Li; Lumin

Patent Applications and Registrations

Patent applications and USPTO patent grants for Li; Lumin.The latest application filed is for "multi zone gas injection upper electrode system".

Company Profile

3.38.35

Li; Lumin - Pleasanton CA
Li; Lumin - San Jose CA US
Li; Lumin - Fremont CA US
Li; Lumin - Santa Clara CA
Li; Lumin - Ellicott City MD
Li; Lumin - Ellicot City MD

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Multi Zone Gas Injection Upper Electrode System App 20200243307 - Bise; Ryan ; et al.	2020-07-30
Multi zone gas injection upper electrode system Grant 10,622,195 - Bise , et al.	2020-04-14
Dual zone temperature control of upper electrodes Grant 9,263,240 - Marakhtanov , et al. February 16, 2	2016-02-16
Apparatus and method for controlling plasma potential Grant 9,111,724 - Keil , et al. August 18, 2	2015-08-18
Air compressor with shut-off mechanism Grant 8,961,145 - Hill , et al. February 24, 2	2015-02-24
Apparatus and method for controlling etch uniformity Grant 8,674,255 - Lenz , et al. March 18, 2	2014-03-18
Air Compressor With Shut-Off Mechanism App 20130266455 - Hill; Sean D. ; et al.	2013-10-10
Dual Zone Temperature Control Of Upper Electrodes App 20130126476 - Marakhtanov; Alexei ; et al.	2013-05-23
Multi Zone Gas Injection Upper Electrode System App 20130126486 - Bise; Ryan ; et al.	2013-05-23
Air compressor with shut-off mechanism Grant 8,393,873 - Hill , et al. March 12, 2	2013-03-12
Apparatus and method for controlling plasma density profile Grant 8,299,390 - Dhindsa , et al. October 30, 2	2012-10-30
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same Grant 8,114,246 - Ni , et al. February 14, 2	2012-02-14
Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor Grant 8,080,760 - Dhindsa , et al. December 20, 2	2011-12-20
Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same Grant 8,000,082 - Dhindsa , et al. August 16, 2	2011-08-16
Double mask self-aligned double patterning technology (SADPT) process Grant 7,977,242 - Sadjadi , et al. July 12, 2	2011-07-12
Method for plasma etching performance enhancement Grant 7,977,390 - Ji , et al. July 12, 2	2011-07-12
Air Compressor With Shut-off Mechanism App 20110123353 - Hill; Sean D. ; et al.	2011-05-26
Apparatus and Method for Controlling Plasma Potential App 20110024045 - Keil; Douglas ; et al.	2011-02-03
Apparatus and Method for Controlling Plasma Potential App 20110024046 - Keil; Douglas ; et al.	2011-02-03
Air compressor with shut-off mechanism Grant 7,874,807 - Hill , et al. January 25, 2	2011-01-25
Magnetic enhancement for mechanical confinement of plasma Grant 7,838,086 - Keil , et al. November 23, 2	2010-11-23
High aspect ratio etch using modulation of RF powers of various frequencies Grant 7,749,353 - Rusu , et al. July 6, 2	2010-07-06
Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor Grant 7,732,728 - Dhindsa , et al. June 8, 2	2010-06-08
Apparatus and Method for Controlling Plasma Density Profile App 20100126847 - Dhindsa; Rajinder ; et al.	2010-05-27
Apparatuses For Adjusting Electrode Gap In Capacitively-coupled Rf Plasma Reactor App 20100124822 - Dhindsa; Rajinder ; et al.	2010-05-20
Apparatus and method for controlling plasma density profile Grant 7,683,289 - Dhindsa , et al. March 23, 2	2010-03-23
Electrically enhancing the confinement of plasma Grant 7,632,375 - Kuthi , et al. December 15, 2	2009-12-15
Double Mask Self-aligned Double Patterning Technology (sadpt) Process App 20090215272 - Sadjadi; S. M. Reza ; et al.	2009-08-27
Electrostatic Chuck Assembly With Dielectric Material And/or Cavity Having Varying Thickness, Profile And/or Shape, Method Of Use And Apparatus Incorporating Same App 20090174983 - Dhindsa; Rajinder ; et al.	2009-07-09
Electrically Enhancing The Confinement Of Plasma App 20090165954 - Kuthi; Andras ; et al.	2009-07-02
Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same Grant 7,525,787 - Dhindsa , et al. April 28, 2	2009-04-28
