loadpatents
Patent applications and USPTO patent grants for Lee; Hsing-Jui.The latest application filed is for "atomic layer deposition method".
Patent | Date |
---|---|
Atomic layer deposition method Grant 10,858,736 - Chuang , et al. December 8, 2 | 2020-12-08 |
High temperature intermittent ion implantation Grant 10,049,856 - Wu , et al. August 14, 2 | 2018-08-14 |
Atomic Layer Deposition Method App 20170081761 - Chuang; Chia-Yi ;   et al. | 2017-03-23 |
Atomic layer deposition apparatus and method Grant 9,512,519 - Chuang , et al. December 6, 2 | 2016-12-06 |
High Temperature Intermittent Ion Implantation App 20160260580 - Wu; Hsin-Wei ;   et al. | 2016-09-08 |
High temperature intermittent ion implantation Grant 9,343,312 - Wu , et al. May 17, 2 | 2016-05-17 |
High Temperature Intermittent Ion Implantation App 20160027646 - Wu; Hsin-Wei ;   et al. | 2016-01-28 |
Method of forming a shallow trench isolation structure Grant 9,209,243 - Chuang , et al. December 8, 2 | 2015-12-08 |
Method Of Forming A Shallow Trench Isolation Structure App 20150155352 - Chuang; Chia-Yi ;   et al. | 2015-06-04 |
Method of forming a shallow trench isolation structure Grant 8,975,155 - Chuang , et al. March 10, 2 | 2015-03-10 |
Method Of Forming A Shallow Trench Isolation Structure App 20150014807 - Chuang; Chia-Yi ;   et al. | 2015-01-15 |
Atomic Layer Deposition Apparatus And Method App 20140154414 - CHUANG; Chia-Yi ;   et al. | 2014-06-05 |
Deposition Chamber and Injector App 20140038421 - Kuo; Kai-Lun ;   et al. | 2014-02-06 |
Fabricating high-K/metal gate devices in a gate last process Grant 8,222,132 - Lee , et al. July 17, 2 | 2012-07-17 |
Fabricating High-k/metal Gate Devices In A Gate Last Process App 20100124818 - Lee; Da-Yuan ;   et al. | 2010-05-20 |
Truncated dummy plate for process furnace App 20050124169 - Chen, Yen-Hsing ;   et al. | 2005-06-09 |
Truncated dummy plate for process furnace Grant 6,849,131 - Chen , et al. February 1, 2 | 2005-02-01 |
Truncated dummy plate for process furnace App 20040065261 - Chen, Yen-Hsing ;   et al. | 2004-04-08 |
Method Reducing The Effects Of N2 Gas Contamination In An Ion Implanter App 20030160179 - Yeh, Su-Yu ;   et al. | 2003-08-28 |
Method reducing the effects of N2 gas contamination in an ion implanter Grant 6,605,812 - Yeh , et al. August 12, 2 | 2003-08-12 |
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