loadpatents
name:-0.015627861022949
name:-0.014879941940308
name:-0.0060999393463135
Leray; Gary Patent Filings

Leray; Gary

Patent Applications and Registrations

Patent applications and USPTO patent grants for Leray; Gary.The latest application filed is for "dual-level pulse tuning".

Company Profile
5.20.24
  • Leray; Gary - Mountain View CA
  • Leray; Gary - Gentilly FR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Dual-level pulse tuning
Grant 11,177,115 - Leray , et al. November 16, 2
2021-11-16
Dual-level Pulse Tuning
App 20200381214 - LERAY; Gary ;   et al.
2020-12-03
Process kit components for use with an extended and independent RF powered cathode substrate for extreme edge tunability
Grant 10,825,708 - Todorow , et al. November 3, 2
2020-11-03
Methods and apparatus for frequency generator and match network communication
Grant 10,553,400 - Leray Fe
2020-02-04
Methods And Apparatus For Frequency Generator And Match Network Communication
App 20190304753 - Leray; Gary
2019-10-03
Methods And Apparatus For Common Excitation Of Frequency Generators
App 20190267213 - Leray; Gary
2019-08-29
Process Kit Components For Use With An Extended And Independent Rf Powered Cathode Substrate For Extreme Edge Tunability
App 20190221463 - TODOROW; VALENTIN ;   et al.
2019-07-18
Enhanced plasma source for a plasma reactor
Grant 10,290,469 - Todorow , et al.
2019-05-14
Electronegative plasma thruster with optimized injection
Grant 10,233,912 - Chabert , et al.
2019-03-19
Dynamic control band for RF plasma current ratio control
Grant 9,839,109 - Leray December 5, 2
2017-12-05
Dynamic Control Band For Rf Plasma Current Ratio Control
App 20170347441 - LERAY; GARY
2017-11-30
Frequency tuning for dual level radio frequency (RF) pulsing
Grant 9,595,423 - Leray , et al. March 14, 2
2017-03-14
Self-bias calculation on a substrate in a process chamber with bias power for single or multiple frequencies
Grant 9,406,540 - Leray , et al. August 2, 2
2016-08-02
Frequency Tuning For Dual Level Radio Frequency (rf) Pulsing
App 20160196958 - LERAY; GARY ;   et al.
2016-07-07
Frequency tuning for dual level radio frequency (RF) pulsing
Grant 9,318,304 - Leray , et al. April 19, 2
2016-04-19
Measurement of plural RF sensor devices in a pulsed RF plasma reactor
Grant 9,190,247 - Leray November 17, 2
2015-11-17
Electron beam plasma source with arrayed plasma sources for uniform plasma generation
Grant 9,129,777 - Dorf , et al. September 8, 2
2015-09-08
Frequency Tuning For Dual Level Radio Frequency (rf) Pulsing
App 20150130354 - LERAY; Gary ;   et al.
2015-05-14
Extended and independent RF powered cathode substrate for extreme edge tunability
Grant 8,988,848 - Todorow , et al. March 24, 2
2015-03-24
Electron beam plasma source with segmented beam dump for uniform plasma generation
Grant 8,951,384 - Dorf , et al. February 10, 2
2015-02-10
Enhanced Plasma Source For A Plasma Reactor
App 20140367046 - TODOROW; Valentin N. ;   et al.
2014-12-18
Electron beam plasma source with profiled magnet shield for uniform plasma generation
Grant 8,894,805 - Bera , et al. November 25, 2
2014-11-25
Measurement Of Plural Rf Sensor Devices In A Pulsed Rf Plasma Reactor
App 20140232374 - Leray; Gary
2014-08-21
Apparatus for forming a magnetic field and methods of use thereof
Grant 8,773,020 - Leray , et al. July 8, 2
2014-07-08
Process Kit Components For Use With An Extended And Independent Rf Powered Cathode Substrate For Extreme Edge Tunability
App 20130154175 - TODOROW; VALENTIN ;   et al.
2013-06-20
Extended And Independent Rf Powered Cathode Substrate For Extreme Edge Tunability
App 20130155568 - TODOROW; VALENTIN ;   et al.
2013-06-20
Self-bias Calculation On A Substrate In A Process Chamber With Bias Power For Single Or Multiple Frequencies
App 20130110435 - LERAY; GARY ;   et al.
2013-05-02
Electron Beam Plasma Source With Segmented Beam Dump For Uniform Plasma Generation
App 20130098882 - Dorf; Leonid ;   et al.
2013-04-25
Electron Beam Plasma Source With Profiled Magnet Shield For Uniform Plasma Generation
App 20130098883 - Bera; Kallol ;   et al.
2013-04-25
Electron Beam Plasma Source With Arrayed Plasma Sources For Uniform Plasma Generation
App 20130098551 - Dorf; Leonid ;   et al.
2013-04-25
Switched Electron Beam Plasma Source Array For Uniform Plasma Production
App 20130098872 - Dorf; Leonid ;   et al.
2013-04-25
E-beam Plasma Source With Profiled E-beam Extraction Grid For Uniform Plasma Generation
App 20130098552 - Dorf; Leonid ;   et al.
2013-04-25
Apparatus For Forming A Magnetic Field And Methods Of Use Thereof
App 20120097870 - LERAY; GARY ;   et al.
2012-04-26
Electronegative Plasma Thruster With Optimized Injection
App 20110232261 - Chabert; Pascal ;   et al.
2011-09-29

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