loadpatents
name:-0.065642118453979
name:-0.061493873596191
name:-0.018463850021362
Leeser; Karl Patent Filings

Leeser; Karl

Patent Applications and Registrations

Patent applications and USPTO patent grants for Leeser; Karl.The latest application filed is for "mutually induced filters".

Company Profile
17.51.56
  • Leeser; Karl - West Linn OR
  • Leeser; Karl - Tualatin OR
  • Leeser; Karl - Lake Oswego OR US
  • Leeser; Karl - San Jose CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Planar substrate edge contact with open volume equalization pathways and side containment
Grant 11,443,975 - Breiling , et al. September 13, 2
2022-09-13
Mutually Induced Filters
App 20220149801 - Kapoor; Sunil ;   et al.
2022-05-12
Apparatuses And Methods For Avoiding Electrical Breakdown From Rf Terminal To Adjacent Non-rf Terminal
App 20220139670 - Kim; Hyungjoon ;   et al.
2022-05-05
Apparatuses and methods for avoiding electrical breakdown from RF terminal to adjacent non-RF terminal
Grant 11,264,207 - Kim , et al. March 1, 2
2022-03-01
Mutually induced filters
Grant 11,258,420 - Kapoor , et al. February 22, 2
2022-02-22
Multiple-Output Radiofrequency Matching Module and Associated Methods
App 20210313948 - Leeser; Karl ;   et al.
2021-10-07
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
Grant 11,127,567 - Kang , et al. September 21, 2
2021-09-21
Multiple-output radiofrequency matching module and associated methods
Grant 11,038,483 - Leeser , et al. June 15, 2
2021-06-15
Optimized low energy / high productivity deposition system
Grant 11,024,531 - Nordin , et al. June 1, 2
2021-06-01
Carrier Plate For Use In Plasma Processing Systems
App 20210090936 - Leeser; Karl
2021-03-25
Carrier plate for use in plasma processing systems
Grant 10,923,385 - Leeser February 16, 2
2021-02-16
Substrate support with increasing areal density and corresponding method of fabricating
Grant 10,832,936 - Woytowitz , et al. November 10, 2
2020-11-10
Systems And Methods For Suppressing Parasitic Plasma And Reducing Within-wafer Non-uniformity
App 20200335304 - Kang; Hu ;   et al.
2020-10-22
Deposition apparatus including an isothermal processing zone
Grant 10,808,317 - Chandrasekharan , et al. October 20, 2
2020-10-20
Apparatuses And Methods For Avoiding Electrical Breakdown From Rf Terminal To Adjacent Non-rf Terminal
App 20200251307 - Kind Code
2020-08-06
Mutually Induced Filters
App 20200252040 - Kind Code
2020-08-06
Multiple-Output Radiofrequency Matching Module and Associated Methods
App 20200244244 - Leeser; Karl ;   et al.
2020-07-30
Planar Substrate Edge Contact With Open Volume Equalization Pathways And Side Containment
App 20200227304 - Breiling; Patrick ;   et al.
2020-07-16
Integrated Showerhead With Thermal Control For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remote Pla
App 20200219757 - BREILING; Patrick ;   et al.
2020-07-09
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
Grant 10,665,429 - Kang , et al.
2020-05-26
Multiple-output radiofrequency matching module and associated methods
Grant 10,666,218 - Leeser , et al.
2020-05-26
Apparatuses and methods for avoiding electrical breakdown from RF terminal to adjacent non-RF terminal
Grant 10,636,624 - Kim , et al.
2020-04-28
Mutually induced filters
Grant 10,637,427 - Kapoor , et al.
2020-04-28
Planar substrate edge contact with open volume equalization pathways and side containment
Grant 10,622,243 - Breiling , et al.
2020-04-14
Tandem source activation for CVD of films
Grant 10,577,688 - LaVoie , et al.
2020-03-03
Apparatuses And Methods For Avoiding Electrical Breakdown From Rf Terminal To Adjacent Non-rf Terminal
App 20200027700 - Kim; Hyungjoon ;   et al.
2020-01-23
Flow through line charge volume
Grant 10,515,783 - Leeser Dec
2019-12-24
Apparatuses and methods for avoiding electrical breakdown from RF terminal to adjacent non-RF terminal
Grant 10,373,805 - Kim , et al.
2019-08-06
Common terminal heater for ceramic pedestals used in semiconductor fabrication
Grant 10,345,802 - Leeser July 9, 2
2019-07-09
Line charge volume with integrated pressure measurement
Grant 10,312,119 - Leeser
2019-06-04
Deposition apparatus including edge plenum showerhead assembly
Grant 10,253,412 - Thomas , et al.
2019-04-09
Mechanical suppression of parasitic plasma in substrate processing chamber
Grant 10,224,182 - Keil , et al.
2019-03-05
