Lenz; Eric

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lenz; Eric.The latest application filed is for "method and apparatus for physical confinement of a liquid meniscus over a semiconductor wafer".

Company Profile

0.38.27

Lenz; Eric - Pleasanton CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method and apparatus for physical confinement of a liquid meniscus over a semiconductor wafer Grant 9,694,453 - Magni , et al. July 4, 2	2017-07-04
Apparatus and method for controlling plasma potential Grant 9,111,724 - Keil , et al. August 18, 2	2015-08-18
Prevention of particle adders when contacting a liquid meniscus over a substrate Grant 8,997,684 - Magni , et al. April 7, 2	2015-04-07
Apparatus including showerhead electrode and heater for plasma processing Grant 8,846,539 - Dhindsa , et al. September 30, 2	2014-09-30
Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing Grant 8,822,345 - Dhindsa , et al. September 2, 2	2014-09-02
Method and apparatus for physical confinement of a liquid meniscus over a semiconductor wafer Grant 8,813,764 - Magni , et al. August 26, 2	2014-08-26
Sealed elastomer bonded Si electrodes and the like for reduced particle contamination in dielectric etch Grant 8,789,493 - Ren , et al. July 29, 2	2014-07-29
Apparatus and method for controlling etch uniformity Grant 8,674,255 - Lenz , et al. March 18, 2	2014-03-18
Method and Apparatus for Physical Confinement of a Liquid Meniscus Over a Semiconductor Wafer App 20140041226 - Magni; Enrico ; et al.	2014-02-13
Method and apparatus for physical confinement of a liquid meniscus over a semiconductor wafer Grant 8,580,045 - Magni , et al. November 12, 2	2013-11-12
Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus Grant 8,534,303 - O'Donnell , et al. September 17, 2	2013-09-17
Reclaim chemistry Grant 8,464,736 - Lenz June 18, 2	2013-06-18
Prevention Of Particle Adders When Contacting A Liquid Meniscus Over A Substrate App 20130084392 - Magni; Enrico ; et al.	2013-04-04
Apparatus Including Gas Distribution Member Supplying Process Gas And Radio Frequency (rf) Power For Plasma Processing App 20130065396 - Dhindsa; Rajinder ; et al.	2013-03-14
Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing Grant 8,317,968 - Dhindsa , et al. November 27, 2	2012-11-27
Apparatus and Method for Reducing Substrate Pattern Collapse During Drying Operations App 20120260517 - Lenz; Eric ; et al.	2012-10-18
Method And Apparatus For Physical Confinement Of A Liquid Meniscus Over A Semiconductor Wafer App 20120240963 - Magni; Enrico ; et al.	2012-09-27
Carrier for Reducing Entrance and/or Exit Marks Left by a Substrate-Processing Meniscus App 20120079698 - O'Donnell; Robert ; et al.	2012-04-05
Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus Grant 8,105,441 - O'Donnell , et al. January 31, 2	2012-01-31
Carrier for Reducing Entrance and/or Exit Marks Left by a Substrate-Processing Meniscus App 20110197928 - O'Donnell; Robert ; et al.	2011-08-18
Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same Grant 8,000,082 - Dhindsa , et al. August 16, 2	2011-08-16
Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus Grant 7,946,303 - O'Donnell , et al. May 24, 2	2011-05-24
Apparatus and Method for Controlling Plasma Potential App 20110024046 - Keil; Douglas ; et al.	2011-02-03
Apparatus and Method for Controlling Plasma Potential App 20110024045 - Keil; Douglas ; et al.	2011-02-03
Method and Apparatus for Physical Confinement of a Liquid Meniscus over a Semiconductor Wafer App 20100300492 - Magni; Enrico ; et al.	2010-12-02
Apparatus Including Showerhead Electrode And Heater For Plasma Processing App 20100151687 - Dhindsa; Rajinder ; et al.	2010-06-17
Apparatus including showerhead electrode and heater for plasma processing Grant 7,712,434 - Dhindsa , et al. May 11, 2	2010-05-11
Electrically enhancing the confinement of plasma Grant 7,632,375 - Kuthi , et al. December 15, 2	2009-12-15
Electrostatic Chuck Assembly With Dielectric Material And/or Cavity Having Varying Thickness, Profile And/or Shape, Method Of Use And Apparatus Incorporating Same App 20090174983 - Dhindsa; Rajinder ; et al.	2009-07-09
Electrically Enhancing The Confinement Of Plasma App 20090165954 - Kuthi; Andras ; et al.	2009-07-02
Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same Grant 7,525,787 - Dhindsa , et al. April 28, 2	2009-04-28
Multiple frequency plasma processor method and apparatus Grant 7,405,521 - Dhindsa , et al. July 29, 2	2008-07-29
RF ground switch for plasma processing system Grant 7,393,432 - Dhindsa , et al. July 1, 2	2008-07-01
Carrier For Reducing Entrance And/or Exit Marks Left By A Substrate-processing Meniscus App 20080081775 - O'Donnell; Robert ; et al.	2008-04-03
Apparatus and Method for Controlling Plasma Potential App 20080006205 - Keil; Douglas ; et al.	2008-01-10
Sealed elastomer bonded Si electrodes and the like for reduced particle contamination in dielectric etch App 20070187038 - Ren; Daxing ; et al.	2007-08-16
Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same App 20070076346 - Dhindsa; Rajinder ; et al.	2007-04-05
RF ground switch for plasma processing system App 20060065369 - Dhindsa; Rai ; et al.	2006-03-30
Deformation reduction at the main chamber App 20060032736 - Lenz; Eric ; et al.	2006-02-16
Plasma processor in plasma confinement region within a vacuum chamber Grant 6,984,288 - Dhindsa , et al. January 10, 2	2006-01-10
Apparatus including showerhead electrode and heater for plasma processing App 20050241765 - Dhindsa, Rajinder ; et al.	2005-11-03
Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing App 20050241766 - Dhindsa, Rajinder ; et al.	2005-11-03
Deformation reduction at the main chamber Grant 6,949,204 - Lenz , et al. September 27, 2	2005-09-27
Multiple frequency plasma etch reactor App 20050039682 - Dhindsa, Raj ; et al.	2005-02-24
Stepped upper electrode for plasma processing uniformity Grant 6,824,627 - Dhindsa , et al. November 30, 2	2004-11-30
Showerhead electrode design for semiconductor processing reactor Grant 6,786,175 - Dhindsa , et al. September 7, 2	2004-09-07
Deformation reduction at the main chamber Grant 6,712,929 - Lenz , et al. March 30, 2	2004-03-30
Dual frequency plasma processor App 20030029567 - Dhindsa, Rajinder ; et al.	2003-02-13
Showerhead electrode design for semiconductor processing reactor App 20030032301 - Dhindsa, Rajinder ; et al.	2003-02-13
Stepped upper electrode for plasma processing uniformity App 20020187647 - Dhindsa, Rajinder ; et al.	2002-12-12
Wafer area pressure control Grant 6,433,484 - Hao , et al. August 13, 2	2002-08-13
Gas distribution apparatus for semiconductor processing Grant 6,432,831 - Dhindsa , et al. August 13, 2	2002-08-13
Stepped upper electrode for plasma processing uniformity Grant 6,391,787 - Dhindsa , et al. May 21, 2	2002-05-21
Gas distribution apparatus for semiconductor processing App 20010027026 - Dhindsa, Rajinder ; et al.	2001-10-04
Gas distribution apparatus for semiconductor processing Grant 6,245,192 - Dhindsa , et al. June 12, 2	2001-06-12

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