, 2
2017-09-19
Two-transistor Bandgap Reference Circuit And Finfet Device Suited For Same
App 20170212545 - Lin; Yvonne ;   et al.
2017-07-27
Methods of annealing after deposition of gate layers
Grant 9,620,386 - Tsai , et al. April 11, 2
2017-04-11
FinFET with multiple dislocation planes and method for forming the same
Grant 9,590,101 - Huang , et al. March 7, 2
2017-03-07
Semiconductor device structure and method for forming the same
Grant 9,537,010 - Wang , et al. January 3, 2
2017-01-03
FinFET with Multiple Dislocation Planes and Method for Forming the Same
App 20160268429 - Huang; Chih-Hsiang ;   et al.
2016-09-15
Semiconductor Device Structure And Method For Forming The Same
App 20160225906 - WANG; Tsan-Chun ;   et al.
2016-08-04
Formation of Dislocations in Source and Drain Regions of FinFET Devices
App 20160204229 - Tsai; Chun Hsiung ;   et al.
2016-07-14
FinFET with Multiple Dislocation Planes and Method for Forming the Same
App 20160190129 - Huang; Chih-Hsiang ;   et al.
2016-06-30
Multiple-gate semiconductor device and method
Grant 9,373,704 - Lee , et al. June 21, 2
2016-06-21
FinFET with multiple dislocation planes and method for forming the same
Grant 9,362,278 - Huang , et al. June 7, 2
2016-06-07
Formation of dislocations in source and drain regions of FinFET devices
Grant 9,293,534 - Tsai , et al. March 22, 2
2016-03-22
Integrated circuit resistor
Grant 9,281,356 - Wong , et al. March 8, 2
2016-03-08
Device with Engineered Epitaxial Region and Methods of Making Same
App 20150364602 - Wong; King-Yuen ;   et al.
2015-12-17
Method and Apparatus For Enhancing Channel Strain
App 20150340293 - Cheng; Ming-Lung ;   et al.
2015-11-26
Formation of Dislocations in Source and Drain Regions of FinFET Devices
App 20150270342 - Tsai; Chun Hsiung ;   et al.
2015-09-24
Device with engineered epitaxial region and methods of making same
Grant 9,117,843 - Wong , et al. August 25, 2
2015-08-25
Method for enhancing channel strain
Grant 9,105,664 - Cheng , et al. August 11, 2
2015-08-11
Integrated Circuit Resistor
App 20150111361 - Wong; King-Yuen ;   et al.
2015-04-23
Multiple-Gate Semiconductor Device and Method
App 20150079753 - Lee; Tung Ying ;   et al.
2015-03-19
Semiconductor structure
Grant 8,951,875 - Wong , et al. February 10, 2
2015-02-10
Integrated circuit resistor
Grant 08921946 -
2014-12-30
Integrated circuit resistor
Grant 8,921,946 - Wong , et al. December 30, 2
2014-12-30
Multiple-gate semiconductor device and method
Grant 8,895,383 - Lee , et al. November 25, 2
2014-11-25
Methods Of Annealing After Deposition Of Gate Layers
App 20140335685 - TSAI; Chun Hsiung ;   et al.
2014-11-13
Method And Apparatus For Enhancing Channel Strain
App 20140248751 - Cheng; Ming-Lung ;   et al.
2014-09-04
Methods of anneal after deposition of gate layers
Grant 8,809,175 - Tsai , et al. August 19, 2
2014-08-19
Techniques for FinFET doping
Grant 8,785,286 - Tsai , et al. July 22, 2
2014-07-22
Transistor having notched fin structure and method of making the same
Grant 8,759,943 - Tseng , et al. June 24, 2
2014-06-24
Rapid thermal annealing to reduce pattern effect
Grant 8,753,980 - Tsai , et al. June 17, 2
2014-06-17
Strained channel integrated circuit devices
Grant 8,729,627 - Cheng , et al. May 20, 2
2014-05-20
Techniques for FinFET doping
Grant 8,703,593 - Tsai , et al. April 22, 2
2014-04-22
Techniques for FinFET Doping
App 20130280876 - Tsai; Chun Hsiung ;   et al.
2013-10-24
FinFET LDD and source drain implant technique
Grant 8,557,692 - Tsai , et al. October 15, 2
2013-10-15
Multiple-Gate Semiconductor Device and Method
App 20130230958 - Lee; Tung Ying ;   et al.
2013-09-05
Device With Self Aligned Stressor And Method Of Making Same
App 20130161650 - LAI; Kao-Ting ;   et al.
2013-06-27
Rapid Thermal Annealing To Reduce Pattern Effect
App 20130143418 - TSAI; Chun Hsiung ;   et al.
2013-06-06
Integrated Circuit Resistor
App 20130119480 - Wong; King-Yuen ;   et al.
2013-05-16
Semiconductor Structure
App 20130099326 - WONG; King-Yuen ;   et al.
2013-04-25
Multiple-gate semiconductor device and method
Grant 8,426,923 - Lee , et al. April 23, 2
2013-04-23
Device with self aligned stressor and method of making same
Grant 8,404,538 - Lai , et al. March 26, 2
2013-03-26
Device with Engineered Epitaxial Region and Methods of Making Same
App 20130062670 - Wong; King-Yuen ;   et al.
