loadpatents
name:-0.046288013458252
name:-0.028686046600342
name:-0.00098085403442383
Lin; Benjamin Szu-Min Patent Filings

Lin; Benjamin Szu-Min

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lin; Benjamin Szu-Min.The latest application filed is for "transmission mask with differential attenuation to improve iso-dense proximity".

Company Profile
0.22.34
  • Lin; Benjamin Szu-Min - Hsinchu TW
  • Lin; Benjamin Szu-Min - Hsinchu City TW
  • Lin; Benjamin Szu-Min - Tai-Nan TW
  • Lin; Benjamin Szu-Min - Tai-Nan City TW
  • Lin; Benjamin Szu-Min - Hsin-Chu TW
  • Lin; Benjamin Szu-Min - Hsin-Chu City TW
  • Lin, Benjamin Szu-Min - US
  • Lin; Benjamin Szu-Min - Chiayi City TW
  • Lin; Benjamin Szu-Min - Chiayi TW
  • Lin; Benjamin Szu-Min - Tung Chui Chiayi TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Transmission mask with differential attenuation to improve ISO-dense proximity
Grant 8,229,062 - Liu , et al. July 24, 2
2012-07-24
Transmission Mask With Differential Attenuation To Improve Iso-dense Proximity
App 20100321656 - Liu; Hang Yip ;   et al.
2010-12-23
Transmission mask with differential attenuation to improve ISO-dense proximity
Grant 7,807,342 - Liu , et al. October 5, 2
2010-10-05
Method and related operation system for immersion lithography
Grant 7,633,601 - Huang , et al. December 15, 2
2009-12-15
Method for designing photomask
Grant 7,476,472 - Shieh , et al. January 13, 2
2009-01-13
Method Of Forming A Pattern
App 20080160459 - Lin; Benjamin Szu-Min
2008-07-03
Method Of Moving Bubbles
App 20080067335 - Hou; Ya-Ching ;   et al.
2008-03-20
Method For Characterizing Line Width Roughness (lwr) Of Printed Features
App 20080055597 - Sun; Jie-Wei ;   et al.
2008-03-06
Method For Immersion Lithography
App 20070224545 - Lin; Benjamin Szu-Min
2007-09-27
Method And Related Operation System For Immersion Lithography
App 20070215040 - Huang; Yong-Fa ;   et al.
2007-09-20
Profile improvement method for patterning
Grant 7,268,070 - Huang , et al. September 11, 2
2007-09-11
Method For Improving The Alignment Accuracy Of Semiconductor Process And Method Of Forming Opening
App 20070190805 - Lin; Benjamin Szu-Min
2007-08-16
Semiconductor Exposure Method And Method Of Controlling Semiconductor Exposure Apparatus
App 20070182948 - Lin; Benjamin Szu-Min ;   et al.
2007-08-09
Method for improving illumination uniformity in exposure process, and exposure apparatus
App 20070024835 - Huang; Kuo-Chun ;   et al.
2007-02-01
Method For Designing Photomask
App 20070020532 - Shieh; Ming-Feng ;   et al.
2007-01-25
Method For Forming Composite Pattern Including Different Types Of Patterns
App 20060257795 - Lin; Benjamin Szu-Min
2006-11-16
EUV reflection mask and lithographic process using the same
Grant 7,105,255 - Lin September 12, 2
2006-09-12
Immersion Lithography Without Using A Topcoat
App 20060194142 - Lin; Benjamin Szu-Min
2006-08-31
Method for fabricating etch mask and patterning process using the same
App 20060191863 - Lin; Benjamin Szu-Min
2006-08-31
Effective assist pattern for nested and isolated contacts
Grant 7,074,528 - Schacht , et al. July 11, 2
2006-07-11
Lithography Method
App 20060133222 - Lin; Benjamin Szu-Min
2006-06-22
Transmission mask with differential attenuation to improve ISO-dense proximity
Grant 7,052,808 - Liu , et al. May 30, 2
2006-05-30
Transmission mask with differential attenuation to improve ISO-dense proximity
App 20060093971 - Liu; Hang Yip ;   et al.
2006-05-04
Phase shifting lithographic process
