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name:-0.006476879119873
name:-0.0062630176544189
name:-0.0051059722900391
Lee; Seokhwan Patent Filings

Lee; Seokhwan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lee; Seokhwan.The latest application filed is for "atomic layer deposition and etch in a single plasma chamber for fin field effect transistor formation".

Company Profile
5.5.5
  • Lee; Seokhwan - Seoul KR
  • Lee; Seokhwan - San Jose CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Wireless device
Grant 10,840,966 - Kang , et al. November 17, 2
2020-11-17
Power supply device and display device including the same
Grant 10,665,190 - Lee , et al.
2020-05-26
Atomic layer deposition and etch in a single plasma chamber for fin field effect transistor formation
Grant 10,515,815 - Zhou , et al. Dec
2019-12-24
Atomic Layer Deposition And Etch In A Single Plasma Chamber For Fin Field Effect Transistor Formation
App 20190157096 - Zhou; Xiang ;   et al.
2019-05-23
Display apparatus and driving method thereof
Grant 10,290,246 - Lee , et al.
2019-05-14
Backlight unit, method of driving the same, and display apparatus having the same
Grant 10,009,967 - Lee , et al. June 26, 2
2018-06-26
Wireless Device
App 20180159583 - KANG; Younghee ;   et al.
2018-06-07
Power Supply Device And Display Device Including The Same
App 20170337890 - LEE; Seokhwan ;   et al.
2017-11-23
Display Apparatus And Driving Method Thereof
App 20170316728 - LEE; Jongjae ;   et al.
2017-11-02
Backlight Unit, Method Of Driving The Same, And Display Apparatus Having The Same
App 20160323946 - Lee; Dae-sik ;   et al.
2016-11-03

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