2013-03-14
Asymmetric rapid thermal annealing to reduce pattern effect
Grant 8,383,513 - Tsai , et al. February 26, 2
2013-02-26
Methods of forming integrated circuits
Grant 8,357,579 - Wong , et al. January 22, 2
2013-01-22
Methods Of Anneal After Deposition Of Gate Layers
App 20130017678 - TSAI; Chun Hsiung ;   et al.
2013-01-17
Multi-threshold voltage device and method of making same
Grant 8,283,734 - Chiang , et al. October 9, 2
2012-10-09
High surface dopant concentration semiconductor device and method of fabricating
Grant 8,278,196 - Huang , et al. October 2, 2
2012-10-02
LDD epitaxy for FinFETs
Grant 8,278,179 - Lin , et al. October 2, 2
2012-10-02
Methods Of Forming Integrated Circuits
App 20120135575 - WONG; King-Yuen ;   et al.
2012-05-31
Transistor Having Notched Fin Structure And Method Of Making The Same
App 20120086053 - TSENG; Chih-Hung ;   et al.
2012-04-12
Asymmetric Rapid Thermal Annealing To Reduce Pattern Effect
App 20120083135 - TSAI; Chun Hsiung ;   et al.
2012-04-05
Gated diode with non-planar source region
Grant 8,143,680 - Lin , et al. March 27, 2
2012-03-27
High Surface Dopant Concentration Semiconductor Device And Method Of Fabricating
App 20120018848 - Huang; Yu-Lien ;   et al.
2012-01-26
Method And Apparatus For Enhancing Channel Strain
App 20110278676 - Cheng; Ming-Lung ;   et al.
2011-11-17
Piezoelectric Gate-Induced Strain
App 20110248322 - Wong; King-Yuen ;   et al.
2011-10-13
Multi-threshold Voltage Device And Method Of Making Same
App 20110248351 - Chiang; Chung-Yu ;   et al.
2011-10-13
LDD Epitaxy for FinFETs
App 20110223736 - Lin; Da-Wen ;   et al.
2011-09-15
Techniques for FinFET Doping
App 20110195555 - Tsai; Chun Hsiung ;   et al.
2011-08-11
Method for obtaining quality ultra-shallow doped regions and device having same
Grant 7,994,016 - Tsai , et al. August 9, 2
2011-08-09
FinFET LDD and Source Drain Implant Technique
App 20110171795 - Tsai; Chun Hsiung ;   et al.
2011-07-14
Multiple-Gate Semiconductor Device and Method
App 20110127610 - Lee; Tung Ying ;   et al.
2011-06-02
Method For Obtaining Quality Ultra-shallow Doped Regions And Device Having Same
App 20110111571 - TSAI; Chun Hsiung ;   et al.
2011-05-12
Device With Self Aligned Stressor And Method Of Making Same
App 20110079820 - Lai; Kao-Ting ;   et al.
2011-04-07
Gated Diode with Non-Planar Source Region
App 20100237441 - Lin; Da-Wen ;   et al.
2010-09-23
Flash anneal for a PAI, NiSi process
Grant 7,795,119 - Lo , et al. September 14, 2
2010-09-14
Gated diode with non-planar source region
Grant 7,732,877 - Lin , et al. June 8, 2
2010-06-08
Flash Anneal for a PAI, NiSi Process
App 20090020757 - Lo; Chia Ping ;   et al.
2009-01-22
Semiconductor Device With Raised Spacers
App 20080290380 - Sheu; Yi-Ming ;   et al.
2008-11-27
Gated diode with non-planar source region
App 20080237746 - Lin; Da-Wen ;   et al.
2008-10-02
Narrow width effect improvement with photoresist plug process and STI corner ion implantation
Grant 7,399,679 - Sheu , et al. July 15, 2
2008-07-15
Silicon oxycarbide and silicon carbonitride based materials for MOS devices
Grant 7,115,974 - Wu , et al. October 3, 2
2006-10-03
Narrow width effect improvement with photoresist plug process and STI corner ion implantation
Grant 7,071,515 - Sheu , et al. July 4, 2
2006-07-04
Narrow width effect improvement with photoresist plug process and STI corner ion implantation
App 20060079068 - Sheu; Yi-Ming ;   et al.
2006-04-13
Recessed gate structure with reduced current leakage and overlap capacitance
Grant 7,012,014 - Lin , et al. March 14, 2
2006-03-14
Silicon oxycarbide and silicon carbonitride based materials for MOS devices
App 20050236694 - Wu, Zhen-Cheng ;   et al.
2005-10-27
Recessed gate structure with reduced current leakage and overlap capacitance
App 20050127433 - Lin, Da-Wen ;   et al.
2005-06-16
Narrow width effect improvement with photoresist plug process and STI corner ion implantation
App 20050012173 - Sheu, Yi-Ming ;   et al.
2005-01-20
Damascene gate electrode method for fabricating field effect transistor (FET) device with ion implanted lightly doped extension regions
Grant 6,673,683 - Sheu , et al. January 6, 2
2004-01-06
Planarizing method for fabricating gate electrodes
Grant 6,670,226 - Lin , et al. December 30, 2
2003-12-30
Planarizing method for fabricating gate electrodes
App 20030170994 - Lin, Yo-Sheng ;   et al.
2003-09-11

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