loadpatents
name:-0.034102916717529
name:-0.031019926071167
name:-0.012495994567871
Lim; Min Young Patent Filings

Lim; Min Young

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lim; Min Young.The latest application filed is for "positive-working photoresist composition, pattern produced therefrom, and method for producing pattern".

Company Profile
11.32.31
  • Lim; Min Young - Daejeon KR
  • Lim; Min-Young - Uiwang-si KR
  • Lim; Min Young - Seongnam-si KR
  • Lim; Min Young - Seoul N/A KR
  • Lim; Min-Young - Gyeonggi-do N/A KR
  • Lim; Min Young - Seongnam N/A KR
  • Lim; Min-Young - Sungnam-si N/A KR
  • Lim; Min Young - Jungwon-gu KR
  • Lim; Min Young - Seonggi-do KR
  • Lim; Min-Young - Daejeon Metropolitan City KR
  • Lim; Min Young - Daejeon Metropolitan KR
  • Lim; Min Young - Seongnam-city KR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Photoacid generator and chemically amplified positive-type photoresist composition for thick film comprising the same
Grant 11,150,555 - Lim , et al. October 19, 2
2021-10-19
Chemically amplified photoresist composition, photoresist pattern, and method for preparing photoresist pattern
Grant 11,042,089 - Lim , et al. June 22, 2
2021-06-22
Positive photoresist composition, photoresist pattern using the same, and manufacturing method of the photoresist pattern
Grant 11,003,077 - Lim , et al. May 11, 2
2021-05-11
Multi function photoacid generator and chemically amplified photoresist composition for thick layer comprising the same
Grant 10,990,007 - Lim , et al. April 27, 2
2021-04-27
Positive-working Photoresist Composition, Pattern Produced Therefrom, And Method For Producing Pattern
App 20210011379 - LIM; Min Young ;   et al.
2021-01-14
Chemically Amplified Photoresist Composition, Photoresist Pattern, And Method For Preparing Photoresist Pattern
App 20200233302 - LIM; Min Young ;   et al.
2020-07-23
Photoresist Composition And Photoresist Film Using The Same
App 20200209740 - PARK; Eun Seok ;   et al.
2020-07-02
Photoresist Composition And Photoresist Film Using The Same
App 20200033727 - AHN; Yongsik ;   et al.
2020-01-30
Photoacid Generator And Chemically Amplified Positive-type Photoresist Composition For Thick Film Comprising The Same
App 20200033724 - LIM; Min Young ;   et al.
2020-01-30
Multi Function Photoacid Generator And Chemically Amplified Photoresist Composition For Thick Layer Comprising The Same
App 20200033725 - LIM; Min Young ;   et al.
2020-01-30
Chemically Amplified Photoresist Composition And Photoresist Film Using The Same
App 20190384176 - LIM; Min Young ;   et al.
2019-12-19
Positive Photoresist Composition, Photoresist Pattern Using The Same, And Manufacturing Method Of The Photoresist Pattern
App 20190146338 - LIM; Min Young ;   et al.
2019-05-16
Composite material and method for preparing composite material
Grant 9,790,369 - Kim , et al. October 17, 2
2017-10-17
Resin composition and moulded article using same
Grant 9,637,630 - Lee , et al. May 2, 2
2017-05-02
Low gloss thermoplastic resin composition having improved scratch resistance
Grant 9,353,253 - Chae , et al. May 31, 2
2016-05-31
Resin Composition and Moulded Article Using Same
App 20150376396 - LEE; Seon-Ae ;   et al.
2015-12-31
Composite Material and Method for Preparing Composite Material
App 20150353736 - KIM; Young-Sin ;   et al.
2015-12-10
Low Gloss Thermoplastic Resin Composition Having Improved Scratch Resistance
App 20150183974 - CHAE; Gyeong Ha ;   et al.
2015-07-02
Alkali-soluble resin and negative-type photosensitive resin composition comprising the same
Grant 8,951,713 - Kim , et al. February 10, 2
2015-02-10
Photoreactive polymer and process of making the same
Grant RE45,219 - Kim , et al. October 28, 2
2014-10-28
Colored dispersion, photoresist composition and black matrix
Grant 8,822,132 - Choi , et al. September 2, 2
2014-09-02
Thermoplastic Resin Composition and Article Using the Same
App 20140221547 - KIM; Young-Sin ;   et al.
2014-08-07
Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same
Grant 8,535,874 - Kim , et al. September 17, 2
2013-09-17
Ink composition for roll printing
Grant 8,501,835 - Kim , et al. August 6, 2
2013-08-06
Alkali-soluble Resin And Negative-type Photosensitive Resin Composition Comprising The Same
App 20130130176 - Kim; Han Soo ;   et al.
2013-05-23
Polymer resin compounds and photoresist composition including new polymer resin compounds
Grant 8,361,696 - Lee , et al. January 29, 2
2013-01-29
Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin
Grant 8,357,483 - Kim , et al. January 22, 2
2013-01-22
Fluorene-based resin polymer and method for preparing thereof
Grant 8,338,559 - Heo , et al. December 25, 2
