loadpatents
Patent applications and USPTO patent grants for Liebert; Reuel B..The latest application filed is for "technique for low-temperature ion implantation".
Patent | Date |
---|---|
Technique for low-temperature ion implantation Grant 8,319,196 - England , et al. November 27, 2 | 2012-11-27 |
Technique For Low-temperature Ion Implantation App 20110207308 - ENGLAND; Jonathan G. ;   et al. | 2011-08-25 |
Technique for low-temperature ion implantation Grant 7,935,942 - England , et al. May 3, 2 | 2011-05-03 |
Technique for low-temperature ion implantation App 20080044938 - England; Jonathan ;   et al. | 2008-02-21 |
Ion implanter having enhanced low energy ion beam transport App 20060043316 - Liebert; Reuel B. ;   et al. | 2006-03-02 |
Apparatus and methods for junction formation using optical illumination App 20040235281 - Downey, Daniel F. ;   et al. | 2004-11-25 |
Methods and apparatus for ion beam neutralization in magnets Grant 6,762,423 - Liebert , et al. July 13, 2 | 2004-07-13 |
Methods And Apparatus For Ion Beam Neutralization In Magnets App 20040084635 - Liebert, Reuel B. ;   et al. | 2004-05-06 |
Dose monitor for plasma doping system App 20020030167 - Liebert, Reuel B. ;   et al. | 2002-03-14 |
Dose monitor for plasma doping system Grant 6,020,592 - Liebert , et al. February 1, 2 | 2000-02-01 |
Method and apparatus for ion beam centroid location Grant 4,724,324 - Liebert February 9, 1 | 1988-02-09 |
Method for reducing phosphorous contamination in a vacuum processing chamber Grant 4,512,812 - Liebert , et al. April 23, 1 | 1985-04-23 |
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