loadpatents
name:-0.15220594406128
name:-0.014909982681274
name:-0.00046014785766602
Lee; Keum-Joo Patent Filings

Lee; Keum-Joo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lee; Keum-Joo.The latest application filed is for "methods of fabricating recessed channel metal oxide semiconductor (mos) transistors".

Company Profile
0.9.16
  • Lee; Keum-Joo - Hwaseong-si KR
  • Lee; Keum-Joo - Gyeonggi-do KR
  • Lee; Keum Joo - Inchon KR
  • Lee; Keum-joo - Incheon KR
  • Lee; Keum-Joo - Inchun KR
  • Lee, Keum Joo - Inchon-City KR
  • Lee, Keum-Joo - Inchun-shi KR
  • Lee, Keum-joo - Incheon-city KR
  • Lee, Keum-Joo - Namdong-ku KR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Methods of fabricating recessed channel metal oxide semiconductor (MOS) transistors
Grant 8,058,128 - Lee , et al. November 15, 2
2011-11-15
Methods Of Fabricating Recessed Channel Metal Oxide Semiconductor (mos) Transistors
App 20100255649 - Lee; Keum-Joo ;   et al.
2010-10-07
Methods of forming a silicon oxide layer and methods of forming an isolation layer
App 20100173470 - Lee; Mong-Sup ;   et al.
2010-07-08
Method of manufacturing a capacitor and method of manufacturing a semiconductor device using the same
Grant 7,629,218 - Lee , et al. December 8, 2
2009-12-08
Methods of cleaning a semiconductor device and methods of manufacturing a semiconductor device using the same
Grant 7,582,539 - Lee , et al. September 1, 2
2009-09-01
Methods of cleaning a semiconductor device and methods of manufacturing a semiconductor device using the same
App 20080124909 - Lee; Keum-Joo ;   et al.
2008-05-29
Method of removing a photoresist pattern, method of forming a dual polysilicon layer using the removing method and method of manufacturing a semiconductor device using the removing
App 20070298596 - Lee; Keum-Joo ;   et al.
2007-12-27
Methods of forming a conductive structure
App 20070138126 - Lee; Keum-Joo ;   et al.
2007-06-21
Method of manufacturing a capacitor and method of manufacturing a semiconductor device using the same
App 20070111462 - Lee; Woo-Sung ;   et al.
2007-05-17
Method of cleaning a semiconductor device and method of manufacturing a semiconductor device using the same
App 20070004218 - Lee; Keum-Joo ;   et al.
2007-01-04
Methods of Forming Corrosion-Inhibiting Cleaning Compositions for Metal Layers and Patterns on Semiconductor Substrates
App 20060287208 - Lee; Kwang-Wook ;   et al.
2006-12-21
Method Of Removing A Photoresist Pattern And Method Of Manufacturing A Semiconductor Device Using The Same
App 20060270241 - Kim; Kyoung-Chul ;   et al.
2006-11-30
Corrosion-inhibiting cleaning compositions for metal layers and patterns on semiconductor substrates
App 20050261151 - Lee, Kwang-Wook ;   et al.
2005-11-24
Wafer spin drying apparatus with a plurality of supply nozzles and methods for using the same
Grant 6,834,440 - Lee December 28, 2
2004-12-28
Method for cleaning damaged layers and polymer residue from semiconductor device
Grant 6,802,911 - Lee , et al. October 12, 2
2004-10-12
Trench isolation regions having recess-inhibiting layers therein that protect against overetching
Grant 6,717,231 - Kim , et al. April 6, 2
2004-04-06
Wafer spin drying apparatus with a plurality of supply nozzles and methods for using the same
App 20040060190 - Lee, Keum-Joo
2004-04-01
Shallow trench isolation type semiconductor device and method of forming the same
Grant 6,699,773 - Lee , et al. March 2, 2
2004-03-02
Method for cleaning damaged layers and polymer residue from semiconductor device
App 20030056806 - Lee, Keum Joo ;   et al.
2003-03-27
Shallow trench isolation type semiconductor device and method of forming the same
App 20030042539 - Lee, Keum-Joo ;   et al.
2003-03-06
Trench isolation regions having recess-inhibiting layers therein that protect against overetching
App 20030038334 - Kim, Sung-eui ;   et al.
2003-02-27
Shallow trench isolation type semiconductor device and method of forming the same
Grant 6,500,726 - Lee , et al. December 31, 2
2002-12-31
Methods of forming trench isolation regions having recess-inhibiting layers therein that protect against overetching
Grant 6,461,937 - Kim , et al. October 8, 2
2002-10-08
Shallow trench isolation type semiconductor device and method of forming the same
App 20020020887 - Lee, Keum-Joo ;   et al.
2002-02-21
Shallow trench isolation type semiconductor device and method of the same
App 20020003275 - Lee, Keum-Joo ;   et al.
2002-01-10

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed