loadpatents
Patent applications and USPTO patent grants for Liang; Ming-Chung.The latest application filed is for "semiconductor device with self-aligned vias".
Patent | Date |
---|---|
Semiconductor Device With Self-aligned Vias App 20220285216 - Chen; Chien-Han ;   et al. | 2022-09-08 |
Interconnect Structure with Vias Extending Through Multiple Dielectric Layers App 20220173042 - Ho; Chun-Te ;   et al. | 2022-06-02 |
Semiconductor device with self-aligned vias Grant 11,342,224 - Chen , et al. May 24, 2 | 2022-05-24 |
Interconnect structure with vias extending through multiple dielectric layers Grant 11,251,127 - Ho , et al. February 15, 2 | 2022-02-15 |
Cut last self-aligned litho-etch patterning Grant 11,037,789 - Huang , et al. June 15, 2 | 2021-06-15 |
Curing photo resist for improving etching selectivity Grant 11,018,021 - Hsieh , et al. May 25, 2 | 2021-05-25 |
Semiconductor Device With Self-aligned Vias App 20200135562 - Chen; Chien-Han ;   et al. | 2020-04-30 |
Interconnect Structure and Method App 20200126915 - Ho; Chun-Te ;   et al. | 2020-04-23 |
Cut Last Self-aligned Litho-etch Patterning App 20200111670 - Huang; Kuan-Wei ;   et al. | 2020-04-09 |
Cut last self-aligned litho-etch patterning Grant 10,553,431 - Huang , et al. Fe | 2020-02-04 |
Interconnect structure and method Grant 10,522,468 - Ho , et al. Dec | 2019-12-31 |
Curing Photo Resist for Improving Etching Selectivity App 20190333777 - Hsieh; Wen-Kuo ;   et al. | 2019-10-31 |
Curing photo resist for improving etching selectivity Grant 10,347,505 - Hsieh , et al. July 9, 2 | 2019-07-09 |
Integrated circuit fabrication with a passivation agent Grant 10,290,535 - Ho , et al. | 2019-05-14 |
Interconnect structure and method of forming the same Grant 10,269,700 - Chiu , et al. | 2019-04-23 |
Self-aligned double patterning Grant 10,256,096 - Huang , et al. | 2019-04-09 |
Cut First Self-aligned Litho-etch Patterning App 20190051523 - Huang; Kuan-Wei ;   et al. | 2019-02-14 |
Interconnect Structure and Method App 20190035734 - Ho; Chun-Te ;   et al. | 2019-01-31 |
Method for manufacturing a semiconductor device Grant 10,157,775 - Chen , et al. Dec | 2018-12-18 |
Cut first self-aligned litho-etch patterning Grant 10,109,486 - Huang , et al. October 23, 2 | 2018-10-23 |
Method For Manufacturing A Semiconductor Device App 20180294185 - CHEN; Chih-Hao ;   et al. | 2018-10-11 |
Semiconductor device and method of forming same Grant 10,090,167 - Chiu , et al. October 2, 2 | 2018-10-02 |
Interconnect Structure and Method of Forming the Same App 20180182703 - Chiu; Chien-Chih ;   et al. | 2018-06-28 |
Methods of forming an interconnect structure Grant 9,953,863 - Ho , et al. April 24, 2 | 2018-04-24 |
Methods Of Forming An Interconnect Structure App 20180102279 - Ho; Chun-Te ;   et al. | 2018-04-12 |
Interconnect structure and method of forming the same Grant 9,917,048 - Chiu , et al. March 13, 2 | 2018-03-13 |
Cut Last Self-aligned Litho-etch Patterning App 20170365472 - Huang; Kuan-Wei ;   et al. | 2017-12-21 |
Cut First Self-aligned Litho-etch Patterning App 20170294311 - Huang; Kuan-Wei ;   et al. | 2017-10-12 |
Cut last self-aligned litho-etch patterning Grant 9,761,451 - Huang , et al. September 12, 2 | 2017-09-12 |
Method for forming conducting via and damascene structure Grant 9,728,445 - Hsieh , et al. August 8, 2 | 2017-08-08 |
Cut first self-aligned litho-etch patterning Grant 9,698,016 - Huang , et al. July 4, 2 | 2017-07-04 |
Method and apparatus of forming a via Grant 9,496,217 - Tsai , et al. November 15, 2 | 2016-11-15 |
Cut First Self-aligned Litho-etch Patterning App 20160314972 - Huang; Kuan-Wei ;   et al. | 2016-10-27 |
Cut Last Self-aligned Litho-etch Patterning App 20160276154 - Huang; Kuan-Wei ;   et al. | 2016-09-22 |
