| Patent | Date |
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Substrate processing system, substrate conveying device and conveying method
Grant 11,024,762 - Lei June 1, 2 | 2021-06-01 |
Apparatus and method of selective turning over a row of substrates in an array of substrates in a processing system
Grant 10,854,497 - Lei December 1, 2 | 2020-12-01 |
Method And Device For Matching Impedance Of Pulse Radio Frequency Plasma
App 20200185196 - YE; Rubin ; et al. | 2020-06-11 |
Substrate Processing System, Substrate Conveying Device And Conveying Method
App 20180287007 - Lei; Lawrence Chung-Lai | 2018-10-04 |
Apparatus And Method Of Turning Over A Substrate In A Substrate Processing System
App 20180282864 - Lei; Lawrence Chung-Lai | 2018-10-04 |
Atomic layer deposition apparatus
Grant 8,626,330 - Chin , et al. January 7, 2 | 2014-01-07 |
Methods and systems of transferring, docking and processing substrates
Grant 8,367,565 - Lei , et al. February 5, 2 | 2013-02-05 |
Methods and systems of transferring, docking and processing substrates
Grant 8,268,734 - Lei , et al. September 18, 2 | 2012-09-18 |
Methods and systems of transferring a substrate to minimize heat loss
Grant 8,110,511 - Lei , et al. February 7, 2 | 2012-02-07 |
Atomic Layer Deposition Apparatus
App 20120006265 - CHIN; BARRY L. ; et al. | 2012-01-12 |
Atomic layer deposition apparatus
Grant 8,027,746 - Chin , et al. September 27, 2 | 2011-09-27 |
Methods and Systems of Transferring, Docking and Processing Substrates
App 20110217469 - Lei; Lawrence Chung-Lai ; et al. | 2011-09-08 |
Methods and Systems of Transferring, Docking and Processing Substrates
App 20110151119 - Lei; Lawrence Chung-Lai ; et al. | 2011-06-23 |
Atomic Layer Deposition Apparatus
App 20110111603 - CHIN; BARRY L. ; et al. | 2011-05-12 |
Methods and systems of transferring, docking and processing substrates
Grant 7,897,525 - Lei , et al. March 1, 2 | 2011-03-01 |
Atomic layer deposition apparatus
Grant 7,860,597 - Chin , et al. December 28, 2 | 2010-12-28 |
Method for forming tungsten materials during vapor deposition processes
Grant 7,846,840 - Kori , et al. December 7, 2 | 2010-12-07 |
Methods and systems of transferring a substrate to minimize heat loss
App 20100173439 - Lei; Lawrence Chung-Lai ; et al. | 2010-07-08 |
Integrated facility and process chamber for substrate processing
App 20100162954 - Lei; Lawrence Chung-Lai ; et al. | 2010-07-01 |
Systems and methods for substrate processing
App 20100162955 - Lei; Lawrence Chung-Lai ; et al. | 2010-07-01 |
Methods and systems of transferring, docking and processing substrates
App 20100167503 - Lei; Lawrence Chung-Lai ; et al. | 2010-07-01 |
Gas baffle and distributor for semiconductor processing chamber
Grant 7,722,719 - Lei , et al. May 25, 2 | 2010-05-25 |
Substrate support having brazed plates and resistance heater
Grant 7,705,275 - Umotoy , et al. April 27, 2 | 2010-04-27 |
Atomic Layer Deposition Apparatus
App 20100099270 - Chin; Barry L. ; et al. | 2010-04-22 |
Method For Forming Tungsten Materials During Vapor Deposition Processes
App 20100093170 - Kori; Moris ; et al. | 2010-04-15 |
Method for forming tungsten materials during vapor deposition processes
Grant 7,674,715 - Kori , et al. March 9, 2 | 2010-03-09 |
Atomic layer deposition apparatus
Grant 7,660,644 - Chin , et al. February 9, 2 | 2010-02-09 |
Method For Forming Tungsten Materials During Vapor Deposition Processes
App 20090156004 - KORI; MORIS ; et al. | 2009-06-18 |