Ammonia radical generator
Grant 10,173,193 - Sabri , et al. J
2019-01-08
Radical generator and method for generating ammonia radicals
Grant 10,143,993 - Leeser De
2018-12-04
Mutually Induced Filters
App 20180331669 - Kapoor; Sunil ;   et al.
2018-11-15
Apparatuses And Methods For Avoiding Electrical Breakdown From Rf Terminal To Adjacent Non-rf Terminal
App 20180323037 - Kim; Hyungjoon ;   et al.
2018-11-08
Multiple-Output Radiofrequency Matching Module and Associated Methods
App 20180309424 - Leeser; Karl ;   et al.
2018-10-25
Mutually induced filters
Grant 10,044,338 - Kapoor , et al. August 7, 2
2018-08-07
Apparatuses and methods for avoiding electrical breakdown from RF terminal to adjacent non-RF terminal
Grant 10,043,636 - Kim , et al. August 7, 2
2018-08-07
Optimized Low Energy / High Productivity Deposition System
App 20180211864 - Nordin; Michael ;   et al.
2018-07-26
Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instability
Grant 9,997,422 - Karim , et al. June 12, 2
2018-06-12
Systems and methods for vapor delivery in a substrate processing system
Grant 9,970,108 - Qian , et al. May 15, 2
2018-05-15
Planar Substrate Edge Contact With Open Volume Equalization Pathways And Side Containment
App 20180122685 - Breiling; Patrick ;   et al.
2018-05-03
Carrier Plate for Use in Plasma Processing Systems
App 20180122633 - Leeser; Karl
2018-05-03
Multiple-output radiofrequency matching module and associated methods
Grant 9,954,508 - Leeser , et al. April 24, 2
2018-04-24
Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication
Grant 9,941,113 - Keil , et al. April 10, 2
2018-04-10
Valve manifold deadleg elimination via reentrant flow path
Grant 9,920,844 - Leeser , et al. March 20, 2
2018-03-20
Compact substrate processing tool with multi-station processing and pre-processing and/or post-processing stations
Grant 9,916,995 - Leeser March 13, 2
2018-03-13
Systems And Methods For Suppressing Parasitic Plasma And Reducing Within-wafer Non-uniformity
App 20180068833 - Kang; Hu ;   et al.
2018-03-08
Substrate Support With Increasing Areal Density And Corresponding Method Of Fabricating
App 20180033672 - Woytowitz; Peter ;   et al.
2018-02-01
Tandem Source Activation For Cvd Of Films
App 20170327947 - LaVoie; Adrien ;   et al.
2017-11-16
Systems and Methods for Using Electrical Asymmetry Effect to Control Plasma Process Space in Semiconductor Fabrication
App 20170330744 - Keil; Douglas ;   et al.
2017-11-16
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
Grant 9,793,096 - Kang , et al. October 17, 2
2017-10-17
Plasma Suppression Behind A Showerhead Through The Use Of Increased Pressure
App 20170260627 - Breiling; Patrick Girard ;   et al.
2017-09-14
Plasma suppression behind a showerhead through the use of increased pressure
Grant 9,758,868 - Breiling , et al. September 12, 2
2017-09-12
Flow Through Line Charge Volume
App 20170243722 - Leeser; Karl
2017-08-24
Tandem source activation for CVD of films
Grant 9,738,972 - LaVoie , et al. August 22, 2
2017-08-22
Common Terminal Heater for Ceramic Pedestals Used in Semiconductor Fabrication
App 20170236733 - Leeser; Karl
2017-08-17
Line Charge Volume With Integrated Pressure Measurement
App 20170236735 - Leeser; Karl
2017-08-17
Apparatuses And Methods For Avoiding Electrical Breakdown From RF Terminal To Adjacent Non-RF Terminal
App 20170169995 - Kim; Hyungjoon ;   et al.
2017-06-15
Systems and Methods for Frequency Modulation of Radiofrequency Power Supply for Controlling Plasma Instability
App 20170141002 - Karim; Ishtak ;   et al.
2017-05-18
Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication
Grant 9,644,271 - Keil , et al. May 9, 2
2017-05-09
Multiple-Output Radiofrequency Matching Module and Associated Methods
App 20170117869 - Leeser; Karl ;   et al.
2017-04-27
Mutually Induced Filters
App 20170111025 - Kapoor; Sunil ;   et al.
2017-04-20
Ammonia Radical Generator
App 20170050165 - Sabri; Mohamed ;   et al.
2017-02-23
Radical Generator And Method For Generating Ammonia Radicals
App 20170050164 - Leeser; Karl
2017-02-23
Deposition Apparatus Including Edge Plenum Showerhead Assembly
App 20160340781 - Thomas; Timothy Scott ;   et al.
2016-11-24
Chemical deposition apparatus having conductance control
Grant 9,490,149 - Chandrasekharan , et al. November 8, 2
2016-11-08
Carousel reactor for multi-station, sequential processing systems
