| Patent | Date |
|---|
Reticle Stage For Preventing Haze Contamination And Exposure Apparatus Having The Same
App 20210208516 - YOO; JIYONG ; et al. | 2021-07-08 |
Reticle Pod For Preventing Haze Contamination And Reticle Stocker Having The Same
App 20210157227 - YOO; JIYONG ; et al. | 2021-05-27 |
Method of fabricating metal contact using double patterning technology and device formed thereby
Grant 8,546,258 - Kim , et al. October 1, 2 | 2013-10-01 |
Method Of Fabricating Metal Contact Using Double Patterning Technology And Device Formed Thereby
App 20130171821 - Kim; Bong-cheol ; et al. | 2013-07-04 |
Method of detecting reticle errors
Grant 8,384,876 - Heo , et al. February 26, 2 | 2013-02-26 |
Methods of forming patterns for semiconductor devices
Grant 8,361,905 - Kim , et al. January 29, 2 | 2013-01-29 |
Photomask used in fabrication of semiconductor device
Grant 8,241,820 - Kim , et al. August 14, 2 | 2012-08-14 |
Method of forming semiconductor device patterns
Grant 8,227,354 - Kim , et al. July 24, 2 | 2012-07-24 |
Methods of Forming Patterns for Semiconductor Devices
App 20100240221 - Kim; Bong-cheol ; et al. | 2010-09-23 |
Photomask Used in Fabrication of Semiconductor Device
App 20100178599 - Kim; Bong-Cheol ; et al. | 2010-07-15 |
Method Of Forming Semiconductor Device Patterns
App 20100173492 - Kim; Bong-cheol ; et al. | 2010-07-08 |
Method of detecting reticle errors
App 20100149502 - Heo; Jin-seok ; et al. | 2010-06-17 |
Overlay key, method of forming the overlay key, semiconductor device including the overlay key and method of manufacturing the semiconductor device
App 20070063317 - Kim; Dae-Joung ; et al. | 2007-03-22 |
Method of manufacturing a non-volatile semiconductor memory device
App 20070004140 - Jang; Dae-Hyun ; et al. | 2007-01-04 |
Method for manufacturing a semiconductor device
Grant 7,083,899 - Kim , et al. August 1, 2 | 2006-08-01 |
Structure provided on an overlay region, overlay mark having the structure, and method of forming the overlay mark
App 20060118974 - Kim; Dae-Joung ; et al. | 2006-06-08 |
Methods for adjusting light intensity for photolithography and related systems
App 20060003240 - Shim; Woo-Seok ; et al. | 2006-01-05 |
Method for forming a minute pattern and method for manufacturing a semiconductor device using the same
Grant 6,933,247 - Byun , et al. August 23, 2 | 2005-08-23 |
Photoresist composition and method of forming a photoresist pattern with a controlled remnant ratio
Grant 6,841,338 - Lee , et al. January 11, 2 | 2005-01-11 |
Method of forming a pattern of a semiconductor device and photomask therefor
Grant 6,818,480 - Lee , et al. November 16, 2 | 2004-11-16 |
Method for forming a minute pattern and method for manufacturing a semiconductor device using the same
App 20040185382 - Byun, Sung-Hwan ; et al. | 2004-09-23 |
Method for manufacturing a semiconductor device
App 20040058280 - Kim, Bong-Cheol ; et al. | 2004-03-25 |
Method of forming a pattern of a semiconductor device and photomask therefor
App 20040021221 - Lee, Dae-Youp ; et al. | 2004-02-05 |
Method of forming a pattern using a photoresist without exposing the photoresist and silicidation method incorporating the same
Grant 6,673,706 - Yoo , et al. January 6, 2 | 2004-01-06 |
Method of fabricating flash memory device using self-aligned non-exposure pattern formation process
Grant 6,620,690 - Lee , et al. September 16, 2 | 2003-09-16 |
Photoresist composition and method of forming a photoresist pattern with a controlled remnant ratio
App 20030049565 - Lee, Dae-youp ; et al. | 2003-03-13 |
Method of fabricating flash memory device using self-aligned non-exposure pattern formation process
App 20030022439 - Lee, Jae-han ; et al. | 2003-01-30 |
Method of forming a pattern using a photoresist without exposing the photoresist and silicidation method incorporating the same
App 20020119403 - Yoo, Ji-Yong ; et al. | 2002-08-29 |
Method of forming fine patterns in semiconductor device
App 20020059557 - Shin, Hye-Soo ; et al. | 2002-05-16 |
Method of generating a circuit pattern used for fabricating a semiconductor device
App 20020001975 - Lee, Dae-Youp | 2002-01-03 |
Copolymer of sulfur dioxide and nuclear-substituted trialkylgermylstyrene
Grant 5,314,978 - Kim , et al. May 24, 1 | 1994-05-24 |
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