Lee; Chih-Jie
Patent Applications and Registrations
Patent applications and USPTO patent grants for Lee; Chih-Jie.The latest application filed is for "optical proximity correction and photomasks".
- Lee; Chih-Jie - Hsinchu TW
- LEE; Chih-Jie - Taipei City TW
- Lee; Chih-Jie - Taipei TW
| Patent | Date |
|---|---|
| Optical Proximity Correction and Photomasks App 20220155692 - Jheng; Dong-Yo ; et al. | 2022-05-19 |
| Optical proximity correction and photomasks Grant 11,243,472 - Jheng , et al. February 8, 2 | 2022-02-08 |
| Lithography Process Monitoring Method App 20210286274 - LEE; Chih-Jie ; et al. | 2021-09-16 |
| Lithography process monitoring method Grant 10,962,892 - Lee , et al. March 30, 2 | 2021-03-30 |
| Optical Proximity Correction and Photomasks App 20200301289 - Jheng; Dong-Yo ; et al. | 2020-09-24 |
| Optical proximity correction and photomasks Grant 10,678,142 - Jheng , et al. | 2020-06-09 |
| Lithography Process Monitoring Method App 20200103766 - LEE; Chih-Jie ; et al. | 2020-04-02 |
| Lithography system having invisible pellicle over mask Grant 10,488,766 - Chen , et al. Nov | 2019-11-26 |
| Method for integrated circuit manufacturing with directed self-assembly (DSA) Grant 10,418,245 - Lee , et al. Sept | 2019-09-17 |
| Lithography System Having Invisible Pellicle Over Mask App 20190146362 - CHEN; Chiu-Hsiang ; et al. | 2019-05-16 |
| Optical Proximity Correction and Photomasks App 20190146355 - Jheng; Dong-Yo ; et al. | 2019-05-16 |
| Method for Integrated Circuit Manufacturing with Directed Self-Assembly (DSA) App 20190035630 - Lee; Chih-Jie ; et al. | 2019-01-31 |
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