Lenz; Eric H.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lenz; Eric H..The latest application filed is for "substantially carbon-free molybdenum-containing and tungsten-containing films in semiconductor device manufacturing".

Company Profile

0.49.37

Lenz; Eric H. - Livermore CA
Lenz; Eric H. - Pleasanton CA
Lenz; Eric H - Pleasanton CA
Lenz; Eric H. - San Jose CA
Lenz; Eric H. - Palo Alto CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Substantially Carbon-free Molybdenum-containing And Tungsten-containing Films In Semiconductor Device Manufacturing App 20220298624 - Blakeney; Kyle Jordan ; et al.	2022-09-22
Metal Deposition App 20220290300 - Vellanki; Ravi ; et al.	2022-09-15
Edge Exclusion Control App 20210375591 - Chandrashekar; Anand ; et al.	2021-12-02
Wafer support pedestal with wafer anti-slip and anti-rotation features Grant 10,186,448 - Krotov , et al. Ja	2019-01-22
Vapor delivery method and apparatus for solid and liquid precursors Grant 10,087,523 - Collins , et al. October 2, 2	2018-10-02
Systems and methods for measuring entrained vapor Grant 9,951,423 - Lenz April 24, 2	2018-04-24
Vapor Manifold With Integrated Vapor Concentration Sensor App 20170342562 - Lind; Gary Bridger ; et al.	2017-11-30
Vapor Delivery Method And Apparatus For Solid And Liquid Precursors App 20170335450 - Collins; Joshua ; et al.	2017-11-23
Wafer Support Pedestal With Wafer Anti-slip And Anti-rotation Features App 20170170051 - Krotov; Peter ; et al.	2017-06-15
Corrosion Resistant Gas Distribution Manifold With Thermally Controlled Faceplate App 20160343595 - Lind; Gary Bridger ; et al.	2016-11-24
Airflow management for low particulate count in a process tool Grant 9,321,000 - Lenz April 26, 2	2016-04-26
Systems And Methods For Measuring Entrained Vapor App 20160097127 - Lenz; Eric H.	2016-04-07
Methods for verifying gas flow rates from a gas supply system into a plasma processing chamber Grant 9,234,775 - Larson , et al. January 12, 2	2016-01-12
High throughput cleaner chamber Grant 9,117,870 - Lenz August 25, 2	2015-08-25
Airflow Management For Low Particulate Count In A Process Tool App 20150040757 - Lenz; Eric H.	2015-02-12
Airflow management for low particulate count in a process tool Grant 8,893,642 - Lenz November 25, 2	2014-11-25
Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system Grant 8,703,249 - Tong , et al. April 22, 2	2014-04-22
Gas distribution system having fast gas switching capabilities Grant 8,673,785 - Huang , et al. March 18, 2	2014-03-18
Methods For Verifying Gas Flow Rates From A Gas Supply System Into A Plasma Processing Chamber App 20140033828 - Larson; Dean J. ; et al.	2014-02-06
Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system App 20130342951 - Tong; Jose ; et al.	2013-12-26
Substrate load and unload mechanisms for high throughput Grant 8,562,272 - Lenz October 22, 2	2013-10-22
Fast gas switching plasma processing apparatus Grant 8,343,876 - Sadjadi , et al. January 1, 2	2013-01-01
Reduction of particle contamination produced by moving mechanisms in a process tool Grant 8,282,698 - Lenz October 9, 2	2012-10-09
Plasma confinement by use of preferred RF return path Grant RE43,508 - Lenz July 17, 2	2012-07-17
Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor Grant 8,080,760 - Dhindsa , et al. December 20, 2	2011-12-20
Fast Gas Switching Plasma Processing Apparatus App 20110281435 - Sadjadi; S. M. Reza ; et al.	2011-11-17
Reduction Of Particle Contamination Produced By Moving Mechanisms In A Process Tool App 20110236159 - Lenz; Eric H.	2011-09-29
Airflow Management For Low Particulate Count In A Process Tool App 20110232771 - Lenz; Eric H.	2011-09-29
Substrate Load And Unload Mechanisms For High Throughput App 20110200415 - Lenz; Eric H.	2011-08-18
Apparatus for reducing polymer deposition on a substrate and substrate support Grant 7,867,356 - Tong , et al. January 11, 2	2011-01-11
Magnetic enhancement for mechanical confinement of plasma Grant 7,838,086 - Keil , et al. November 23, 2	2010-11-23
Gas Distribution System Having Fast Gas Switching Capabilities App 20100159707 - Huang; Zhisong ; et al.	2010-06-24
Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor Grant 7,732,728 - Dhindsa , et al. June 8, 2	2010-06-08
Apparatuses For Adjusting Electrode Gap In Capacitively-coupled Rf Plasma Reactor App 20100124822 - Dhindsa; Rajinder ; et al.	2010-05-20
Gas distribution system having fast gas switching capabilities Grant 7,708,859 - Huang , et al. May 4, 2	2010-05-04
Composite electrode for plasma processes Grant RE41,266 - Degner , et al. April 27, 2	2010-04-27
High Throughput Cleaner Chamber App 20090245984 - Lenz; Eric H.	2009-10-01
Lower electrode design for higher uniformity Grant 7,524,397 - Hao , et al. April 28, 2	2009-04-28
