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Lin; Bo-Jiun Patent Filings

Lin; Bo-Jiun

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lin; Bo-Jiun.The latest application filed is for "method of forming interconnect structure".

Company Profile
5.14.17
  • Lin; Bo-Jiun - Hsinchu County TW
  • Lin; Bo-Jiun - Jhubei TW
  • Lin; Bo-Jiun - Jhubei City TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method of forming interconnect structure
Grant 11,456,211 - Lin , et al. September 27, 2
2022-09-27
Interconnect structure and method
Grant 11,450,563 - Lin , et al. September 20, 2
2022-09-20
Method Of Forming Interconnect Structure
App 20220037202 - Lin; Bo-Jiun ;   et al.
2022-02-03
Interconnect Structure And Method
App 20210343588 - Lin; Bo-Jiun ;   et al.
2021-11-04
Porogen Bonded Gap Filling Material in Semiconductor Manufacturing
App 20210098378 - Lin; Bo-Jiun ;   et al.
2021-04-01
Porogen bonded gap filling material in semiconductor manufacturing
Grant 10,867,922 - Lin , et al. December 15, 2
2020-12-15
System and Method of Forming a Porous Low-K Structure
App 20200303184 - Lin; Bo-Jiun ;   et al.
2020-09-24
System and method of forming a porous low-K structure
Grant 10,679,846 - Lin , et al.
2020-06-09
System and Method of Forming a Porous Low-K Structure
App 20180308689 - Lin; Bo-Jiun ;   et al.
2018-10-25
Interconnect Structure That Avoids Insulating Layer Damage and Methods of Making the Same
App 20180254212 - Lin; Bo-Jiun ;   et al.
2018-09-06
Porogen Bonded Gap Filling Material in Semiconductor Manufacturing
App 20180226293 - Lin; Bo-Jiun ;   et al.
2018-08-09
Semiconductor device having a porous low-k structure
Grant 10,008,382 - Lin , et al. June 26, 2
2018-06-26
Porogen bonded gap filling material in semiconductor manufacturing
Grant 9,941,157 - Lin , et al. April 10, 2
2018-04-10
High boiling temperature solvent additives for semiconductor processing
Grant 9,905,457 - Lin , et al. February 27, 2
2018-02-27
System and method for dark field inspection
Grant 9,709,905 - Lin , et al. July 18, 2
2017-07-18
Integrated circuit interconnects and methods of making same
Grant 9,627,256 - Tsai , et al. April 18, 2
2017-04-18
Semiconductor Device Having a Porous Low-K Structure
App 20170033043 - Lin; Bo-Jiun ;   et al.
2017-02-02
Porogen Bonded Gap Filling Material in Semiconductor Manufacturing
App 20160379874 - Lin; Bo-Jiun ;   et al.
2016-12-29
High Boiling Temperature Solvent Additives for Semiconductor Processing
App 20160190002 - Lin; Bo-Jiun ;   et al.
2016-06-30
System and Method for Dark Field Inspection
App 20150380321 - Lin; Bo-Jiun ;   et al.
2015-12-31
System and method for dark field inspection
Grant 9,134,633 - Lin , et al. September 15, 2
2015-09-15
System And Method For Dark Field Inspection
App 20150179532 - Lin; Bo-Jiun ;   et al.
2015-06-25
Interconnect with flexible dielectric layer
Grant 8,836,127 - Lo , et al. September 16, 2
2014-09-16
Interconnect Structure That Avoids Insulating Layer Damage And Methods Of Making The Same
App 20140252619 - Lin; Bo-Jiun ;   et al.
2014-09-11
Integrated Circuit Interconnects And Methods Of Making Same
App 20140239501 - Tsai; Cheng-Hsiung ;   et al.
2014-08-28
High mechanical strength additives for porous ultra low-k material
Grant 8,736,014 - Lin , et al. May 27, 2
2014-05-27
Interconnect With Flexible Dielectric Layer
App 20110115088 - Lo; Ching-Yu ;   et al.
2011-05-19
Adhesion Promotion Layer For A Semiconductor Device
App 20110073998 - Lin; Bo-Jiun
2011-03-31
High Mechanical Strength Additives For Porous Ultra Low-k Material
App 20100123224 - Lin; Bo-Jiun ;   et al.
2010-05-20

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