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Method Of Making A Semiconductor Structure
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Semiconductor structure
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Semiconductor Device
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Non-volatile memory having an erase gate formed between two floating gates with two word lines formed on other sides and a method for forming the same
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Semiconductor Structure and Method for Forming the Same
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Contact structure for high aspect ratio and method of fabricating the same
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Semiconductor structure and method for forming the same
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Semiconductor Structure and Method for Forming the Same
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Semiconductor Structure
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Flash memory device having high coupling ratio
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Semiconductor structure and method for forming the same
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Manufacturing Method Of Non-volatile Memory And Non-volatile Memory
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Method for fabricating semiconductor structure with passivation sidewall block
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Flash Memory Device Having High Coupling Ratio
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Damascene non-volatile memory cells and methods for forming the same
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Method For Fabricating Semiconductor Structure With Passivation Sidewall Block
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Semiconductor Structure And Method For Forming The Same
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Contact Structure For High Aspect Ratio And Method Of Fabricating The Same
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Semiconductor device structure and method for manufacturing the same
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Damascene Non-volatile Memory Cells And Methods For Forming The Same
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Integrated circuit and fabricating method thereof
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Damascene non-volatile memory cells and methods for forming the same
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Integrated Circuit And Fabricating Method Thereof
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Semiconductor Device Structure And Method For Manufacturing The Same
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Damascene Non-volatile Memory Cells And Methods For Forming The Same
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Microelectronic device with a spacer redistribution layer via and method of making the same
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Butted contact resistance of an SRAM by double VCC implantation
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