Cut first self-aligned litho-etch patterning Grant 9,425,049 - Huang , et al. August 23, 2 | 2016-08-23 |
Self-aligned double patterning Grant 9,406,511 - Huang , et al. August 2, 2 | 2016-08-02 |
Curing Photo Resist for Improving Etching Selectivity App 20160218016 - Hsieh; Wen-Kuo ;   et al. | 2016-07-28 |
Cut last self-aligned litho-etch patterning Grant 9,368,349 - Huang , et al. June 14, 2 | 2016-06-14 |
Semiconductor Device and Method of Forming Same App 20160111324 - Chiu; Chien-Chih ;   et al. | 2016-04-21 |
Curing photo resist for improving etching selectivity Grant 9,305,839 - Hsieh , et al. April 5, 2 | 2016-04-05 |
Reduction of OCD measurement noise by way of metal via slots Grant 9,252,060 - Tsai , et al. February 2, 2 | 2016-02-02 |
Self-Aligned Double Patterning App 20160020100 - Huang; Kuan-Wei ;   et al. | 2016-01-21 |
Self-Aligned Double Patterning App 20160013103 - Huang; Kuan-Wei ;   et al. | 2016-01-14 |
Interconnect Structure and Method of Forming the Same App 20160005689 - Chiu; Chien-Chih ;   et al. | 2016-01-07 |
Interconnect Structure And Method Of Forming The Same App 20150294937 - Chiu; Chien-Chih ;   et al. | 2015-10-15 |
Interconnect structure and method of forming the same Grant 9,142,453 - Chiu , et al. September 22, 2 | 2015-09-22 |
Organosilicate polymer mandrel for self-aligned double patterning process Grant 9,123,656 - Hsieh , et al. September 1, 2 | 2015-09-01 |
Method For Forming Conducting Via And Damascene Structure App 20150206792 - HSIEH; Wen-Kuo ;   et al. | 2015-07-23 |
Cut Last Self-aligned Litho-etch Patterning App 20150200096 - Huang; Kuan-Wei ;   et al. | 2015-07-16 |
Cut First Self-aligned Litho-etch Patterning App 20150200095 - Huang; Kuan-Wei ;   et al. | 2015-07-16 |
Curing Photo Resist for Improving Etching Selectivity App 20150179511 - Hsieh; Wen-Kuo ;   et al. | 2015-06-25 |
Method of forming via holes Grant 8,895,445 - Hsieh , et al. November 25, 2 | 2014-11-25 |
Integrated circuits and methods for forming the integrated circuits Grant 08617986 - | 2013-12-31 |
Integrated circuits and methods for forming the integrated circuits Grant 8,617,986 - Liang , et al. December 31, 2 | 2013-12-31 |
Reduction Of Ocd Measurement Noise By Way Of Metal Via Slots App 20130256659 - Tsai; Chi-Ming ;   et al. | 2013-10-03 |
Method for fabricating low-k dielectric and Cu interconnect Grant 8,354,346 - Chen , et al. January 15, 2 | 2013-01-15 |
Double patterning strategy for contact hole and trench in photolithography Grant 8,222,151 - Liang , et al. July 17, 2 | 2012-07-17 |
Method Of Forming Via Holes App 20120149204 - HSIEH; Wen-Kuo ;   et al. | 2012-06-14 |
Double Patterning Strategy For Contact Hole And Trench In Photolithography App 20110275218 - LIANG; Ming-Chung ;   et al. | 2011-11-10 |
Method for Fabricating Low-k Dielectric and Cu Interconnect App 20110263127 - Chen; Chih-Hao ;   et al. | 2011-10-27 |
Double patterning strategy for contact hole and trench in photolithography Grant 8,008,206 - Liang , et al. August 30, 2 | 2011-08-30 |
Method for fabricating low-k dielectric and Cu interconnect Grant 7,998,873 - Chen , et al. August 16, 2 | 2011-08-16 |
Integrated Circuits And Methods For Forming The Integrated Circuits App 20110108994 - LIANG; Ming-Chung ;   et al. | 2011-05-12 |
Double Patterning Strategy For Contact Hole And Trench In Photolithography App 20110070738 - LIANG; Ming-Chung ;   et al. | 2011-03-24 |
Method And Apparatus Of Forming A Via App 20100308469 - Tsai; Hsin-Yi ;   et al. | 2010-12-09 |
Metal interconnect structure and process for forming same Grant 7,670,947 - Wu , et al. March 2, 2 | 2010-03-02 |
Method for Fabricating Low-k Dielectric and Cu Interconnect App 20080311756 - Chen; Chih-Hao ;   et al. | 2008-12-18 |
