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name:-0.02511191368103
name:-0.012737989425659
name:-0.005958080291748
Leunissen; Leonardus Patent Filings

Leunissen; Leonardus

Patent Applications and Registrations

Patent applications and USPTO patent grants for Leunissen; Leonardus.The latest application filed is for "chemical mechanical polishing of substrates containing copper and ruthenium".

Company Profile
5.11.17
  • Leunissen; Leonardus - Ludwigshafen DE
  • LEUNISSEN; Leonardus - Veldhoven NL
  • Leunissen; Leonardus - Hamme-Mille N/A BE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
Grant 11,286,402 - Reichardt , et al. March 29, 2
2022-03-29
Chemical Mechanical Polishing Of Substrates Containing Copper And Ruthenium
App 20220064485 - GUEVENC; Haci Osman ;   et al.
2022-03-03
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
Grant 11,264,250 - Reichardt , et al. March 1, 2
2022-03-01
Chemical Mechanical Polishing Of Substrates Containing Copper And Ruthenium
App 20220056307 - GUEVENC; Haci Osman ;   et al.
2022-02-24
Chemical Mechanical Polishing Of Substrates Containing Copper And Ruthenium
App 20220049125 - GUEVENC; Haci Osman ;   et al.
2022-02-17
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt Comprising Substrates
App 20210102093 - REICHARDT; Robert ;   et al.
2021-04-08
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates
Grant 10,899,945 - Reichardt , et al. January 26, 2
2021-01-26
Composition for post chemical-mechanical-polishing cleaning
Grant 10,865,361 - Daeschlein , et al. December 15, 2
2020-12-15
Composition for post chemical-mechanical-polishing cleaning
Grant 10,844,325 - Daeschlein , et al. November 24, 2
2020-11-24
Chemical Mechanical Polishing Composition
App 20200299547 - DAESCHLEIN; Christian ;   et al.
2020-09-24
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt And / Or Cobalt Alloy Comprising Substrates
App 20200294813 - REICHARDT; Robert ;   et al.
2020-09-17
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
Grant 10,738,219 - Reichardt , et al. A
2020-08-11
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
Grant 10,385,236 - Reichardt , et al. A
2019-08-20
Composition For Post Chemical-mechanical-polishing Cleaning
App 20190144781 - DAESCHLEIN; Christian ;   et al.
2019-05-16
Composition For Post Chemical-mechanical-polishing Cleaning
App 20190002802 - DAESCHLEIN; Christian ;   et al.
2019-01-03
Composition For Post Chemical-mechanical-polishing Cleaning
App 20180371371 - DAESCHLEIN; Christian ;   et al.
2018-12-27
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt Comprising Substrates
App 20180230333 - REICHARDT; Robert ;   et al.
2018-08-16
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt And / Or Cobalt Alloy Comprising Substrates
App 20180016468 - REICHARDT; Robert ;   et al.
2018-01-18
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt And / Or Cobalt Alloy Comprising Substrates
App 20170369741 - REICHARDT; Robert ;   et al.
2017-12-28
Use Of A Chemical Mechanical Polishing (cmp) Composition For Polishing Of Cobalt And / Or Cobalt Alloy Comprising Substrates
App 20170362464 - REICHARDT; Robert ;   et al.
2017-12-21
Method for detecting embedded voids in a semiconductor substrate
Grant 8,735,182 - Leunissen , et al. May 27, 2
2014-05-27
Method for Detecting Embedded Voids in a Semiconductor Substrate
App 20120315712 - Leunissen; Leonardus ;   et al.
2012-12-13
Method for manufacturing attenuated phase-shift masks and devices obtained therefrom
Grant 7,709,160 - Yoshizawa , et al. May 4, 2
2010-05-04
Methods and devices for lithography using electromagnetic radiation with short wavelengths
Grant 7,695,877 - Leunissen , et al. April 13, 2
2010-04-13
Method and Apparatus for Preventing Galvanic Corrosion in Semiconductor Processing
App 20090223832 - Garaud; Sylvain ;   et al.
2009-09-10
Method for manufacturing attenuated phase-shift masks and devices obtained therefrom
App 20070178392 - Yoshizawa; Masaki ;   et al.
2007-08-02
Methods and devices for lithography using electromagnetic radiation with short wavelengths
App 20070154817 - Leunissen; Leonardus ;   et al.
2007-07-05

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