Uniformly Compressed Process Chamber Gate Seal for Semiconductor Processing Chamber
App 20090113684 - Bang; Won B. ; et al. | 2009-05-07 |
Method for forming tungsten materials during vapor deposition processes
Grant 7,465,666 - Kori , et al. December 16, 2 | 2008-12-16 |
Anti-clogging Nozzle For Semiconductor Processing
App 20080044568 - Lei; Lawrence Chung-Lai ; et al. | 2008-02-21 |
Method For Forming Tungsten Materials During Vapor Deposition Processes
App 20070254481 - KORI; MORIS ; et al. | 2007-11-01 |
Method for forming tungsten materials during vapor deposition processes
Grant 7,235,486 - Kori , et al. June 26, 2 | 2007-06-26 |
Substrate support having brazed plates and resistance heater
App 20070040265 - Umotoy; Salvador P. ; et al. | 2007-02-22 |
Method For Forming Tungsten Materials During Vapor Deposition Processes
App 20060292874 - Kori; Moris ; et al. | 2006-12-28 |
Atomic Layer Deposition Apparatus
App 20060223286 - Chin; Barry L. ; et al. | 2006-10-05 |
Method and system for controlling the presence of fluorine in refractory metal layers
Grant 7,115,494 - Sinha , et al. October 3, 2 | 2006-10-03 |
Gas baffle and distributor for semiconductor processing chamber
App 20060196603 - Lei; Lawrence Chung-Lai ; et al. | 2006-09-07 |
Atomic layer deposition apparatus
Grant 7,085,616 - Chin , et al. August 1, 2 | 2006-08-01 |
Method and system for controlling the presence of fluorine in refractory metal layers
App 20060128132 - Sinha; Ashok ; et al. | 2006-06-15 |
Method and system for controlling the presence of fluorine in refractory metal layers
Grant 7,033,922 - Kori , et al. April 25, 2 | 2006-04-25 |
Anti-clogging nozzle for semiconductor processing
App 20060048707 - Lei; Lawrence Chung-Lai ; et al. | 2006-03-09 |
Dual gas faceplate for a showerhead in a semiconductor wafer processing system
App 20060021703 - Umotoy; Salvador P. ; et al. | 2006-02-02 |
Uniformly compressed process chamber gate seal for semiconductor processing chamber
App 20050268857 - Bang, Won B. ; et al. | 2005-12-08 |
Anti-clogging nozzle for semiconductor processing
App 20050218115 - Lei, Lawrence Chung-Lai ; et al. | 2005-10-06 |
Plating system with integrated substrate inspection
App 20050083048 - Lei, Lawrence Chung-Lai ; et al. | 2005-04-21 |
Method and system for controlling the presence of fluorine in refractory metal layers
App 20050059241 - Kori, Moris ; et al. | 2005-03-17 |
Method and system for controlling the presence of fluorine in refractory metal layers
Grant 6,855,368 - Kori , et al. February 15, 2 | 2005-02-15 |
Control of metal resistance in semiconductor products via integrated metrology
App 20050014299 - Yang, Susie Xiuru ; et al. | 2005-01-20 |
Showerhead assembly for a processing chamber
Grant 6,827,815 - Hytros , et al. December 7, 2 | 2004-12-07 |
Apparatus having platforms positioned for precise centering of semiconductor wafers during processing
Grant 6,793,766 - Schieve , et al. September 21, 2 | 2004-09-21 |
Variable flow deposition apparatus and method in semiconductor substrate processing
Grant 6,777,352 - Tepman , et al. August 17, 2 | 2004-08-17 |
Resonant chamber applicator for remote plasma source
Grant 6,603,269 - Vo , et al. August 5, 2 | 2003-08-05 |
Apparatus and method for low pressure CVD deposition of tungsten and tungsten nitride
App 20030140857 - Umotoy, Salvador P. ; et al. | 2003-07-31 |
Showerhead assembly for a processing chamber
App 20030132319 - Hytros, Mark M. ; et al. | 2003-07-17 |
