LEE; Heng-Jen
Patent Applications and Registrations
Patent applications and USPTO patent grants for LEE; Heng-Jen.The latest application filed is for "adaptive baking method".
Company Profile
3.42.33
- LEE; Heng-Jen - Hsinchu TW
- Lee; Heng-Jen - Baoshan Township TW
- Lee; Heng-Jen - Baoshan Township, Hsinchu County N/A TW
- Lee; Heng-Jen - Hsinchu County N/A TW
- Lee; Heng-Jen - Hsin-Chu TW
Patent Activity
| Patent | Date |
|---|---|
| Adaptive Baking Method App 20220074668 - WU; Tzung-Chen ; et al. | 2022-03-10 |
| Adaptive baking method Grant 11,204,200 - Wu , et al. December 21, 2 | 2021-12-21 |
| System And Method For Supplying And Dispensing Bubble-free Photolithography Chemical Solutions App 20200124967 - Zhou; Wen-Zhan ; et al. | 2020-04-23 |
| System and method for supplying and dispensing bubble-free photolithography chemical solutions Grant 10,558,120 - Zhou , et al. Feb | 2020-02-11 |
| Two-dimensional marks Grant 10,274,839 - Zhou , et al. | 2019-04-30 |
| Adaptive Baking Method App 20180306514 - WU; Tzung-Chen ; et al. | 2018-10-25 |
| Adaptive baking system and method of using the same Grant 10,006,717 - Wu , et al. June 26, 2 | 2018-06-26 |
| System And Method For Supplying And Dispensing Bubble-free Photolithography Chemical Solutions App 20180067395 - Zhou; Wen-Zhan ; et al. | 2018-03-08 |
| System and method for supplying and dispensing bubble-free photolithography chemical solutions Grant 9,817,315 - Zhou , et al. November 14, 2 | 2017-11-14 |
| Hybrid focus-exposure matrix Grant 9,690,212 - Zhou , et al. June 27, 2 | 2017-06-27 |
| Lithographic plane check for mask processing Grant 9,671,685 - Lin , et al. June 6, 2 | 2017-06-06 |
| In-situ immersion hood cleaning Grant 9,632,426 - Peng , et al. April 25, 2 | 2017-04-25 |
| Method of making wafer assembly Grant 9,601,324 - Huang , et al. March 21, 2 | 2017-03-21 |
| Litho cluster and modulization to enhance productivity Grant 9,196,515 - Huang , et al. November 24, 2 | 2015-11-24 |
| Method Of Making Wafer Assembly App 20150318165 - HUANG; I-Hsiung ; et al. | 2015-11-05 |
| System And Method For Supplying And Dispensing Bubble-free Photolithography Chemical Solutions App 20150261089 - Zhou; Wen-Zhan ; et al. | 2015-09-17 |
| Adaptive Baking System And Method Of Using The Same App 20150253083 - WU; Tzung-Chen ; et al. | 2015-09-10 |
| Wafer assembly with carrier wafer Grant 9,111,982 - Huang , et al. August 18, 2 | 2015-08-18 |
| Litho Cluster And Modulization To Enhance Productivity App 20150076371 - Huang; I-Hsiung ; et al. | 2015-03-19 |
| System and method for cleaning a wafer chuck Grant 8,955,530 - Peng , et al. February 17, 2 | 2015-02-17 |
| Enhanced scanner throughput system and method Grant 8,906,599 - Liu , et al. December 9, 2 | 2014-12-09 |
| Litho cluster and modulization to enhance productivity Grant 8,903,532 - Huang , et al. December 2, 2 | 2014-12-02 |
| Tool induced shift reduction determination for overlay metrology Grant 8,860,941 - Lee , et al. October 14, 2 | 2014-10-14 |
| Photoresist materials and photolithography processes Grant 8,848,163 - Wang , et al. September 30, 2 | 2014-09-30 |
| Two-Dimensional Marks App 20140253901 - Zhou; Wen-Zhan ; et al. | 2014-09-11 |
| Hybrid Focus-Exposure Matrix App 20140257761 - Zhou; Wen-Zhan ; et al. | 2014-09-11 |
| Wafer edge exposure module Grant 8,625,076 - Chien , et al. January 7, 2 | 2014-01-07 |
| Method to improve mask critical dimension uniformity (CDU) Grant 8,609,545 - Huang , et al. December 17, 2 | 2013-12-17 |
