Lee; Jung-Youl

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lee; Jung-Youl.The latest application filed is for "methods of forming patterns using compositions for an underlayer of photoresist".

Company Profile

1.11.13

Lee; Jung-Youl - Hwaseong-si KR
Lee; Jung-Youl - Gyeonggi-do KR
Lee; Jung-Youl - Anyang-si
Lee; Jung-Youl - Kyungki-Do KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods of forming patterns using compositions for an underlayer of photoresist Grant 10,712,662 - Ryu , et al.	2020-07-14
Methods Of Forming Patterns Using Compositions For An Underlayer Of Photoresist App 20170199459 - RYU; Jin-A ; et al.	2017-07-13
Compound and composition for forming lower film of resist pattern, and method for forming lower film using same Grant 9,651,867 - Han , et al. May 16, 2	2017-05-16
Resist underlayer composition and method for forming pattern using same Grant 9,416,296 - Lee , et al. August 16, 2	2016-08-16
Resist Underlayer Composition And Method For Forming Pattern Using Same App 20160053132 - LEE; Jung-Youl ; et al.	2016-02-25
Compound and Composition for Forming Lower Film of Resist Pattern, and Method for Forming Lower Film Using Same App 20150286139 - Han; Su-Young ; et al.	2015-10-08
Method for Forming Fine Patterns of Semiconductor Device Using Directed Self-Assembly Process App 20140287587 - Lee; Jung-Youl ; et al.	2014-09-25
I-line Photoresist Composition And Method For Forming Fine Pattern Using Same App 20140242520 - Lee; Jung-Youl ; et al.	2014-08-28
Method for forming fine pattern in semiconductor device Grant 8,293,458 - Lee , et al. October 23, 2	2012-10-23
Photosensitive molecular compound and photoresist composition including the same Grant 8,124,311 - Lee , et al. February 28, 2	2012-02-28
Acid-amplifier having acetal group and photoresist composition including the same Grant 7,935,474 - Lee , et al. May 3, 2	2011-05-03
Method For Forming Fine Pattern In Semiconductor Device App 20100233622 - Lee; Jun-Gyeong ; et al.	2010-09-16
Photo-sensitive compound and photoresist composition including the same Grant 7,695,893 - Lee , et al. April 13, 2	2010-04-13
Monomer, polymer and composition for photoresist Grant 7,604,919 - Kim , et al. October 20, 2	2009-10-20
Photosensitive Molecular Compound And Photoresist Composition Including The Same App 20090197198 - Lee; Jung-Youl ; et al.	2009-08-06
Monomer having sulfonyl group, polymer thereof and photoresist composition including the same Grant 7,569,325 - Lee , et al. August 4, 2	2009-08-04
Photoresist monomer polymer thereof and photoresist composition including the same Grant 7,501,222 - Lee , et al. March 10, 2	2009-03-10
Acid-amplifier Having Acetal Group And Photoresist Composition Including The Same App 20090023093 - Lee; Jung-Youl ; et al.	2009-01-22
Photo-sensitive Compound And Photoresist Composition Including The Same App 20080305430 - Lee; Jae-Woo ; et al.	2008-12-11
Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same Grant 7,419,761 - Lee , et al. September 2, 2	2008-09-02
Monomer Having Sulfonyl Group, Polymer Thereof And Photoresist Composition Including The Same App 20080102402 - LEE; Jung-Youl ; et al.	2008-05-01
Monomer, Polymer And Composition For Photoresist App 20080070161 - Kim; Deog-Bae ; et al.	2008-03-20
Photoresist monomer polymer thereof and photoresist composition including the same App 20060292489 - Lee; Jung-Youl ; et al.	2006-12-28
Photoresist monomer having spiro cyclic ketal goup, polymer thereof and photoresit composition including the same App 20060057494 - Lee; Jae-Woo ; et al.	2006-03-16

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