Lee; Cheol-Kyu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lee; Cheol-Kyu.The latest application filed is for "method of forming fine pattern of semiconductor device using sige layer as sacrificial layer, and method of forming self-aligned contacts using the same".

Company Profile

0.9.11

Lee; Cheol-Kyu - Gyeonggi-do KR
Lee; Cheol-Kyu - Yongin-si KR
Lee; Cheol-Kyu - Yongin KR
Lee, Cheol-Kyu - Yongin-City KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods of forming semiconductor devices using selective etching of an active region through a hardmask Grant 7,879,726 - Park , et al. February 1, 2	2011-02-01
Method of fabricating semiconductor device for reducing thermal burden on impurity regions of peripheral circuit region Grant 7,879,703 - Jung , et al. February 1, 2	2011-02-01
Method of forming fine pattern of semiconductor device using sige layer as sacrificial layer, and method of forming self-aligned contacts using the same Grant 7,763,544 - Bai , et al. July 27, 2	2010-07-27
Semiconductor memory device and method of forming the same Grant 7,728,375 - Shin , et al. June 1, 2	2010-06-01
Method Of Forming Fine Pattern Of Semiconductor Device Using Sige Layer As Sacrificial Layer, And Method Of Forming Self-aligned Contacts Using The Same App 20090263970 - BAI; Keun-Hee ; et al.	2009-10-22
Method of forming fine pattern of semiconductor device using SiGe layer as sacrificial layer, and method of forming self-aligned contacts using the same Grant 7,566,659 - Bai , et al. July 28, 2	2009-07-28
Method Of Fabricating Semiconductor Device For Reducing Thermal Burden On Impurity Regions Of Peripheral Circuit Region App 20090186471 - Jung; Kyoung-Ho ; et al.	2009-07-23
Methods Of Forming Semiconductor Devices Using Selective Etching Of An Active Region Through A Hardmask App 20090042396 - Park; Heung-Sik ; et al.	2009-02-12
Semiconductor memory device and method of forming the same App 20090026515 - Shin; Kyoung-Sub ; et al.	2009-01-29
Method of manufacturing a semiconductor memory device Grant 7,402,488 - Cho , et al. July 22, 2	2008-07-22
Methods of forming capacitor electrodes using fluorine and oxygen Grant 7,329,574 - Cho , et al. February 12, 2	2008-02-12
Method of fabricating gate of semiconductor device using oxygen-free ashing process App 20070178637 - Jung; Hyung-suk ; et al.	2007-08-02
Method of etching a metal layer using a mask, a metallization method for a semiconductor device, a method of etching a metal layer, and an etching gas Grant 7,226,867 - Son , et al. June 5, 2	2007-06-05
Method of optimizing seasoning recipe for etch process App 20060293781 - Cho; Hong ; et al.	2006-12-28
Method of optimizing seasoning recipe for etch process Grant 7,118,926 - Cho , et al. October 10, 2	2006-10-10
Methods of forming capacitor electrodes using fluorine and oxygen App 20060040443 - Cho; Sung-Il ; et al.	2006-02-23
Method of manufacturing a semiconductor memory device App 20050287738 - Cho, Sung-il ; et al.	2005-12-29
Method of forming fine pattern of semiconductor device using SiGe layer as sacrificial layer, and method of forming self-aligned contacts using the same App 20050282363 - Bai, Keun-Hee ; et al.	2005-12-22
Method of optimizing seasoning recipe for etch process App 20040058459 - Cho, Hong ; et al.	2004-03-25
Method of etching a metal layer using a mask, a metallization method for a semiconductor device, a method of etching a metal layer, and an etching gas App 20040038547 - Son, Seung-Young ; et al.	2004-02-26

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