Lee; Si-Hyeung

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lee; Si-Hyeung.The latest application filed is for "semiconductor device having sufficient process margin and method of forming same".

Company Profile

0.14.21

Lee; Si-Hyeung - Seoul KR
Lee; Si-Hyeung - Gyeonggi-do KR
Lee; Si-hyeung - Hwaseong-si KR
Lee; Si-hyeung - Suwon KR
Lee, Si-Hyeung - Hwaseong-gun KR
Lee, Si-hyeung - Suwon-city KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Semiconductor device having sufficient process margin and method of forming same Grant 9,673,195 - Ryoo , et al. June 6, 2	2017-06-06
Semiconductor Device Having Sufficient Process Margin And Method Of Forming Same App 20140231925 - RYOO; Man-Hyoung ; et al.	2014-08-21
Semiconductor device having sufficient process margin and method of forming same Grant 8,193,047 - Ryoo , et al. June 5, 2	2012-06-05
Semiconductor device and method of fabricating the semiconductor device Grant 8,169,012 - Bae , et al. May 1, 2	2012-05-01
Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the same Grant 8,080,886 - Kang , et al. December 20, 2	2011-12-20
Semiconductor device having sufficient process margin and method of forming same App 20110156159 - Ryoo; Man-Hyoung ; et al.	2011-06-30
Semiconductor device having sufficient process margin and method of forming same App 20100190303 - Ryoo; Man-Hyoung ; et al.	2010-07-29
Semiconductor Device And Method Of Fabricating The Semiconductor Device App 20090102017 - BAE; Yong-kug ; et al.	2009-04-23
Optical element holder and projection exposure apparatus having the same Grant 7,457,058 - Shim , et al. November 25, 2	2008-11-25
Integrated Circuit Semiconductor Device With Overlay Key And Alignment Key And Method Of Fabricating The Same App 20080203590 - KANG; Chang-Jin ; et al.	2008-08-28
Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the same Grant 7,381,508 - Kang , et al. June 3, 2	2008-06-03
Method of forming trench in semiconductor device Grant 7,259,065 - Goo , et al. August 21, 2	2007-08-21
Semiconductor Device Having Sufficient Process Margin And Method Of Forming Same App 20070190812 - RYOO; Man-Hyoung ; et al.	2007-08-16
Resist composition comprising photosensitive polymer having lactone in its backbone Grant 7,241,552 - Yoon , et al. July 10, 2	2007-07-10
Semiconductor device having sufficient process margin and method of forming same Grant 7,221,031 - Ryoo , et al. May 22, 2	2007-05-22
Optical element holder and projection exposure apparatus having the same App 20060291077 - Shim; Woo-Seok ; et al.	2006-12-28
Semiconductor device and method of manufacturing the same App 20060284259 - Lee; Jung-Hyeon ; et al.	2006-12-21
Photosensitive polymer and chemically amplified photoresist composition containing the same Grant 7,084,227 - Jung , et al. August 1, 2	2006-08-01
Method of forming trench in semiconductor device App 20050266646 - Goo, Doo-hoon ; et al.	2005-12-01
Photosensitive polymer and chemically amplified photoresist composition containing the same Grant 6,893,793 - Jung , et al. May 17, 2	2005-05-17
Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the same App 20050031995 - Kang, Chang-Jin ; et al.	2005-02-10
Photosensitive polymer and chemically amplified photoresist composition containing the same App 20050019693 - Jung, Dong-won ; et al.	2005-01-27
Semiconductor device having sufficient process margin and method of forming same App 20050012157 - Ryoo, Man-Hyoung ; et al.	2005-01-20
Resist composition comprising photosensitive polymer having lactone in its backbone App 20050008975 - Yoon, Kwang-sub ; et al.	2005-01-13
Wafer edge exposing apparatus App 20040189971 - Goo, Doo-Hoon ; et al.	2004-09-30
Resist composition comprising photosensitive polymer having lactone in its backbone App 20040018442 - Yoon, Kwang-Sub ; et al.	2004-01-29
Methods for forming resist pattern and fabricating semiconductor device using Si-containing water-soluble polymer App 20040009436 - Lee, Si-hyeung ; et al.	2004-01-15
Photosensitive polymer Grant 6,642,336 - Lee , et al. November 4, 2	2003-11-04
Photosensitive polymer and chemically amplified photoresist composition containing the same App 20030170563 - Jung, Dong-Won ; et al.	2003-09-11
Photosensitive polymer having phenyl ring and lactone group and resist composition comprising the same Grant 6,613,492 - Lee September 2, 2	2003-09-02
Photosensitive polymer and chemically amplified photoresist composition containing the same App 20020193542 - Jung, Dong-Won ; et al.	2002-12-19
Photosensitive polymer and chemically amplified photoresist composition containing the same Grant 6,472,120 - Jung , et al. October 29, 2	2002-10-29
Photosensitive polymer having phenyl ring and lactone group and resist composition comprising the same App 20020090568 - Lee, Si-Hyeung	2002-07-11
Resist composition comprising photosensitive polymer having loctone in its backbone App 20020042016 - Yoon, Kwang-sub ; et al.	2002-04-11

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