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name:-0.0088250637054443
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Leica Microsystems Lithography GmbH Patent Filings

Leica Microsystems Lithography GmbH

Patent Applications and Registrations

Patent applications and USPTO patent grants for Leica Microsystems Lithography GmbH.The latest application filed is for "electrostatic deflection system for corpuscular radiation".

Company Profile
0.8.6
  • Leica Microsystems Lithography GmbH - Jena DE
  • Leica Microsystems Lithography GmbH - DE DE
  • Leica Microsystems Lithography GmbH -
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Electrostatic deflection system for corpuscular radiation
Grant 7,491,946 - Risse , et al. February 17, 2
2009-02-17
Device and method for imaging a multiple particle beam on a substrate
Grant 7,332,730 - Heinitz , et al. February 19, 2
2008-02-19
Process for controlling the proximity effect correction
Grant 7,241,542 - Hudek , et al. July 10, 2
2007-07-10
Electrostatic deflection system for corpuscular radiation
App 20060192133 - Risse; Stefan ;   et al.
2006-08-31
Method for exposing a substrate with a beam
App 20060121396 - Gauglitz; Heike ;   et al.
2006-06-08
Device and method for imaging a multiple particle beam on a substrate
App 20060102853 - Heinitz; Joachim ;   et al.
2006-05-18
Method for reducing the fogging effect
App 20050287451 - Hudek, Peter ;   et al.
2005-12-29
Process for controlling the proximity effect correction
App 20050287450 - Hudek, Peter ;   et al.
2005-12-29
Method and apparatus for forming a curved polyline on a radiation-sensitive resist
Grant 6,774,375 - Plontke , et al. August 10, 2
2004-08-10
Six-axis positioning system having a zero-magnetic-field space
Grant 6,639,225 - Kirschstein , et al. October 28, 2
2003-10-28
Method for exposing a layout comprising multiple layers on a wafer
Grant 6,635,395 - Hahmann , et al. October 21, 2
2003-10-21
Method for directing an electron beam onto a target position on a substrate surface
Grant 6,635,884 - Plontke , et al. October 21, 2
2003-10-21
Method and device for exposing a substrate to light
Grant 6,600,162 - Hahmann , et al. July 29, 2
2003-07-29
Method for exposing a layout comprising multiple layers on a wafer
App 20020039828 - Hahmann, Peter ;   et al.
2002-04-04

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