Lee; Chan-Yun
Patent Applications and Registrations
Patent applications and USPTO patent grants for Lee; Chan-Yun.The latest application filed is for "method for high aspect ratio photoresist removal in pure reducing plasma".
- Lee; Chan-Yun - Fremont CA
- Lee; Chan Yun - Suwon-si KR
| Patent | Date |
|---|---|
| Method for high aspect ratio photoresist removal in pure reducing plasma Grant 11,107,693 - Diao , et al. August 31, 2 | 2021-08-31 |
| Method for High Aspect Ratio Photoresist Removal in Pure Reducing Plasma App 20200098576 - Diao; Li ; et al. | 2020-03-26 |
| Method for high aspect ratio photoresist removal in pure reducing plasma Grant 10,431,469 - Diao , et al. O | 2019-10-01 |
| Method for High Aspect Ratio Photoresist Removal in Pure Reducing Plasma App 20150144155 - Diao; Li ; et al. | 2015-05-28 |
| Plasma generating apparatus App 20100065215 - Jeon; Sang Jean ; et al. | 2010-03-18 |
| Method for etching sidewall polymer and other residues from the surface of semiconductor devices Grant 6,667,244 - Cox , et al. December 23, 2 | 2003-12-23 |
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