Leith; Allen John

Patent Applications and Registrations

Patent applications and USPTO patent grants for Leith; Allen John.The latest application filed is for "reduced defect silicon or silicon germanium deposition in micro-features".

Company Profile

0.7.9

Leith; Allen John - Mountain Top PA
Leith; Allen John - Austin TX

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Reduced defect silicon or silicon germanium deposition in micro-features Grant 8,263,474 - Dip , et al. September 11, 2	2012-09-11
Method and system for removing an oxide from a substrate Grant 7,524,769 - Dip , et al. April 28, 2	2009-04-28
Sequential oxide removal using fluorine and hydrogen Grant 7,501,349 - Dip , et al. March 10, 2	2009-03-10
Deposition of silicon-containing films from hexachlorodisilane Grant 7,468,311 - Dip , et al. December 23, 2	2008-12-23
Low temperature formation of patterned epitaxial Si containing films Grant 7,405,140 - Dip , et al. July 29, 2	2008-07-29
Reduced Defect Silicon Or Silicon Germanium Deposition In Micro-features App 20080169534 - Dip; Anthony ; et al.	2008-07-17
Sequential deposition process for forming Si-containing films Grant 7,358,194 - Dip , et al. April 15, 2	2008-04-15
Sequential oxide removal using fluorine and hydrogen App 20070238302 - Dip; Anthony ; et al.	2007-10-11
Micro-feature fill process and apparatus using hexachlorodisilane or other chlorine-containing silicon precursor Grant 7,205,187 - Leith , et al. April 17, 2	2007-04-17
Interrupted deposition process for selective deposition of Si-containing films App 20070048956 - Dip; Anthony ; et al.	2007-03-01
Low-temperature oxide removal using fluorine App 20070039924 - Dip; Anthony ; et al.	2007-02-22
Low temperature formation of patterned epitaxial Si containing films App 20070042569 - Dip; Anthony ; et al.	2007-02-22
Sequential deposition process for forming Si-containing films App 20070042570 - Dip; Anthony ; et al.	2007-02-22
Method and system for removing an oxide from a substrate App 20060228900 - Dip; Anthony ; et al.	2006-10-12
Micro-feature fill process and apparatus using hexachlorodisilane or other chlorine-containing silicon precursor App 20060160288 - Leith; Allen John ; et al.	2006-07-20
Deposition of silicon-containing films from hexachlorodisilane App 20050066892 - Dip, Anthony ; et al.	2005-03-31

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