| Cost-effective method for extreme ultraviolet (EUV) mask production Grant 8,592,102 - Lin , et al. November 26, 2 | 2013-11-26 |
| Enhanced Scanner Throughput System And Method App 20130309612 - LIU; Yu-Mei ; et al. | 2013-11-21 |
| Wafer Assembly With Carrier Wafer App 20130285264 - HUANG; I-Hsiung ; et al. | 2013-10-31 |
| Tool Induced Shift Reduction Determination for Overlay Metrology App 20130286395 - Lee; Yung-Yao ; et al. | 2013-10-31 |
| Semiconductor processing apparatus with simultaneously movable stages Grant 8,544,317 - Lin , et al. October 1, 2 | 2013-10-01 |
| Litho Cluster and Modulization to Enhance Productivity App 20130252175 - Huang; I-Hsiung ; et al. | 2013-09-26 |
| Photoresist materials and photolithography processes Grant 8,507,177 - Wang , et al. August 13, 2 | 2013-08-13 |
| Dual wavelength exposure method and system for semiconductor device manufacturing Grant 8,338,262 - Lee , et al. December 25, 2 | 2012-12-25 |
| Frame cell for shot layout flexibility Grant 8,239,788 - Lin , et al. August 7, 2 | 2012-08-07 |
| Method and apparatus for reducing down time of a lithography system Grant 8,237,132 - Peng , et al. August 7, 2 | 2012-08-07 |
| In-Situ Immersion Hood Cleaning App 20120180823 - Peng; Jui-Chun ; et al. | 2012-07-19 |
| System and Method for Cleaning a Wafer Chuck App 20120180813 - Peng; Jui-Chun ; et al. | 2012-07-19 |
| Structure of stacking scatterometry based overlay marks for marks footprint reduction Grant 8,183,701 - Shih , et al. May 22, 2 | 2012-05-22 |
| Method of inhibiting photoresist pattern collapse Grant 8,101,340 - Chang , et al. January 24, 2 | 2012-01-24 |
| Lithography patterning method Grant 8,101,530 - Huang , et al. January 24, 2 | 2012-01-24 |
| Wafer Edge Exposure Module App 20110194086 - CHIEN; Tsung-Chih ; et al. | 2011-08-11 |
| Lithographic Plane Check For Mask Processing App 20110161893 - LIN; CHIN-HSIANG ; et al. | 2011-06-30 |
| Cost-effective Method For Extreme Ultraviolet (euv) Mask Production App 20110159410 - Lin; Chin-Hsiang ; et al. | 2011-06-30 |
| Semiconductor Processing Apparatus With Simultaneously Movable Stages App 20110083496 - LIN; Yu-Fu ; et al. | 2011-04-14 |
| Lithography Patterning Method App 20110076843 - Huang; I-Hsiung ; et al. | 2011-03-31 |
| Wafer edge exposure unit Grant 7,901,854 - Huang , et al. March 8, 2 | 2011-03-08 |
| Frame Cell For Shot Layout Flexibility App 20110033787 - Lin; Chih-Wei ; et al. | 2011-02-10 |
| Method And Structure Of Stacking Scatterometry-based Overlay Or Cd Marks For Mark Footprint Reduction App 20110024924 - Shih; Chi-Yuan ; et al. | 2011-02-03 |
| Method And Apparatus For Reducing Down Time Of A Lithography System App 20100321660 - Peng; Jui-Chun ; et al. | 2010-12-23 |
| Dual Wavelength Exposure Method And System For Semiconductor Device Manufacturing App 20100308439 - LEE; Heng-Jen ; et al. | 2010-12-09 |
| Wafer Edge Exposure Unit App 20100285399 - Huang; Po-Chang ; et al. | 2010-11-11 |
| Novel Treatment For Mask Surface Chemical Reduction App 20090258159 - Su; Yih-Chen ; et al. | 2009-10-15 |
| Method To Improve Mask Critical Dimension Uniformity (CDU) App 20090206057 - Huang; I-Hsiung ; et al. | 2009-08-20 |
| Line end spacing measurement Grant 7,393,616 - Huang , et al. July 1, 2 | 2008-07-01 |
| Method of Inhibiting Photoresist Pattern Collapse App 20070264594 - Chang; Ching-Yu ; et al. | 2007-11-15 |
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