Liao; Weng-Chung
Patent Applications and Registrations
Patent applications and USPTO patent grants for Liao; Weng-Chung.The latest application filed is for "nanoimprint lithography having solvent-free liquid polymer resist".
- Liao; Weng-Chung - Pingtung TW
- Liao; Weng-Chung - Pingtung City TW
- Liao; Weng-Chung - Tainan TW
| Patent | Date |
|---|---|
| Imprint lithography utilizing silated acidic polymers Grant 7,618,574 - Hsu , et al. November 17, 2 | 2009-11-17 |
| Nanoimprint lithography having solvent-free liquid polymer resist App 20070205180 - Liao; Weng-Chung ; et al. | 2007-09-06 |
| Imprint lithography utilizing silated acidic polymers App 20070012652 - Hsu; Lien-Chung ; et al. | 2007-01-18 |
| Method for high aspect ratio pattern transfer Grant 7,063,939 - Liao , et al. June 20, 2 | 2006-06-20 |
| Method for high aspect ratio pattern transfer App 20050026090 - Liao, Weng-Chung ; et al. | 2005-02-03 |
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