Leewis; Christian Marinus

Patent Applications and Registrations

Patent applications and USPTO patent grants for Leewis; Christian Marinus.The latest application filed is for "metrology robustness based on through-wavelength similarity".

Company Profile

3.15.12

Leewis; Christian Marinus - Eindhoven NL
Leewis; Christian Marinus - Maastricht NL

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Metrology robustness based on through-wavelength similarity Grant 10,871,716 - Garcia Granda , et al. December 22, 2	2020-12-22
Metrology Robustness Based On Through-wavelength Similarity App 20190377264 - GARCIA GRANDA; Miguel ; et al.	2019-12-12
Metrology robustness based on through-wavelength similarity Grant 10,394,132 - Garcia Granda , et al. A	2019-08-27
Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method Grant 9,939,735 - Hinnen , et al. April 10, 2	2018-04-10
Method of Determining Focus, Inspection Apparatus, Patterning Device, Substrate and Device Manufacturing Method App 20170153554 - HINNEN; Paul Christiaan ; et al.	2017-06-01
Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method Grant 9,594,299 - Hinnen , et al. March 14, 2	2017-03-14
Lithographic focus and dose measurement using a 2-D target Grant 9,436,099 - Leewis , et al. September 6, 2	2016-09-06
Method of Determining Focus, Inspection Apparatus, Patterning Device, Substrate and Device Manufacturing Method App 20150338749 - HINNEN; Paul Christiaan ; et al.	2015-11-26
Method and apparatus for overlay measurement Grant 8,982,328 - Megens , et al. March 17, 2	2015-03-17
Lithographic focus and dose measurement using a 2-D target Grant 8,891,061 - Leewis , et al. November 18, 2	2014-11-18
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrate Grant 8,848,195 - Leewis , et al. September 30, 2	2014-09-30
Lithographic Focus and Dose Measurement Using A 2-D Target App 20140247434 - LEEWIS; Christian Marinus ; et al.	2014-09-04
Method of Measuring a Characteristic App 20140199634 - QUAEDACKERS; Johannes Anna ; et al.	2014-07-17
Method of measuring a characteristic Grant 8,685,626 - Quaedackers , et al. April 1, 2	2014-04-01
Method of determining a characteristic Grant 8,502,955 - Megens , et al. August 6, 2	2013-08-06
Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method for Determining a Property of a Substrate App 20120033223 - Leewis; Christian Marinus ; et al.	2012-02-09
Method and System for Determining a Lithographic Process Parameter App 20110295555 - Meessen; Hieronymus Johannus Christiaan ; et al.	2011-12-01
Lithographic Focus and Dose Measurement Using A 2-D Target App 20110249244 - Leewis; Christian Marinus ; et al.	2011-10-13
Method and Apparatus for Overlay Measurement App 20110141450 - MEGENS; Henricus Johannes Lambertus ; et al.	2011-06-16
Producing a Marker Pattern and Measurement of an Exposure-Related Property of an Exposure Apparatus App 20100328636 - Quaedackers; Johannes Anna ; et al.	2010-12-30
Method of Measuring a Characteristic App 20100227280 - Quaedackers; Johannes Anna ; et al.	2010-09-09
Method of Determining a Characteristic App 20100165312 - Megens; Henricus Johannes Lambertus ; et al.	2010-07-01

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