2012-12-25
Composition for manufacturing indurative resin, indurative resin manufactured by the composition and ink composition comprising the resin
Grant 8,323,533 - Lim , et al. December 4, 2
2012-12-04
Alkali-developable resins, method for preparing the same and photosensitive composition comprising the alkali-developable resins
Grant 8,304,169 - Lim , et al. November 6, 2
2012-11-06
Photosensitive resin, method for preparing the resin, photosensitive resin composition and cured product of the resin composition
Grant 8,252,879 - Kim , et al. August 28, 2
2012-08-28
Multifunction urethane monomer, method of manufacturing the monomer and photosensitive resin composition including the monomer
Grant 8,153,751 - Heo , et al. April 10, 2
2012-04-10
Ink composition for color filter and color filter
Grant 8,133,962 - Kim , et al. March 13, 2
2012-03-13
Ink Composition For Roll Printing
App 20110244196 - Kim; Dae Hyun ;   et al.
2011-10-06
Multifunction Urethane Monomer, Method Of Manufacturing The Monomer And Photosensitive Resin Composition Including The Monomer
App 20100331439 - Heo; Yoon Hee ;   et al.
2010-12-30
Alkali-developable Resins, Method For Preparing The Same And Photosensitive Composition Comprising The Alkali-developable Resins
App 20100323295 - Lim; Min-Young ;   et al.
2010-12-23
Photoreactive polymer and process of making the same
Grant 7,795,361 - Kim , et al. September 14, 2
2010-09-14
Fluorene-based Polymer Containing Urethane Groups, Preparation Method Thereof And Negative-type Photosensitive Resin Composition Comprising The Same
App 20100201925 - Kim; Han Soo ;   et al.
2010-08-12
Alkali-soluble Resin And Negative-type Photosensitive Resin Composition Comprising The Same
App 20100196824 - Kim; Han Soo ;   et al.
2010-08-05
Alkali-soluble Resin And Negative-type Photosensitive Resin Composition Comprising The Same
App 20100179294 - Kim; Dae Hyun ;   et al.
2010-07-15
Photosensitive Resin, Method For Preparing The Resin, Photosensitive Resin Composition And Cured Product Of The Resin Composition
App 20100168266 - Lim; Min Young ;   et al.
2010-07-01
Polymer Resin Compounds And Photoresist Composition Including New Polymer Resin Compounds
App 20100105793 - Lee; Keon-Woo ;   et al.
2010-04-29
Colored Dispersion, Photoresist Composition And Black Matrix
App 20100104981 - Choi; Dong Chang ;   et al.
2010-04-29
Photosensitive Resin Composition Comprising A Polymer Prepared By Using Macromonomer As Alkali Soluble Resin
App 20100081089 - Kim; Han-Soo ;   et al.
2010-04-01
Composition For Manufacturing Indurative Resin, Indurative Resin Manufactured By The Composition And Ink Composition Comprising The Resin
App 20100051883 - Lim; Min-Young ;   et al.
2010-03-04
Fluorene-based Resin Polymer And Method For Preparing Thereof
App 20100029892 - Heo; Yoon-Hee ;   et al.
2010-02-04
Multi-functional monomer having a photoreactive group, alignment film for LCD using the monomer, and LCD comprising the alignment film
Grant 7,655,284 - Kim , et al. February 2, 2
2010-02-02
Photosensitive composition comprising triazine-based photoactive compound containing oxime ester
Grant 7,556,910 - Kim , et al. July 7, 2
2009-07-07
Alignment film for LCD using photoreactive polymer and LCD comprising the same
Grant 7,541,073 - Kim , et al. June 2, 2
2009-06-02
Triazine based photoactive compound containing oxime ester
Grant 7,449,574 - Kim , et al. November 11, 2
2008-11-11
Photoreactive compound, liquid crystal alignment layer using the compound, method of manufacturing the alignment layer, and liquid crystal display device containing the alignment layer
Grant 7,422,778 - Lee , et al. September 9, 2
2008-09-09
Photosensitive composition comprising triazine-based photoactive compound containing oxime ester
App 20070128548 - Kim; Sung Hyun ;   et al.
2007-06-07
Triazine based photoactive compound containing oxime ester
App 20070106075 - Kim; Sung Hyun ;   et al.
2007-05-10
Multi-functional monomer having a photoreactive group, alignment film for LCD using the monomer, and LCD comprising the alignment film
App 20070098922 - Kim; Kyung Jun ;   et al.
2007-05-03
Alignment film for LCD using photoreactive polymer and LCD comprising the same
App 20060159865 - Kim; Kyung Jun ;   et al.
2006-07-20
Photoreactive polymer and process of making the same
App 20060160970 - Kim; Heon ;   et al.
2006-07-20
Photoreactive compound, liquid crystal alignment layer using the compound, method of manufacturing the alignment layer, and liquid crystal display device containing the alignment layer
App 20060121213 - Lee; Byung Hyun ;   et al.
2006-06-08

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