LIM; Chang Moon

Patent Applications and Registrations

Patent applications and USPTO patent grants for LIM; Chang Moon.The latest application filed is for "euv mask and photomask fabricated by using the euv mask".

Company Profile

0.17.19

LIM; Chang Moon - Gyeonggi-do KR
Lim; Chang Moon - Seoul KR
Lim; Chang Moon - Anyang-si KR
Lim; Chang Moon - Icheon KR
Lim; Chang Moon - Icheon-si KR
Lim; Chang Moon - Icheon-shi KR
Lim; Chang Moon - Gyunggi-do KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Euv Mask And Photomask Fabricated By Using The Euv Mask App 20220283488 - PARK; Suk Won ; et al.	2022-09-08
Reflective mask and method of fabricating the same Grant 9,612,524 - Lee , et al. April 4, 2	2017-04-04
Reflective Mask And Method Of Fabricating The Same App 20160209741 - LEE; In Hwan ; et al.	2016-07-21
Semiconductor Device And Method For Manufacturing The Same App 20150311211 - LEE; Byoung Hoon ; et al.	2015-10-29
Semiconductor device and method for manufacturing the same Grant 9,105,655 - Lee , et al. August 11, 2	2015-08-11
Photomask and method for forming pattern of semiconductor device using the same Grant 8,906,584 - Lee , et al. December 9, 2	2014-12-09
Lithography processes utilizing extreme ultraviolet rays and methods of manufacturing semiconductor devices using the same Grant 8,841,219 - Park , et al. September 23, 2	2014-09-23
Photomask And Method For Forming Pattern Of Semiconductor Device Using The Same App 20140065524 - LEE; Byoung Hoon ; et al.	2014-03-06
Lithography Processes Utilizing Extreme Ultraviolet Rays And Methods Of Manufacturing Semiconductor Devices Using The Same App 20130210234 - PARK; Jun Taek ; et al.	2013-08-15
Semiconductor Device And Method For Manufacturing The Same App 20130153990 - LEE; Byoung Hoon ; et al.	2013-06-20
Semiconductor device and method for manufacturing the same Grant 7,915,113 - Kim , et al. March 29, 2	2011-03-29
Method for manufacturing a semiconductor device Grant 7,838,201 - Jung , et al. November 23, 2	2010-11-23
Method for fabricating semiconductor device Grant 7,629,595 - Jung , et al. December 8, 2	2009-12-08
Diffused aerial image model semiconductor device fabrication Grant 7,571,424 - Lim , et al. August 4, 2	2009-08-04
Method for Manufacturing a Semiconductor Device App 20090191709 - Jung; Jae Chang ; et al.	2009-07-30
Method of forming pattern of semiconductor device Grant 7,553,771 - Kim , et al. June 30, 2	2009-06-30
Polymer for immersion lithography and photoresist composition Grant 7,534,548 - Jung , et al. May 19, 2	2009-05-19
Semiconductor Device and Method for Manufacturing the Same App 20090101970 - Kim; Jin Soo ; et al.	2009-04-23
Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same Grant 7,462,439 - Jung , et al. December 9, 2	2008-12-09
Method of Forming Pattern of Semiconductor Device App 20080286954 - Kim; Seo Min ; et al.	2008-11-20
Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern Grant 7,419,760 - Jung , et al. September 2, 2	2008-09-02
Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same Grant 7,381,519 - Jung , et al. June 3, 2	2008-06-03
Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device Grant 7,303,858 - Jung , et al. December 4, 2	2007-12-04
Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same Grant 7,288,364 - Jung , et al. October 30, 2	2007-10-30
Method For Fabricating Semiconductor Device App 20070164235 - Jung; Jae Chang ; et al.	2007-07-19
Diffused aerial image model semiconductor device fabrication App 20070106973 - Lim; Chang Moon ; et al.	2007-05-10
Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same App 20070003861 - Jung; Jae Chang ; et al.	2007-01-04
Polymer for immersion lithography, photoresist composition containing the same, method of manufacturing a semiconductor device, and semiconductor device App 20060275695 - Jung; Jae Chang ; et al.	2006-12-07
Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same App 20060127803 - Jung; Jae Chang ; et al.	2006-06-15
Photoacid generating polymer, its preparation method and top anti-reflective coating composition comprising the same App 20060127804 - Jung; Jae Chang ; et al.	2006-06-15
Top anti-reflective coating composition and method for forming the pattern of a semiconductor device using the same App 20060063104 - Jung; Jae Chang ; et al.	2006-03-23
Phase shift mask Grant 7,008,734 - Lim , et al. March 7, 2	2006-03-07
Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same App 20060046184 - Jung; Jae Chang ; et al.	2006-03-02
Phase shift mask App 20040110071 - Lim, Chang Moon ; et al.	2004-06-10

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