Dual-gas delivery system for chemical vapor deposition processes
App 20030124842 - Hytros, Mark M. ; et al. | 2003-07-03 |
Chamber hardware design for titanium nitride atomic layer deposition
App 20030116087 - Nguyen, Anh N. ; et al. | 2003-06-26 |
Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques
Grant 6,551,929 - Kori , et al. April 22, 2 | 2003-04-22 |
Apparatus for handling liquid precursor material for semiconductor processing
App 20030049933 - Lei, Lawrence Chung-Lai ; et al. | 2003-03-13 |
Atomic layer deposition apparatus
App 20030023338 - Chin, Barry L. ; et al. | 2003-01-30 |
Method and apparatus for tuning a plurality of processing chambers
App 20030003696 - Gelatos, Avgerinos ; et al. | 2003-01-02 |
Ceramic substrate support
Grant 6,494,955 - Lei , et al. December 17, 2 | 2002-12-17 |
Method and apparatus for accurate placement of semiconductor wafers onto respective platforms within a single reaction chamber
Grant 6,430,468 - Tepman , et al. August 6, 2 | 2002-08-06 |
Apparatus having platforms positioned for precise centering of semiconductor wafers during processing
App 20020084033 - Schieve, Eric W. ; et al. | 2002-07-04 |
High temperature chemical vapor deposition chamber
Grant 6,364,954 - Umotoy , et al. April 2, 2 | 2002-04-02 |
High Temperature Chemical Vapor Deposition Chamber
App 20010054381 - UMOTOY, SALVADOR P ; et al. | 2001-12-27 |
Gate valve for an integrated temperature controlled exhaust and cold trap assembly
App 20010050053 - Umotoy, Salvador P. ; et al. | 2001-12-13 |
Dispersion plate for flowing vaporizes compounds used in chemical vapor deposition of films onto semiconductor surfaces
Grant 6,302,965 - Umotoy , et al. October 16, 2 | 2001-10-16 |
Chamber design for modular manufacturing and flexible onsite servicing
Grant 6,277,199 - Lei , et al. August 21, 2 | 2001-08-21 |
Integrated temperature controlled exhaust and cold trap assembly
App 20010004879 - Umotoy, Salvador P. ; et al. | 2001-06-28 |
Integrated temperature controlled exhaust and cold trap assembly
Grant 6,206,971 - Umotoy , et al. March 27, 2 | 2001-03-27 |
Wafer pedestal with a purge ring
Grant 6,159,299 - Koai , et al. December 12, 2 | 2000-12-12 |
Chemical vapor deposition chamber
Grant 6,103,014 - Lei , et al. August 15, 2 | 2000-08-15 |
Processing chamber and method for confining plasma
Grant 6,063,441 - Koai , et al. May 16, 2 | 2000-05-16 |
Chemical vapor deposition chamber
Grant 5,935,338 - Lei , et al. August 10, 1 | 1999-08-10 |
Heater with shadow ring and purge above wafer surface
Grant 5,888,304 - Umotoy , et al. March 30, 1 | 1999-03-30 |
Chemical vapor deposition chamber
Grant 5,882,419 - Sinha , et al. March 16, 1 | 1999-03-16 |
Chemical vapor deposition of a thin film onto a substrate
Grant 5,856,240 - Sinha , et al. January 5, 1 | 1999-01-05 |
Plasma-inert cover and plasma cleaning process and apparatus employing same
Grant 5,810,936 - Leung , et al. September 22, 1 | 1998-09-22 |
Chemical vapor deposition chamber with substrate edge protection
Grant 5,800,686 - Littau , et al. September 1, 1 | 1998-09-01 |
Removable ring for controlling edge deposition in substrate processing apparatus
Grant 5,766,365 - Umotoy , et al. June 16, 1 | 1998-06-16 |
Plasma-inert cover and plasma cleaning process
Grant 5,705,080 - Leung , et al. January 6, 1 | 1998-01-06 |
Chemical vapor deposition chamber
Grant 5,695,568 - Sinha , et al. December 9, 1 | 1997-12-09 |
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