Metal interconnect structure and process for forming same App 20080171442 - Wu; Tsang-Jiuh ;   et al. | 2008-07-17 |
Method for reducing dimensions between patterns on a hardmask Grant 7,361,604 - Chung , et al. April 22, 2 | 2008-04-22 |
Method for reducing dimensions between patterns on a photoresist Grant 7,303,995 - Chung , et al. December 4, 2 | 2007-12-04 |
Method of reducing pattern pitch in integrated circuits Grant 7,105,099 - Chung , et al. September 12, 2 | 2006-09-12 |
Three-dimensional Memory Structure And Manufacturing Method Thereof App 20060197180 - Lai; Erh-Kun ;   et al. | 2006-09-07 |
Method for reducing dimensions between patterns on a photoresist Grant 7,033,948 - Chung , et al. April 25, 2 | 2006-04-25 |
Three-dimensional memory structure and manufacturing method thereof Grant 7,030,459 - Lai , et al. April 18, 2 | 2006-04-18 |
[method Of Reducing Pattern Pitch In Integrated Circuits] App 20060011575 - Chung; Henry ;   et al. | 2006-01-19 |
Three-dimensional Memory Structure And Manufacturing Method Thereof App 20050133883 - Lai, Erh-Kun ;   et al. | 2005-06-23 |
[three-dimensional Memory Structure And Manufacturing Method Thereof] App 20050006719 - Lai, Erh-Kun ;   et al. | 2005-01-13 |
Method for fluorocarbon film depositing App 20040161946 - Tsai, Hsin-Yi ;   et al. | 2004-08-19 |
Method for reducing pitch Grant 6,774,051 - Chung , et al. August 10, 2 | 2004-08-10 |
Method for reducing dimensions between patterns on a photoresist App 20040132225 - Chung, Henry Wei-Ming ;   et al. | 2004-07-08 |
Method for reducing dimensions between patterns on a photoresist Grant 6,750,150 - Chung , et al. June 15, 2 | 2004-06-15 |
Method of forming a fluorocarbon polymer film on a substrate using a passivation layer Grant 6,746,970 - Liang , et al. June 8, 2 | 2004-06-08 |
Method of forming a fluorocarbon polymer film on a substrate using a passivation layer App 20030234440 - Liang, Ming-Chung ;   et al. | 2003-12-25 |
Method for eliminating standing waves in a photoresist profile App 20030235998 - Liang, Ming-Chung | 2003-12-25 |
Method for reducing pitch App 20030232509 - Chung, Chia-Chi ;   et al. | 2003-12-18 |
Method for reducing dimensions between patterns on a photomask App 20030224254 - Chung, Henry Wei-Ming ;   et al. | 2003-12-04 |
Method for reducing dimensions between patterns on a hardmask App 20030224602 - Chung, Henry Wei-Ming ;   et al. | 2003-12-04 |
Method for reducing dimensions between patterns on a photoresist App 20030216051 - Chung, Henry Wei-Ming ;   et al. | 2003-11-20 |
Operating method of a semiconductor etcher Grant 6,635,579 - Liang , et al. October 21, 2 | 2003-10-21 |
Utilizing chemical dry etching for forming rounded corner in shallow trench isolation process App 20030186555 - Liang, Ming-Chung ;   et al. | 2003-10-02 |
Apparatus for cleaning a wafer with shearing stress from slab with curved portion Grant 6,601,596 - Liang , et al. August 5, 2 | 2003-08-05 |
Method for reducing dimensions between patterns on a photoresist App 20030082916 - Chung, Henry Wei-Ming ;   et al. | 2003-05-01 |
Dry etching method for manufacturing processes of semiconductor devices App 20030068898 - Lee, Chun-Hung ;   et al. | 2003-04-10 |
Plasma etching gas App 20030017708 - Liang, Ming-Chung | 2003-01-23 |
Chamber conditioning method App 20030008503 - Tsai, Shin-Yi ;   et al. | 2003-01-09 |
Inspection method to check contact hole open after contact etching App 20020134935 - Liang, Ming-Chung ;   et al. | 2002-09-26 |
Apparatus for cleaning a wafer App 20020134411 - Liang, Ming-Chung ;   et al. | 2002-09-26 |
Vertical batch type wafer cleaning apparatus App 20020117192 - Liang, Ming-Chung | 2002-08-29 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.