Grant 9,484,233 - Leeser November 1, 2
2016-11-01
Suppression Of Parasitic Deposition In A Substrate Processing System By Suppressing Precursor Flow And Plasma Outside Of Substrate Region
App 20160289832 - Xia; Chunguang ;   et al.
2016-10-06
Ceramic showerhead with embedded RF electrode for capacitively coupled plasma reactor
Grant 9,449,795 - Sabri , et al. September 20, 2
2016-09-20
Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region
Grant 9,388,494 - Xia , et al. July 12, 2
2016-07-12
Valve Manifold Deadleg Elimination Via Reentrant Flow Path
App 20160147234 - Leeser; Karl ;   et al.
2016-05-26
Systems and Methods for Suppressing Parasitic Plasma and Reducing Within-Wafer Non-Uniformity
App 20160079036 - Kang; Hu ;   et al.
2016-03-17
Modulated ion-induced atomic layer deposition (MII-ALD)
Grant 9,255,329 - Chiang , et al. February 9, 2
2016-02-09
Systems And Methods For Vapor Delivery
App 20160032453 - Qian; Jun ;   et al.
2016-02-04
Sequential precursor dosing in an ALD multi-station/batch reactor
Grant 9,236,244 - Chandrasekharan , et al. January 12, 2
2016-01-12
Tandem Source Activation For Cvd Of Films
App 20150368797 - LaVoie; Adrien ;   et al.
2015-12-24
Sequential cascading of reaction volumes as a chemical reuse strategy
Grant 9,162,209 - Leeser October 20, 2
2015-10-20
Tandem source activation for cyclical deposition of films
Grant 9,145,607 - LaVoie , et al. September 29, 2
2015-09-29
Compact Substrate Processing Tool With Multi-station Processing And Pre-processing And/or Post-processing Stations
App 20150240360 - Leeser; Karl
2015-08-27
Tandem Source Activation For Cyclical Deposition Of Films
App 20150110968 - LaVoie; Adrien ;   et al.
2015-04-23
Sequential Precursor Dosing In An Ald Multi-station/batch Reactor
App 20150099372 - Chandrasekharan; Ramesh ;   et al.
2015-04-09
Sequential precursor dosing in an ALD multi-station/batch reactor
Grant 8,940,646 - Chandrasekharan , et al. January 27, 2
2015-01-27
Sequential Precursor Dosing In An Ald Multi-station/batch Reactor
App 20150017812 - Chandrasekharan; Ramesh ;   et al.
2015-01-15
Deposition Apparatus Including An Isothermal Processing Zone
App 20150011096 - Chandrasekharan; Ramesh ;   et al.
2015-01-08
Chemical Deposition Apparatus Having Conductance Control
App 20150011095 - Chandrasekharan; Ramesh ;   et al.
2015-01-08
Method of improving film non-uniformity and throughput
Grant 8,906,791 - Park , et al. December 9, 2
2014-12-09
Ceramic Showerhead With Embedded Rf Electrode For Capacitively Coupled Plasma Reactor
App 20140238608 - Sabri; Mohamed ;   et al.
2014-08-28
High Pressure, High Power Plasma Activated Conformal Film Deposition
App 20140030444 - Swaminathan; Shankar ;   et al.
2014-01-30
Suppression Of Parasitic Deposition In A Substrate Processing System By Suppressing Precursor Flow And Plasma Outside Of Substrate Region
App 20130344245 - XIA; CHUNGUANG ;   et al.
2013-12-26
Carousel Reactor For Multi-station, Sequential Processing Systems
App 20130269609 - Leeser; Karl
2013-10-17
Sequential Cascading Of Reaction Volumes As A Chemical Reuse Strategy
App 20130228225 - Leeser; Karl
2013-09-05
Creation Of Off-axis Null Magnetic Field Locus For Improved Uniformity In Plasma Deposition And Etching
App 20130206725 - Leeser; Karl ;   et al.
2013-08-15
Mechanical Suppression Of Parasitic Plasma In Substrate Processing Chamber
App 20130092086 - Keil; Douglas ;   et al.
2013-04-18
Magnetic lensing to improve deposition uniformity in a physical vapor deposition (PVD) process
Grant 8,343,318 - Leeser , et al. January 1, 2
2013-01-01
Method Of Improving Film Non-uniformity And Throughput
App 20110300716 - PARK; Kie-Jin ;   et al.
2011-12-08
Method of reducing plasma stabilization time in a cyclic deposition process
Grant 8,053,372 - Greer , et al. November 8, 2
2011-11-08
Magnetic Lensing To Improve Deposition Uniformity In A Physical Vapor Deposition (pvd) Process
App 20110233050 - Leeser; Karl ;   et al.
2011-09-29
Shields For Substrate Processing Systems
App 20110217465 - Leeser; Karl ;   et al.
2011-09-08
Method of increasing the reactivity of a precursor in a cyclic deposition process
Grant 7,871,678 - Greer , et al. January 18, 2
2011-01-18
Modulated Ion-induced Atomic Layer Deposition (mii-ald)
App 20100055342 - Chiang; Tony P. ;   et al.
2010-03-04

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