Magnetic Enhancement For Mechanical Confinement Of Plasma App 20090041951 - Keil; Douglas L. ; et al.	2009-02-12
Magnetic enhancement for mechanical confinement of plasma Grant 7,455,748 - Keil , et al. November 25, 2	2008-11-25
Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor App 20080171444 - Dhindsa; Rajinder ; et al.	2008-07-17
Apparatus for reducing polymer deposition on a substrate and substrate support App 20080041820 - Tong; Jose ; et al.	2008-02-21
Apparatus for reducing polymer deposition on a substrate and substrate support Grant 7,252,738 - Tong , et al. August 7, 2	2007-08-07
Fast gas switching plasma processing apparatus App 20070066038 - Sadjadi; S.M. Reza ; et al.	2007-03-22
Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system App 20070047169 - Tong; Jose ; et al.	2007-03-01
Methods for verifying gas flow rates from a gas supply system into a plasma processing chamber App 20070021935 - Larson; Dean J. ; et al.	2007-01-25
Chamber configuration for confining a plasma Grant 7,094,315 - Chen , et al. August 22, 2	2006-08-22
Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system Grant 7,093,560 - Tong , et al. August 22, 2	2006-08-22
Gas distribution system having fast gas switching capabilities App 20050241763 - Huang, Zhisong ; et al.	2005-11-03
Chamber configuration for confining a plasma App 20050103442 - Chen, Jian J. ; et al.	2005-05-19
Chamber configuration for confining a plasma Grant 6,872,281 - Chen , et al. March 29, 2	2005-03-29
Linear drive system for use in a plasma processing system Grant 6,863,784 - Hao , et al. March 8, 2	2005-03-08
Magnetic enhancement for mechanical confinement of plasma App 20050006028 - Keil, Douglas L. ; et al.	2005-01-13
Methods for etching dielectric materials Grant 6,838,012 - Lenz January 4, 2	2005-01-04
Substrate support having temperature controlled substrate support surface App 20040187787 - Dawson, Keith E. ; et al.	2004-09-30
Linear drive system for use in a plasma processing system App 20040108301 - Hao, Fangli ; et al.	2004-06-10
Apparatus for reducing polymer deposition on a substrate and substrate support App 20040083975 - Tong, Jose ; et al.	2004-05-06
Methods for etching dielectric materials App 20040084410 - Lenz, Eric H.	2004-05-06
Plasma confinement by use of preferred RF return path Grant 6,716,762 - Lenz April 6, 2	2004-04-06
Linear drive system for use in a plasma processing system Grant 6,669,811 - Hao , et al. December 30, 2	2003-12-30
Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system App 20030198753 - Tong, Jose ; et al.	2003-10-23
Plasma confinement by use of preferred RF return path Grant 6,602,381 - Lenz August 5, 2	2003-08-05
Sealing techniques suitable for different geometries and constrained spaces Grant 6,536,777 - Hao , et al. March 25, 2	2003-03-25
Linear drive system for use in a plasma processing system App 20020100555 - Hao, Fangli ; et al.	2002-08-01
Lower electrode design for higher uniformity App 20020059981 - Hao, Fangi ; et al.	2002-05-23
Perimeter wafer lifting Grant 6,389,677 - Lenz May 21, 2	2002-05-21
Perimeter Wafer Lifting App 20020043750 - Lenz, Eric H.	2002-04-18
Lower electrode design for higher uniformity Grant 6,363,882 - Hao , et al. April 2, 2	2002-04-02
Sealing Techniques Suitable For Different Geometries And Contrained Spaces App 20010045706 - HAO, FANGLI J. ; et al.	2001-11-29
Perimeter wafer lifting Grant 6,305,677 - Lenz October 23, 2	2001-10-23
Power segmented electrode Grant 6,239,403 - Dible , et al. May 29, 2	2001-05-29
Power segmented electrode Grant 6,042,686 - Dible , et al. March 28, 2	2000-03-28
Cam-based arrangement for positioning confinement rings in a plasma processing chamber Grant 6,019,060 - Lenz February 1, 2	2000-02-01
Focus ring arrangement for substantially eliminating unconfined plasma in a plasma processing chamber Grant 5,998,932 - Lenz December 7, 1	1999-12-07
Method and an apparatus for offsetting plasma bias voltage in bi-polar electro-static chucks Grant 5,933,314 - Lambson , et al. August 3, 1	1999-08-03
Thermal control of semiconductor wafer during reactive ion etching Grant 5,609,720 - Lenz , et al. March 11, 1	1997-03-11
Electrode clamping assembly and method for assembly and use thereof Grant 5,569,356 - Lenz , et al. October 29, 1	1996-10-29
Plasma etching apparatus utilizing plasma confinement Grant 5,534,751 - Lenz , et al. July 9, 1	1996-07-09
Topology induced plasma enhancement for etched uniformity improvement Grant 5,472,565 - Mundt , et al. December 5, 1	1995-12-05
Composite electrode for plasma processes Grant 5,074,456 - Degner , et al. December 24, 1	1991-12-24

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