Leeser; Karl Frederick

Patent Applications and Registrations

Patent applications and USPTO patent grants for Leeser; Karl Frederick.The latest application filed is for "processing tool capable for forming carbon layers on substrates".

Company Profile

12.6.22

Leeser; Karl Frederick - West Linn OR
Leeser; Karl Frederick - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Substrate processing system with tandem source activation for CVD Grant 11,434,567 - LaVoie , et al. September 6, 2	2022-09-06
Processing Tool Capable For Forming Carbon Layers On Substrates App 20220246428 - LEESER; Karl Frederick ; et al.	2022-08-04
Modular-component System For Gas Delivery App 20220199431 - Stumpf; John Folden ; et al.	2022-06-23
Closed-loop Multiple-output Radio Frequency (rf) Matching App 20220190854 - Juco; Eller Y. ; et al.	2022-06-16
Lamellar Ceramic Structure App 20220181126 - Hollingsworth; Joel Philip ; et al.	2022-06-09
Substrate Processing Tool Capable Of Modulating One Or More Plasma Temporally And/or Spatially App 20220119954 - CHEN; Lee ; et al.	2022-04-21
Differential-pressure-based Flow Meters App 20220107212 - Stumpf; John Folden ; et al.	2022-04-07
Rf Tuning Systems Including Tuning Circuits Having Impedances For Setting And Adjusting Parameters Of Electrodes In Electrostatic Chucks App 20220044909 - French; David ; et al.	2022-02-10
Anomalous Plasma Event Detection And Mitigation In Semiconductor Processing App 20220037135 - Kapoor; Sunil ; et al.	2022-02-03
Suppression Of Parasitic Deposition In A Substrate Processing System By Suppressing Precursor Flow And Plasma Outside Of Substrate Region App 20210381106 - Xia; Chunguang ; et al.	2021-12-09
RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks Grant 11,183,368 - French , et al. November 23, 2	2021-11-23
In Situ Protective Coating Of Chamber Components For Semiconductor Processing App 20210340670 - Singhal; Akhil ; et al.	2021-11-04
Mechanical Indexer For Multi-station Process Module App 20210320029 - NORDIN; Michael ; et al.	2021-10-14
Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region Grant 11,111,581 - Xia , et al. September 7, 2	2021-09-07
Radio Frequency (rf) Signal Source Supplying Rf Plasma Generator And Remote Plasma Generator App 20210257188 - JUCO; Eller Y. ; et al.	2021-08-19
Showerhead Faceplate Having Flow Apertures Configured for Hollow Cathode Discharge Suppression App 20210210310 - Selep; Michael John ; et al.	2021-07-08
Modular Recipe Controlled Calibration (mrcc) Apparatus Used To Balance Plasma In Multiple Station System App 20210202208 - Juco; Eller Y. ; et al.	2021-07-01
Modular recipe controlled calibration (MRCC) apparatus used to balance plasma in multiple station system Grant 10,991,550 - Juco , et al. April 27, 2	2021-04-27
Rotational Indexer With Additional Rotational Axes App 20210118715 - Blank; Richard M. ; et al.	2021-04-22
Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression Grant 10,984,987 - Selep , et al. April 20, 2	2021-04-20
Substrate Processing System With Tandem Source Activation For Cvd App 20200199747 - LAVOIE; Adrien ; et al.	2020-06-25
Showerhead Faceplate Having Flow Apertures Configured for Hollow Cathode Discharge Suppression App 20200118795 - Selep; Michael John ; et al.	2020-04-16
Modular Recipe Controlled Calibration (MRCC) Apparatus Used to Balance Plasma in Multiple Station System App 20200075289 - Juco; Eller Y. ; et al.	2020-03-05
Chemical Vapor Deposition Tool For Preventing Or Suppressing Arcing App 20200048770 - SAKIYAMA; Yukinori ; et al.	2020-02-13
Rf Tuning Systems Including Tuning Circuits Having Impedances For Setting And Adjusting Parameters Of Electrodes In Electrostati App 20200043703 - French; David ; et al.	2020-02-06
Suppression Of Parasitic Deposition In A Substrate Processing System By Suppressing Precursor Flow And Plasma Outside Of Substra App 20190271081 - XIA; Chunguang ; et al.	2019-09-05
Mechanical Suppression Of Parasitic Plasma In Substrate Processing Chamber App 20190172684 - KEIL; Douglas ; et al.	2019-06-06
Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region Grant 10,287,683 - Xia , et al.	2019-05-14

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