loadpatents
Patent applications and USPTO patent grants for Lei; Xinya.The latest application filed is for "reduced lens heating methods, apparatus, and systems".
Patent | Date |
---|---|
Reduced lens heating methods, apparatus, and systems Grant 8,916,314 - Wang , et al. December 23, 2 | 2014-12-23 |
Optical compensation devices, systems, and methods Grant 8,323,859 - Lei , et al. December 4, 2 | 2012-12-04 |
Reduced Lens Heating Methods, Apparatus, And Systems App 20120202143 - Wang; Fei ;   et al. | 2012-08-09 |
Reduced lens heating methods, apparatus, and systems Grant 8,173,333 - Wang , et al. May 8, 2 | 2012-05-08 |
Optical Compensation Devices, Systems, And Methods App 20120064439 - Lei; Xinya ;   et al. | 2012-03-15 |
Optical compensation devices, systems, and methods Grant 8,062,814 - Lei , et al. November 22, 2 | 2011-11-22 |
Reduced Lens Heating Methods, Apparatus, And Systems App 20110217632 - Wang; Fei ;   et al. | 2011-09-08 |
Method of forming substrate for use in imager devices Grant 7,985,658 - Lei , et al. July 26, 2 | 2011-07-26 |
Reduced lens heating methods, apparatus, and systems Grant 7,947,412 - Wang , et al. May 24, 2 | 2011-05-24 |
Focus sensitive lithographic apparatus, systems, and methods Grant 7,864,294 - Wang , et al. January 4, 2 | 2011-01-04 |
Optical Compensation Devices, Systems, And Methods App 20100323283 - Lei; Xinya ;   et al. | 2010-12-23 |
Method Of Forming Substrate For Use In Imager Devices App 20100311201 - Lei; Xinya ;   et al. | 2010-12-09 |
Optical compensation devices, systems, and methods Grant 7,790,338 - Lei , et al. September 7, 2 | 2010-09-07 |
Focus Sensitive Lithographic Apparatus, Systems, And Methods App 20080297752 - Wang; Fei ;   et al. | 2008-12-04 |
Optical Compensation Devices, Systems, And Methods App 20080284996 - Lei; Xinya ;   et al. | 2008-11-20 |
Reduced lens heating methods, apparatus, and systems App 20080239272 - Wang; Fei ;   et al. | 2008-10-02 |
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