Magnetic Enhancement For Mechanical Confinement Of Plasma App 20090041951 - Keil; Douglas L. ; et al.	2009-02-12
Magnetic enhancement for mechanical confinement of plasma Grant 7,455,748 - Keil , et al. November 25, 2	2008-11-25
Two-pump air compressor App 20080240933 - Hill; Sean D. ; et al.	2008-10-02
Multiple frequency plasma processor method and apparatus Grant 7,405,521 - Dhindsa , et al. July 29, 2	2008-07-29
Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor App 20080171444 - Dhindsa; Rajinder ; et al.	2008-07-17
Apparatus and Method for Controlling Plasma Potential App 20080006205 - Keil; Douglas ; et al.	2008-01-10
Reducing line edge roughness App 20070181530 - Huang; Zhi-Song ; et al.	2007-08-09
Apparatus and method for controlling plasma density profile App 20070141729 - Dhindsa; Rajinder ; et al.	2007-06-21
Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same App 20070076346 - Dhindsa; Rajinder ; et al.	2007-04-05
Vacuum Plasma Processor Having A Chamber With Electrodes And A Coil For Plasma Excitation And Method Of Operating Same App 20070044915 - Ni; Tuqiang ; et al.	2007-03-01
Method for plasma etching performance enhancement App 20070026677 - Ji; Bing ; et al.	2007-02-01
Method for forming a dual damascene structure Grant 7,169,695 - Huang , et al. January 30, 2	2007-01-30
High aspect ratio etch using modulation of RF powers of various frequencies App 20070012659 - Rusu; Camelia ; et al.	2007-01-18
Emergency radio, light and power supply App 20070002562 - VanWambeke; Weston J. ; et al.	2007-01-04
High aspect ratio etch using modulation of RF powers of various frequencies Grant 7,144,521 - Rusu , et al. December 5, 2	2006-12-05
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same Grant 7,105,102 - Ni , et al. September 12, 2	2006-09-12
High aspect ratio etch using modulation of RF powers of various frequencies App 20060118518 - Rusu; Camelia ; et al.	2006-06-08
Plasma processor in plasma confinement region within a vacuum chamber Grant 6,984,288 - Dhindsa , et al. January 10, 2	2006-01-10
Multiple frequency plasma etch reactor App 20050039682 - Dhindsa, Raj ; et al.	2005-02-24
Magnetic enhancement for mechanical confinement of plasma App 20050006028 - Keil, Douglas L. ; et al.	2005-01-13
Method for plasma etching performance enhancement Grant 6,833,325 - Huang , et al. December 21, 2	2004-12-21
Semiconductor process chamber electrode App 20040173159 - Kuthi, Andras ; et al.	2004-09-09
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same App 20040154747 - Ni, Tuqiang ; et al.	2004-08-12
Plasma etching of dielectric layer with etch profile control Grant 6,746,961 - Ni , et al. June 8, 2	2004-06-08
Method for plasma etching performance enhancement App 20040072443 - Huang, Zhisong ; et al.	2004-04-15
Method for forming a dual damascene structure App 20040072430 - Huang, Zhisong ; et al.	2004-04-15
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same Grant 6,716,303 - Ni , et al. April 6, 2	2004-04-06
Plasma etching of dielectric layer with etch profile control App 20030045114 - Ni, Tuqiang ; et al.	2003-03-06
Configurable plasma volume etch chamber Grant 6,527,911 - Yen , et al. March 4, 2	2003-03-04
Dual frequency plasma processor App 20030029567 - Dhindsa, Rajinder ; et al.	2003-02-13
Perforated plasma confinement ring in plasma reactors Grant 6,506,685 - Li , et al. January 14, 2	2003-01-14
Perforated plasma confinement ring in plasma reactors App 20010000104 - Li, Lumin ; et al.	2001-04-05
Perforated plasma confinement ring in plasma reactors Grant 6,178,919 - Li , et al. January 30, 2	2001-01-30
Methods for selective plasma etch Grant 6,090,304 - Zhu , et al. July 18, 2	2000-07-18
Dual-frequency capacitively-coupled plasma reactor for materials processing Grant 5,656,123 - Salimian , et al. August 12, 1	1997-08-12

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