Grant 7,018,788 - Lin March 28, 2
2006-03-28
Mask device for photolithography and application thereof
App 20050250019 - Lin, Benjamin Szu-Min
2005-11-10
Method Of Forming Dual Damascene Structures
App 20050196951 - Lin, Benjamin Szu-Min ;   et al.
2005-09-08
Effective assist pattern for nested and isolated contacts
App 20050136336 - Schacht, Jochen ;   et al.
2005-06-23
Phase Shifting Lithographic Process
App 20050074678 - Lin, Benjamin Szu-Min
2005-04-07
Structure of phase shifting mask
Grant 6,866,967 - Lin March 15, 2
2005-03-15
Phase shifting lithographic process
Grant 6,849,393 - Lin February 1, 2
2005-02-01
Sandwich photoresist structure in photolithographic process
Grant 6,844,143 - Lin , et al. January 18, 2
2005-01-18
Profile improvement method for patterning
App 20040241587 - Huang, Hui-Ling ;   et al.
2004-12-02
EUV reflection mask and lithographic process using the same
App 20040219437 - Lin, Benjamin Szu-Min
2004-11-04
Method for shrinking pattern photoresist
App 20040166447 - Chang, Vencent ;   et al.
2004-08-26
Method for shrinking the image of photoresist
App 20040166448 - Chang, Vencent ;   et al.
2004-08-26
Phase Shifting Lithographic Process
App 20040161675 - Lin, Benjamin Szu-Min
2004-08-19
Transmission mask with differential attenuation to improve iso-dense proximity
App 20040157135 - Liu, Hang Yip ;   et al.
2004-08-12
Method For Shrinking Critical Dimension Of Semiconductor Devices
App 20040106067 - Lin, Benjamin Szu-Min ;   et al.
2004-06-03
Method for shrinking critical dimension of semiconductor devices
Grant 6,740,473 - Lin , et al. May 25, 2
2004-05-25
Structural design of alignment mark
App 20040075179 - Liu, George ;   et al.
2004-04-22
Method for detecting wafer level defect
App 20040008879 - Lin, Benjamin Szu-Min
2004-01-15
Sandwich photoresist structure in phtotlithographic process
App 20040009434 - Lin, Benjamin Szu-Min ;   et al.
2004-01-15
Structure of phase shifting mask
App 20040005505 - Lin, Benjamin Szu-Min
2004-01-08
Metal-insulator-metal capacitor and method of manufacture
App 20030025143 - Lin, Benjamin Szu-Min ;   et al.
2003-02-06
Method Of Preventing Toppling Of Lower Electrode Through Flush Cleaning
App 20020192923 - Sun, Nathna ;   et al.
2002-12-19
Self-aligned photolithographic process for forming silicon-on-insulator devices
App 20020177085 - Lin, Benjamin Szu-Min
2002-11-28
Optical proximity correction algorithm for pattern transfer
App 20020123866 - Lin, Benjamin Szu-Min
2002-09-05
Photolithography technique utilizing alignment marks at scribe line intersections
Grant 6,071,656 - Lin June 6, 2
2000-06-06
Half tone phase shift mask comprising second pattern layer on backside of substrate
Grant 6,048,650 - Lin April 11, 2
2000-04-11
Method of fabricating a dual damascene structure
Grant 6,042,996 - Lin , et al. March 28, 2
2000-03-28
Double-sided photomask
Grant 6,022,645 - Lin February 8, 2
2000-02-08
Phase-shifting mask for photolithography in semiconductor fabrications
Grant 6,010,807 - Lin January 4, 2
2000-01-04
Phase-shifting mask structure and method of fabricating the same
Grant 6,004,702 - Lin December 21, 1
1999-12-21
Method for manufacturing DRAM capacitor
Grant 5,998,260 - Lin December 7, 1
1999-12-07
Method for forming dual damascene structure
Grant 5,989,997 - Lin , et al. November 23, 1
1999-11-23
Method for manufacturing dram capacitor
Grant 5,888,865 - Lin March 30, 1
1999-03-30

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