Lei; Lawrence Chang-Lai
Patent Applications and Registrations
Patent applications and USPTO patent grants for Lei; Lawrence Chang-Lai.The latest application filed is for "processes used in an inductively coupled plasma reactor".
- Lei; Lawrence Chang-Lai - Cupertino CA
| Patent | Date |
|---|---|
| Plasma reactor using inductive RF coupling, and processes Grant 6,545,420 - Collins , et al. April 8, 2 | 2003-04-08 |
| Plasma reactor using inductive RF coupling, and processes Grant 6,518,195 - Collins , et al. February 11, 2 | 2003-02-11 |
| Magnetic confinement in a plasma reactor having an RF bias electrode Grant 6,488,807 - Collins , et al. December 3, 2 | 2002-12-03 |
| Processes Used In An Inductively Coupled Plasma Reactor App 20020004309 - COLLINS, KENNETH S. ; et al. | 2002-01-10 |
| Plasma etch processes Grant 6,251,792 - Collins , et al. June 26, 2 | 2001-06-26 |
| Process used in an RF coupled plasma reactor Grant 6,068,784 - Collins , et al. May 30, 2 | 2000-05-30 |
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