| Patent | Date |
|---|
Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall
Grant 10,170,280 - Chandrachood , et al. J | 2019-01-01 |
Plasma Reactor Having An Array Of Plural Individually Controlled Gas Injectors Arranged Along A Circular Side Wall
App 20160042917 - Chandrachood; Madhavi R. ; et al. | 2016-02-11 |
Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors
Grant 9,218,944 - Chandrachood , et al. December 22, 2 | 2015-12-22 |
Method and apparatus for photomask plasma etching
Grant 8,568,553 - Kumar , et al. October 29, 2 | 2013-10-29 |
Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside
Grant 8,017,029 - Chandrachood , et al. September 13, 2 | 2011-09-13 |
Process for etching a transparent workpiece including backside endpoint detection steps
Grant 8,012,366 - Lewington , et al. September 6, 2 | 2011-09-06 |
Mask etch plasma reactor with cathode providing a uniform distribution of etch rate
Grant 8,002,946 - Lewington , et al. August 23, 2 | 2011-08-23 |
Mask etch plasma reactor with variable process gas distribution
Grant 7,976,671 - Chandrachood , et al. July 12, 2 | 2011-07-12 |
Method And Apparatus For Photomask Plasma Etching
App 20110162797 - Kumar; Ajay ; et al. | 2011-07-07 |
Plasma reactor for processing a workpiece and having a tunable cathode
Grant 7,967,930 - Lewington , et al. June 28, 2 | 2011-06-28 |
Method and apparatus for photomask etching
Grant 7,964,818 - Ryabova , et al. June 21, 2 | 2011-06-21 |
Method and apparatus for photomask plasma etching
Grant 7,943,005 - Kumar , et al. May 17, 2 | 2011-05-17 |
Method and apparatus for photomask plasma etching
Grant 7,909,961 - Kumar , et al. March 22, 2 | 2011-03-22 |
Cluster tool with integrated metrology chamber for transparent substrates
Grant 7,846,848 - Lewington , et al. December 7, 2 | 2010-12-07 |
Inductively Coupled Plasma Reactor Having Rf Phase Control And Methods Of Use Thereof
App 20100276391 - GRIMBERGEN; MICHAEL N. ; et al. | 2010-11-04 |
Method and apparatus for integrating metrology with etch processing
Grant 7,601,272 - Nguyen , et al. October 13, 2 | 2009-10-13 |
Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another
Grant 7,520,999 - Chandrachood , et al. April 21, 2 | 2009-04-21 |
Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator
Grant 7,504,041 - Chandrachood , et al. March 17, 2 | 2009-03-17 |
Plasma reactor with a dynamically adjustable plasma source power applicator
Grant 7,431,797 - Chandrachood , et al. October 7, 2 | 2008-10-07 |
Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another
Grant 7,419,551 - Chandrachood , et al. September 2, 2 | 2008-09-02 |
Method And Apparatus For Photomask Plasma Etching
App 20080099431 - Kumar; Ajay ; et al. | 2008-05-01 |
Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside
App 20080099434 - Chandrachood; Madhavi R. ; et al. | 2008-05-01 |
Method And Apparatus For Photomask Plasma Etching
App 20080099426 - Kumar; Ajay ; et al. | 2008-05-01 |
Plasma reactor for processing a transparent workpiece with backside process endpoint detection
App 20080099437 - Lewington; Richard ; et al. | 2008-05-01 |
Mask etch plasma reactor with backside optical sensors and multiple frequency control of etch distribution
App 20080099450 - Lewington; Richard ; et al. | 2008-05-01 |
Workpiece rotation apparatus for a plasma reactor system
App 20080099451 - Lewington; Richard ; et al. | 2008-05-01 |
Mask etch plasma reactor with variable process gas distribution
App 20080102202 - Chandrachood; Madhavi R. ; et al. | 2008-05-01 |
Process for etching a transparent workpiece including backside endpoint detection steps
App 20080099432 - Lewington; Richard ; et al. | 2008-05-01 |
Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors
App 20080102001 - Chandrachood; Madhavi R. ; et al. | 2008-05-01 |
Method And Apparatus For Photomask Etching
App 20080101978 - Ryabova; Elmira ; et al. | 2008-05-01 |
Plasma reactor for processing a workpiece and having a tunable cathode
App 20080100223 - Lewington; Richard ; et al. | 2008-05-01 |
Mask etch plasma reactor with cathode providing a uniform distribution of etch rate
App 20080100222 - Lewington; Richard ; et al. | 2008-05-01 |
Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another
App 20070256784 - Chandrachood; Madhavi R. ; et al. | 2007-11-08 |
Plasma reactor with a dynamically adjustable plasma source power applicator
App 20070256787 - Chandrachood; Madhavi R. ; et al. | 2007-11-08 |
Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator
App 20070257009 - Chandrachood; Madhavi R. ; et al. | 2007-11-08 |
Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another
App 20070257008 - Chandrachood; Madhavi R. ; et al. | 2007-11-08 |
Method And Apparatus For Integrating Metrology With Etch Processing
App 20070097383 - NGUYEN; KHIEM K. ; et al. | 2007-05-03 |
Integrated pump apparatus for semiconductor processing
App 20070020115 - Huntley; Graeme ; et al. | 2007-01-25 |
Cluster Tool With Integrated Metrology Chamber For Transparent Substrates
App 20070012660 - Lewington; Richard ; et al. | 2007-01-18 |
Integrated metrology chamber for transparent substrates
App 20060154388 - Lewington; Richard ; et al. | 2006-07-13 |
| 